PHOTORESIST IMAGING AND DEVELOPMENT FOR ENHANCED NOZZLE PLATE ADHESION

1 . A method for improving adhesion of a nozzle plate to a flow feature layer of a fluid ejection head comprising:

providing a silicon substrate having a device surface containing at least one array of fluid ejectors thereon;

spin-coating a photoresist material onto the device surface of the silicon substrate;

exposing the photoresist material to actinic radiation through a mask to provide the flow feature layer, wherein the mask contains opaque areas defining a plurality of fluid flow channels and fluid chambers in the photoresist material and masked areas adjacent to the plurality of fluid flow channels and fluid chambers, wherein the mask used in the masked areas adjacent to the plurality of fluid flow channels and fluid chambers contains a plurality of opaque geometric particles having a size ranging from about 1 to about 5 microns, wherein the opaque geometric particles are effective to provide a roughened surface area in the masked areas adjacent to the plurality of fluid flow channels and fluid chambers for increased adhesion between the roughened surface area of the photoresist material and a nozzle plate attached to the flow feature layer.

2 . The method of claim 1 , wherein the opaque geometric particles have a density in the mask that decreases an intensity of the actinic radiation by about 20 to about 50%.

3 . The method of claim 1 , wherein the opaque geometric particles cause concavities to be developed in the photoresist material that provide the roughened surface area adjacent to the plurality of fluid flow channels and fluid chambers.

4 . The method of claim 1 , wherein the opaque geometric particles cause geometric patterns selected from the group consisting of circles, triangles, rectangles, zig-zag lines, crosses, straight lines and spaces, dots, and combinations of two or more of the foregoing to be developed in the photoresist material to provide the roughened surface area of the flow feature layer.

5 . The method of claim 1 , wherein the photoresist material comprises a negative photoresist material.

6 . The method of claim 1 , wherein the opaque geometric particles comprise chrome particles.

7 . The method of claim 1 , wherein the opaque geometric particles in the mask have a particle density ranging from about 1.2% to about 55% of a total area of the mask.

8 . A method for making a fluid jet ejection head comprising:

providing a silicon substrate having a device surface containing at least one array of fluid ejectors thereon;

laminating or spin-coating a photoresist material onto the device surface of the silicon substrate;

exposing the photoresist material to actinic radiation through a mask to provide a flow feature layer, wherein the mask contains opaque areas defining a plurality of fluid flow channels and fluid chambers in the photoresist material and masked areas adjacent to the plurality of fluid flow channels and fluid chambers, wherein the mask used in the masked areas adjacent to the plurality of fluid flow channels and fluid chambers contains a plurality of opaque geometric particles having a size ranging from about 1 to about 5 microns, wherein the opaque geometric particles are effective to provide a roughened surface area in the masked areas adjacent to the plurality of fluid flow channels and fluid chambers for increased adhesion between a developed surface of the photoresist material and a nozzle plate attached to the roughened surface area of the flow feature layer;

etching a fluid supply via in the silicon substrate;

developing the photoresist material to provide the plurality of fluid flow channels and fluid chambers therein and the roughened surface area that provides improved surface adhesion characteristics; and

attaching a nozzle plate to the roughened surface area of the flow feature layer.

9 . The method of claim 8 , wherein the opaque geometric particles have a density in the mask that decrease an intensity of the actinic radiation by about 20 to about 50%.

10 . The method of claim 8 , wherein the opaque geometric particles cause concavities to be developed in the photoresist material that provide the roughened surface area adjacent to the plurality of fluid flow channels and fluid chambers.

11 . The method of claim 8 , wherein the opaque geometric particles cause geometric patterns selected from the group consisting of circles, triangles, rectangles, zig-zag lines, crosses, straight lines and spaces, dots, and combinations of two or more of the foregoing to be developed in the photoresist material to provide the roughened surface area of the flow feature layer.

12 . The method of claim 8 , wherein the photoresist material comprises a negative photoresist material.

13 . The method of claim 8 , wherein the nozzle plate is laminated to the surface of the flow feature layer in the absence of oxygen plasma treatment of roughened surface area of the flow feature layer.

14 . The method of claim 8 , wherein the nozzle plate is laminated to the surface of the flow feature layer in the absence of silane coating the roughened surface area of the flow feature.

15 . The method of claim 8 , wherein the opaque geometric particles comprise chrome particles.

16 . The method of claim 8 , wherein the opaque geometric particles in the mask have a particle density ranging from about 1.2% to about 55% of a total area of the mask.