IP Library Granted Patent US 12,445,134
Granted Patent B1
US 12,445,134 · App. 18/391,438 · Granted Oct 14, 2025

Diode connected non-linear input capacitors based majority gate

Inventors: Amrita Mathuriya (Portland, OR); Rafael Rios (Austin, TX); Dmitri E. Nikonov (Beaverton, OR); Biswajeet Guha (Hillsboro, OR); Ikenna Odinaka (Durham, NC); Rajeev Kumar Dokania (Beaverton, OR); Sasikanth Manipatruni (Portland, OR)
Assignee: Kepler Computing Inc.
H03K19/23H03K19/185
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,445,134
App. No.
18/391,438
Granted
Oct 14, 2025
Kind
B1
Abstract

A logic gate includes a first capacitor to receive a first input, the first capacitor coupled to a node and a first diode structure coupled to the first input and the node. The logic gate future includes a second capacitor to receive a second input, the second capacitor coupled to the node and a second diode structure coupled to the second input and the node. The logic gate further includes a third capacitor to receive a third input, wherein the third capacitor is coupled to the node and a third diode structure coupled to the third input and the node.

Claims (71)

1. An apparatus comprising:

a first capacitor to receive a first input, the first capacitor coupled to a node;

a first diode structure coupled to the first input and the node;

a second capacitor to receive a second input, the second capacitor coupled to the node; and

a second diode structure coupled to the second input and the node.

2. The apparatus of claim 1 , further comprising:

a third capacitor to receive a third input, wherein the third capacitor is coupled to the node; and

a third diode structure coupled to the third input and the node.

3. The apparatus of claim 2 further comprising a driver circuitry having an input coupled to the node.

4. The apparatus of claim 1 , wherein the first diode structure includes:

a first diode including a first cathode terminal and a first anode terminal, wherein the first cathode terminal is coupled to the first input; and

a second diode including a second cathode terminal and a second anode terminal, wherein the second cathode terminal is coupled to the node, and wherein the second anode terminal is coupled to the first anode terminal.

5. The apparatus of claim 1 , wherein the second diode structure includes:

a third diode including a third cathode terminal and a third anode terminal, wherein the third cathode terminal is coupled to the second input; and

a fourth diode including a fourth cathode terminal and a fourth anode terminal, wherein the fourth cathode terminal is coupled to the node, and wherein the fourth anode terminal is coupled to the third anode terminal.

6. The apparatus of claim 2 , wherein the third diode structure includes:

a fifth diode including a fifth cathode terminal and a fifth anode terminal, wherein the fifth cathode terminal is coupled to the third input; and

a sixth diode including a sixth cathode terminal and a sixth anode terminal, wherein the sixth cathode terminal is coupled to the node, and wherein the sixth anode terminal is coupled to the fifth anode terminal.

7. The apparatus of claim 2 , wherein the first diode structure, the second diode structure, and the third diode structure comprise a diode, an n-p-n junction, or a Schottky barrier.

8. The apparatus of claim 2 , wherein the first capacitor, the second capacitor, and the third capacitor include non-linear polar material.

9. The apparatus of claim 8 , wherein the non-linear polar material includes one of: a ferroelectric material, a paraelectric material, or a non-linear dielectric.

10. The apparatus of claim 9 , wherein the ferroelectric material includes one of:

a first dielectric having a form ABB′O 3 , wherein “A” includes one of: Ba, K, Bi, Y, La, Sc, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, T, Yb, Lu, Li, Bi, K, or Na, wherein “B” includes one of Mn, Fe, Ta, or Nb, and wherein “B” includes one of: Sc, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, or Zn;

a second dielectric having a form AA′BO 3 , wherein “A” includes one of: Ba, K, Bi, Y, La, Sc, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, T, Yb, Lu, Li, Bi, K, or Na, wherein “B” includes one of Mn, Fe, Ta, or Nb, wherein “A′” includes one of Y, La, Sc, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, T, Yb, Lu, and wherein A′ comprises a valency of site A, but different ferroelectric polarizability from A;

a third dielectric having a form ABO 3 , wherein “A” includes one of: Ba, K, Bi, Y, La, Sc, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, T, Yb, Lu, Li, Bi, K, or Na, and wherein “B” includes one of Mn, Fe, Ta, or Nb;

bismuth ferrite (BFO), BFO with a first doping material, wherein the first doping material is one of lanthanum, elements from lanthanide series of a periodic table, or elements of 3d, 4d, 5d, 6d, 4f, or 5f series of periodic table;

lead zirconium titanate (PZT) or PZT with a second doping material, wherein the second doping material is one of La or Nb;

a perovskite material which includes one of: BaTiO 3 , PbTiO 3 , KNbO 3 , KNbO 3 , NaTaO 3 , wherein the perovskite material is doped with La or Lanthanides, chemically substituted lead titanate, and wherein Zr, La, or Nb is substituted in Ti site;

a relaxor ferroelectric material which includes one of: lead magnesium niobate (PMN), lead magnesium niobate-lead titanate (PMN-PT), lead lanthanum zirconate titanate (PLZT), lead scandium niobate (PSN), barium titanium-bismuth zinc niobium tantalum (BT-BZNT), or Barium titanium-barium strontium titanium (BT-BST);

a BaTiO 3 (BTO) based relaxor which includes one of: BaTiO 3 —Bi(Zn 1/2 Ti 1/2 )O 3 (BTO-BZT), BaTiO 3 —BiScO 3 (BTO-BS): BiScO 3 , Ba (1-x) Sr x TiO 3 (BST), BaTiO 3 —Pb(Mg 1/3 Nb 2/3 )O 3 (BTO-PMN), BaTi (1-x) Zr x O 3 (BTZ), BaTiO 3 —Pb(Zn 1/3 Nb 2/3 )O 3 (BTO-PZN), BaTiO 3 —Pb(Sc 1/2 Nb 1/2 )O 3 (BTO-PSN);

a PZT based relaxor which includes one of: PZT-Pb(Mg 1/3 Nb 2/3 )O 3 (PZT-PMN), PZT-Pb(Ni 1/3 Nb 2/3 )O 3 (PZT-PNN), PZT-Pb(Zn 1/3 Nb 2/3 )O 3 (PZT-PZN), PZT-Pb(Sc 1/2 Nb 1/2 )O 3 (PZT-PSN), PZT-Pb(Fe 1/2 Nb 1/2 )O 3 (PZT-PFN), PZT-Pb(La,Zr,Ti)O 3 (PZT-PLZT), or PZT-Pb(Ti,Mn)O 3 (PZT-PTM);

a SrBi 2 Ta 2 O 9 (SBT) based relaxor which includes one of: paraelectric SBT-SrBi 2 (Nb,Ta) 2 O 9 (SBT-SBNT), or SBT doped with one of: Mn, Fe, Co, La, Ce or Nd, Ba, or Ca;

a first hexagonal ferroelectric which includes one of: YMnO 3 or LuFeO 3 ;

a second hexagonal ferroelectric of a type RMnO 3 , where R is a rare earth element which includes one of: cerium (Ce), dysprosium (Dy), erbium (Er), europium (Eu), gadolinium (Gd), holmium (Ho), lanthanum (La), lutetium (Lu), neodymium (Nd), praseodymium (Pr), promethium (Pm), samarium (Sm), scandium (Sc), terbium (Tb), thulium (Tm), ytterbium (Yb), or yttrium (Y);

lithium niobate, lithium tantalate, lithium iron tantalum oxy fluoride, barium strontium niobate, sodium barium niobate, or potassium strontium niobate;

an improper ferroelectric material which includes one of: [PTO/STO]n or [LAO/STO]n, wherein ‘n’ is between 1 and 100;

Hafnium (Hf), Zirconium (Zr), Aluminum (Al), Silicon (Si), their oxides or their alloyed oxides;

Hafnium oxides of a form Hf (1-x) E x O y , where E includes one of: Al, Ca, Ce, Dy, Er, Gd, Ge, La, Sc, Si, Sr, Sn, Zr, or Y, wherein ‘x’ and ‘y’ are first and second fractions, respectively;

HfO 2 doped with one of: Al, Ca, Ce, Dy, Er, Gd, Ge, La, Sc, Si, Sr, Sn, or Y;

Al (1-x) Sc (x) N, Ga (1-x) Sc (x) N, Al (1-x) Y(x)Nor Al (1-x-y) Mg (x) Nb (y) N, wherein ‘x’ and ‘y’ are third and fourth fractions, respectively; or

LiNbO 3 , LiTaO 3 , LiTaO 2 F 2 , Sr (x) Ba (1-x) Nb 2 O 6 where 0.32≤x≤0.8, or KSr 2 Nb 5 O 15 ; or

a paraelectric material comprising SrTiO 3 , Ba (x) Sr (y) TiO 3 , HfZrO 2 , Hf—Si—O, or La-substituted PbTiO 3 .

11. The apparatus of claim 2 , wherein the first input, the second input, and the third input are digital signals.

12. The apparatus of claim 3 wherein the driver circuitry comprises a CMOS gate.

13. An apparatus comprising:

a set of devices coupled to a summation node, wherein the set of devices provide a capacitive majority function on the summation node over a first time scale, wherein the set of devices provide leakage to the summation node, wherein the leakage reinforces charge distribution on the summation node over a second time scale, and wherein the second time scale is longer than the first time scale.

14. The apparatus of claim 13 , wherein an individual device of the set of devices includes a capacitor having a non-linear polar material, and an n-p-n junction coupled in parallel to the capacitor.

15. The apparatus of claim 13 , wherein the set of devices includes:

a first capacitor to receive a first input, the first capacitor coupled to the summation node;

a first diode structure coupled to the first input and the summation node;

a second capacitor to receive a second input, the second capacitor coupled to the summation node;

a second diode structure coupled to the second input and the summation node;

a third capacitor to receive a third input, wherein the third capacitor is coupled to the summation node; and

a third diode structure coupled to the third input and the summation node.

16. The apparatus of claim 15 , wherein the first capacitor, the second capacitor, and the third capacitor provide an AC path over the first time scale, while the first diode structure, the second diode structure, and the third diode structure provide a DC path for the second time scale.

17. The apparatus of claim 15 , wherein the first diode structure, the second diode structure, and the third diode structure comprise a diode, an n-p-n junction, or a Schottky barrier, and wherein the first capacitor, the second capacitor, and the third capacitor include non-linear polar material.

18. A system comprising:

a processor circuitry to execute one or more instructions;

a communication interface communicatively coupled to the processor circuitry; and

a memory coupled to the processor circuitry, wherein the processor circuitry comprises:

a first capacitor to receive a first input, the first capacitor coupled to a node;

a first diode structure coupled to the first input and the node;

a second capacitor to receive a second input, the second capacitor coupled to the node; and

a second diode structure coupled to the second input and the node.

19. The system of claim 18 , wherein the processor circuitry further comprises:

a third capacitor to receive a third input, wherein the third capacitor is coupled to the node;

a third diode structure coupled to the third input and the node; and

a driver circuitry having an input coupled to the node.

20. The system of claim 18 , wherein the first diode structure includes:

a first diode including a first cathode terminal and a first anode terminal, wherein the first cathode terminal is coupled to the first input; and

a second diode including a second cathode terminal and a second anode terminal, wherein the second cathode terminal is coupled to the node, and wherein the second anode terminal is coupled to the first anode terminal.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 9, 2024
From: MATHURIYA, AMRITA; RIOS, RAFAEL; NIKONOV, DMITRI E.; GUHA, BISWAJEET; ODINAKA, IKENNA; DOKANIA, RAJEEV KUMAR; MANIPATRUNI, SASIKANTH
To: KEPLER COMPUTING INC.
Reel/Frame 066071/0202 →
References Cited (100)
US 3108193A · Schreiner · 1963 [cited by applicant]
US 3260863A · Burns et al. · 1966 [cited by applicant]
US 3524977A · Wang · 1970 [cited by applicant]
US 5381352A · Shou et al. · 1995 [cited by applicant]
US 5818380A · Ito et al. · 1998 [cited by applicant]
US 5835045A · Ogawa et al. · 1998 [cited by applicant]
US 5926057A · Ogawa et al. · 1999 [cited by applicant]
US 5978827A · Ichikawa · 1999 [cited by applicant]
US 6043675A · Miyamoto · 2000 [cited by applicant]
US 6166583A · Kochi et al. · 2000 [cited by applicant]
US 6198652B1 · Kawakubo et al. · 2001 [cited by applicant]
US 6208282B1 · Miyamoto · 2001 [cited by applicant]
US 7837110B1 · Hess et al. · 2010 [cited by applicant]
US 7897454B2 · Wang et al. · 2011 [cited by applicant]
US 8247855B2 · Summerfelt · 2012 [cited by applicant]
US 9276040B1 · Marshall et al. · 2016 [cited by applicant]
US 9305929B1 · Karda et al. · 2016 [cited by applicant]
US 9324405B2 · Evans, Jr. et al. · 2016 [cited by applicant]
US 9697882B1 · Evans, Jr. et al. · 2017 [cited by applicant]
US 9858979B1 · Derner et al. · 2018 [cited by applicant]
US 9973329B2 · Hood et al. · 2018 [cited by applicant]
US 10217522B2 · Wang et al. · 2019 [cited by applicant]
US 10446214B1 · Vincenzo et al. · 2019 [cited by applicant]
US 10679782B2 · Manipatruni et al. · 2020 [cited by applicant]
US 10944404B1 · Manipatruni et al. · 2021 [cited by applicant]
US 10951213B1 · Manipatruni et al. · 2021 [cited by applicant]
US 11043259B2 · Wentzlaff et al. · 2021 [cited by applicant]
US 11277137B1 · Manipatruni · 2022 [cited by examiner]
US 11418197B1 · Dokania et al. · 2022 [cited by applicant]
US 11501813B1 · Dokania et al. · 2022 [cited by applicant]
US 11521667B1 · Dokania et al. · 2022 [cited by applicant]
US 11641205B1 · Mathuriya et al. · 2023 [cited by applicant]
US 11652487B1 · Manipatruni et al. · 2023 [cited by applicant]
US 11664371B1 · Mathuriya et al. · 2023 [cited by applicant]
US 11696451B1 · Dokania et al. · 2023 [cited by applicant]
US 11967954B1 · Mathuriya · 2024 [cited by examiner]
US 20010052619A1 · Inoue et al. · 2001 [cited by applicant]
US 20020163058A1 · Chen et al. · 2002 [cited by applicant]
US 20040183508A1 · Toyoda et al. · 2004 [cited by applicant]
US 20090058460A1 · Kang · 2009 [cited by applicant]
US 20120107965A1 · Sashida · 2012 [cited by applicant]
US 20130057301A1 · Balachandran et al. · 2013 [cited by applicant]
US 20150337983A1 · Dolenti et al. · 2015 [cited by applicant]
US 20170243917A1 · Manipatruni et al. · 2017 [cited by applicant]
US 20170337983A1 · Wang et al. · 2017 [cited by applicant]
US 20180025766A1 · Dietrich et al. · 2018 [cited by applicant]
US 20180076815A1 · Vigeant et al. · 2018 [cited by applicant]
US 20180240583A1 · Manipatruni et al. · 2018 [cited by applicant]
US 20190051812A1 · Shih et al. · 2019 [cited by applicant]
US 20190074295A1 · Schröder · 2019 [cited by applicant]
US 20190318775A1 · Rakshit et al. · 2019 [cited by applicant]
US 20190348098A1 · El-Mansouri et al. · 2019 [cited by applicant]
US 20200051607A1 · Pan et al. · 2020 [cited by applicant]
US 20200091407A1 · Liu et al. · 2020 [cited by applicant]
US 20200091414A1 · Liu et al. · 2020 [cited by applicant]
US 20200210233A1 · Chen et al. · 2020 [cited by applicant]
US 20210203325A1 · Manipatruni et al. · 2021 [cited by applicant]
US 20220393686A1 · Manipatruni · 2022 [cited by examiner]
US 20230187476A1 · Sato et al. · 2023 [cited by applicant]
US 20250007484A1 · Sekhar · 2025 [cited by examiner]
CN 114362482A · 2022 [cited by examiner]
JP 2000156472A · 2000 [cited by applicant]
KR 20160089141A · 2016 [cited by applicant]
KR 20170099862A · 2017 [cited by applicant]
“Kepler Logic”, Named for Amalie Emmy Noether @ https://en.wikipedia.org/wiki/Emmy_Noether. Downloaded from internet on Jan. 10, 2020. [cited by applicant]
Fichtner, S. et al., “AlScN: A III-V semiconductor based ferroelectric”, Journal of Applied Physics 125, 114103 (2019); https://doi.org/10.1063/1.5084945, 2019, 28 pages. [cited by applicant]
Final Office Action notified Dec. 9, 2021 for U.S. Appl. No. 17/327,614. [cited by applicant]
International Preliminary Report on Patentability received Nov. 30, 2023 for PCT Patent Application No. / US2022/070445. [cited by applicant]
International Search Report & Written Opinion notified May 19, 2022 for PCT Patent Application No. PCT/US2022/070445. [cited by applicant]
Muller, J. et al., “Ferroelectric Hafnium Oxide Based Materials and Devices: Assessment of Current Status and Future Prospects”, ECS Journal of Solid State Science and Technology, 4 (5) N30-N35 (215). 6 pages. [cited by applicant]
Muroga, S., Threshold Logic and Its Applications, Wiley-Interscience, a Division of John Wiley & Sons, Inc. New York, 1971. 8 page excerpt. [cited by applicant]
Non-Final Office Action notified Apr. 6, 2023 for U.S. Appl. No. 17/659,981. [cited by applicant]
Non-Final Office Action notified Apr. 6, 2023 for U.S. Appl. No. 17/659,992. [cited by applicant]
Non-Final Office Action notified Apr. 14, 2023 for U.S. Appl. No. 17/327,662. [cited by applicant]
Non-Final Office Action notified Dec. 12, 2022 for U.S. Appl. No. 17/808,290. [cited by applicant]
Non-Final Office Action notified Jan. 24, 2022 for U.S. Appl. No. 17/327,648. [cited by applicant]
Non-Final Office Action notified Jan. 24, 2022 for U.S. Appl. No. 17/327,649. [cited by applicant]
Non-Final Office Action notified Jan. 24, 2022 for U.S. Appl. No. 17/327,659. [cited by applicant]
Non-Final Office Action notified Jul. 17, 2023 for U.S. Appl. No. 17/659,994. [cited by applicant]
Non-Final Office Action notified Mar. 16, 2023 for U.S. Appl. No. 17/327,660. [cited by applicant]
Non-Final Office Action notified Nov. 16, 2021 for U.S. Appl. No. 17/327,614. [cited by applicant]
Notice of Allowance notified Apr. 13, 2023 for U.S. Appl. No. 17/327,660. [cited by applicant]
Notice of Allowance notified Apr. 28, 2022 for U.S. Appl. No. 17/327,649. [cited by applicant]
Notice of Allowance notified Dec. 7, 2021 for U.S. Appl. No. 17/327,652. [cited by applicant]
Notice of Allowance notified Feb. 2, 2023 for U.S. Appl. No. 17/552,079. [cited by applicant]
Notice of Allowance notified Feb. 17, 2023 for U.S. Appl. No. 17/808,290. [cited by applicant]
Notice of Allowance notified Jan. 12, 2021 for U.S. Appl. No. 17/327,614. [cited by applicant]
Notice of Allowance notified Jan. 28, 2022 for U.S. Appl. No. 17/327,651. [cited by applicant]
Notice of Allowance notified Jan. 30, 2023 for U.S. Appl. No. 17/550,910. [cited by applicant]
Notice of Allowance notified Jan. 31, 2023 for U.S. Appl. No. 17/552,101. [cited by applicant]
Notice of Allowance notified Mar. 7, 2022 for U.S. Appl. No. 17/327,659. [cited by applicant]
Notice of Allowance notified Mar. 7, 2023 for U.S. Appl. No. 17/550,908. [cited by applicant]
Notice of Allowance notified Mar. 11, 2022 for U.S. Appl. No. 17/327,648. [cited by applicant]
Notice of Allowance notified Mar. 13, 2023 for U.S. Appl. No. 17/552,107. [cited by applicant]
Notice of Allowance notified Mar. 17, 2023 for U.S. Appl. No. 17/552,247. [cited by applicant]
Notice of Allowance notified May 1, 2023 for U.S. Appl. No. 17/659,981. [cited by applicant]
Notice of Allowance notified May 1, 2023 for U.S. Appl. No. 17/659,992. [cited by applicant]
Notice of Allowance notified May 15, 2023 for U.S. Appl. No. 17/327,662. [cited by applicant]
Notice of Allowance notified Oct. 31, 2023 for U.S. Appl. No. 17/659,994. [cited by applicant]
Subbarao, E., “Ferroelectric and antiferroelectric materials”, Department of Metallurgical Engineering, Indian Institute of Technology, Kanpur, IN. First published Mar. 15, 2011. Ferroelectrics, 5:1, 267-280. [cited by applicant]