IP Library Granted Patent US 12,231,108
Granted Patent B2
US 12,231,108 · App. 18/340,764 · Granted Feb 18, 2025

Acoustic wave resonator, RF filter circuit and system

Inventors: Dae Ho Kim (Cornelius, NC); Mary Winters (Webster, NY); Ramakrishna Vetury (Charlotte, NC); Jeffrey B. Shealy (Davidson, NC)
Assignee: Akoustis, Inc.
H03H9/02015H03H3/02H03H9/02047H03H9/173H03H2003/025
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Quick Facts
Patent No.
US 12,231,108
App. No.
18/340,764
Granted
Feb 18, 2025
Kind
B2
Abstract

An RF filter system includes a plurality of bulk acoustic wave resonators arranged in a circuit having serial and parallel shunt configurations of resonators. Each resonator having a reflector, a support member including a surface, a first electrode including tungsten, overlying the reflector, a piezoelectric film including crystalline aluminum scandium nitride overlapping the first electrode, a second electrode including tungsten overlapping the piezoelectric film and the first electrode, and a passivation layer including silicon nitride overlying the second electrode. Portions of the support member surface of at least one resonator define a cavity region having a portion of the first electrode of the at least one resonator is located within the cavity region. The pass band circuit response has a bandwidth corresponding to a thickness of at least one of the first electrode, piezoelectric film, second electrode, and passivation layer. The system can include single crystal or polycrystalline BAW resonators.

Claims (28)

1. An RF filter system, comprising:

a plurality of bulk acoustic wave resonators arranged in a circuit, the circuit including a serial configuration of resonators and a parallel shunt configuration of resonators, the circuit having a circuit response corresponding to the serial configuration and the parallel configuration of the plurality of bulk acoustic wave resonators, each of the resonators of the plurality of resonators comprising:

a reflector;

a support member including a cavity region over the reflector;

a first electrode including tungsten overlying the reflector;

a piezoelectric film including crystalline aluminum scandium nitride overlapping the first electrode and overlying the reflector;

a second electrode including tungsten overlapping the piezoelectric film, overlapping the first electrode, and overlying the reflector; and

a passivation layer including silicon nitride overlying the second electrode, one or more portions of a surface of the support member of at least one resonator of the plurality of bulk acoustic wave resonators defining the cavity region and a portion of the first electrode of the at least one resonator being located within the cavity region defined by the surface of the support member, the support member including the cavity region being a first support member portion, the support member including a second support member portion, the reflector being located in the second support member portion, the first support member portion and the second support member portion including the same material,

wherein the circuit response of the circuit corresponding to the serial configuration and the parallel configuration of the plurality of resonators has a transmission loss from a pass band having a bandwidth corresponding to a thickness of at least one of the first electrode, the piezoelectric film, the second electrode, and the passivation layer.

2. A method of operating an RF filter system, comprising:

using a plurality of bulk acoustic wave resonators arranged in a circuit, the circuit including a serial configuration of resonators and a parallel shunt configuration of resonators, the circuit having a circuit response corresponding to the serial configuration and the parallel configuration of the plurality of bulk acoustic wave resonators, wherein each of the resonators of the plurality of resonators comprises:

a reflector including a multilayer mirror structure having two pairs of a low impedance material layer and a high impedance material layer when the material layers are compared to each other;

a support member including a cavity region over the reflector;

a first electrode including tungsten overlying the reflector;

a piezoelectric film including crystalline aluminum scandium nitride overlapping the first electrode and overlying the reflector;

a second electrode including tungsten overlapping the piezoelectric film, overlapping the first electrode, and overlying the reflector; and

a passivation layer including silicon nitride overlying the second electrode, one or more portions of a surface of the support member of at least one resonator of the plurality of bulk acoustic wave resonators defining the cavity region and a portion of the first electrode of the at least one resonator being located within the cavity region defined by the surface of the support member, the support member including the cavity region being a first support member portion, the support member including a second support member portion, the reflector being located in the second support member portion, the first support member portion and the second support member portion including the same material; and

responding using the circuit corresponding to the serial configuration and the parallel configuration of the plurality of resonators such that a pass band has a bandwidth corresponding to a thickness of at least one of the first electrode, the piezoelectric film, the second electrode, and the passivation layer.

3. A method of operating an RF filter system, comprising:

using a plurality of bulk acoustic wave resonators arranged in a circuit, the circuit including a serial configuration of resonators and a parallel shunt configuration of resonators, the circuit having a circuit response corresponding to the serial configuration and the parallel configuration of the plurality of bulk acoustic wave resonators, wherein each of the resonators of the plurality of resonators comprises:

a reflector including a multilayer mirror structure having two pairs of a low impedance material layer and a high impedance material layer when the material layers are compared to each other;

a support member including a cavity region over the reflector;

a first electrode including tungsten overlying the reflector;

a piezoelectric film including crystalline aluminum scandium nitride overlapping the first electrode and overlying the reflector;

a second electrode including tungsten overlapping the piezoelectric film, overlapping the first electrode, and overlying the reflector; and

a passivation layer including silicon nitride overlying the second electrode, one or more portions of a surface of the support member of at least one resonator of the plurality of bulk acoustic wave resonators defining the cavity region and a portion of the first electrode of the at least one resonator being located within the cavity region defined by the surface of the support member, the support member including the cavity region being a first support member portion and the support member including a second support member portion, the reflector being located in the second support member portion;

at least one resonator of the plurality of bulk acoustic wave resonators including at least one trimmed material layer such that the bandwidth of the pass band of the circuit corresponds to the thickness of the at least one trimmed material layer, wherein the at least one trimmed material layer includes a first thickness overlapping the piezoelectric film including crystalline aluminum scandium nitride and overlapping the first electrode that is thinner than a second thickness at a second location of the at least one trimmed material layer; and

responding using the circuit corresponding to the serial configuration and the parallel configuration of the plurality of resonators such that a pass band has a bandwidth corresponding to a thickness of at least one of the first electrode, the piezoelectric film, the second electrode, and the passivation layer.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 1, 2025
From: AKOUSTIS TECHNOLOGIES, INC.; AKOUSTIS, INC.; RFM INTEGRATED DEVICE INC.
To: TUNE HOLDINGS CORP.
Reel/Frame 071577/0095 →
CHANGE OF NAME Recorded Jul 1, 2025
From: TUNE HOLDINGS CORP.
To: AKOUSTIS TECHNOLOGIES CORP.
Reel/Frame 071782/0462 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 26, 2023
From: KIM, DAE HO; WINTERS, MARY; VETURY, RAMAKRISHNA; SHEALY, JEFFREY B.
To: AKOUSTIS, INC.
Reel/Frame 064059/0344 →
Continuity (9)
Continuation 17944475 · Sep 14, 2022
Continuation 16541076 · Aug 14, 2019
Continuation In Part 16290703 · Mar 1, 2019
Continuation In Part 16175650 · Oct 30, 2018
Continuation In Part 16175650 · Oct 30, 2018
Continuation In Part 16019267 · Jun 26, 2018
Continuation In Part 15784919 · Oct 16, 2017
Continuation In Part 15068510 · Mar 11, 2016
Related Publication 20230336139A1 · Oct 19, 2023
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