Granted Patent B2

US 12,610,694 · App. 18/307,817 · Granted Apr 21, 2026

Inventor: Hiroshi Tabatake (Tokyo, JP)

Assignee: MAGNOLIA WHITE CORPORATION

H10K59/122H10K59/1201

Abstract

Claims (27)

1 . A method of manufacturing a display device, comprising:

forming a lower electrode on a base;

forming a rib which covers a part of the lower electrode;

forming a partition including a lower portion disposed on the rib and an upper portion protruding from a side surface of the lower portion;

removing the upper portion of at least a part of the partition;

measuring a first width of the lower portion of the partition and a second width of the upper portion of the partition; and

measuring a distance between the side surface of the lower portion and an end portion of the upper portion based on the first and second widths, wherein

the upper portion of the partition is formed of a metal material and is removed by a laser irradiated from a laser processing device, and

the first width is measured based on the top surface of the lower portion exposed by the removing of the upper portion.

2 . The method of claim 1 , wherein

the first and second widths are measured by capturing an image thereof with a length-measuring machine camera.

3 . The method of claim 1 , wherein

the base includes a plurality of panel regions in which display panels are formed and a peripheral region that compartmentalizes the plurality of panel regions,

the partition is formed in both the plurality of panel regions and the peripheral region, and

the removing of the upper portion and the measuring of the first width, the second width and the distance are carried out in the peripheral region.

4 . The method of claim 3 , wherein

in the plurality of panel regions, the partition is formed into a pattern that compartmentalizes pixels, and

in the peripheral region, the partition is formed into a pattern identical to that of the partition formed in the plurality of panel regions.

5 . The method of claim 1 , further comprising:

forming an organic layer on the lower electrode after the measuring of the distance;

forming an upper electrode on the organic layer;

forming a cap layer on the upper electrode;

forming a sealing layer on the cap layer;

forming a resist on the sealing layer; and

removing the sealing layer, the cap layer, the upper electrode and the organic layer using the resist as a mask.

6 . The method of claim 1 , wherein

the partition is formed by carrying out anisotropic dry etching and thereafter isotropic wet etching.

Assignments (2)

Priority Claims (1)

Continuity (1)

References Cited (30)