IP Library › Granted Patent US 12,699,296
Granted Patent B2
US 12,699,296 · App. 18/473,094 · Granted Aug 4, 2026

Particle removal during fabrication of electrochromic devices

Inventor: Robert T. Rozbicki (Saratoga, CA)
Assignee: View Operating Corporation
G02F1/153C23C14/021C23C14/028C23C14/0635C23C14/0652C23C14/0676C23C14/08C23C14/081C23C14/083C23C14/086C23C14/34C23C14/588C23C14/5886G02F1/1309G02F1/133345G02F1/1523G02F1/1524G02F1/1533G02F1/155H01J37/32H01J37/32733H01J37/32853H01J37/3417H01J37/3429G02F1/1316G02F2001/1536G02F2001/1555
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Quick Facts
Patent No.
US 12,699,296
App. No.
18/473,094
Filed
Sep 22, 2023
Granted
Aug 4, 2026
Kind
B2
Art Unit
2872
USPC
216/37
Abstract

Electrochromic devices are fabricated using a particle removal operation that reduces the occurrence of electronically conducting layers and/or electrochromically active layers from contacting layers of the opposite polarity and creating a short circuit in regions where defects form. In some embodiments, the particle removal operation is not a lithiation operation. In some embodiments, the particle removal operation is performed at an intermediate stage during the deposition of either an electrochromic layer or a counter electrode layer.

Claims (17)

1 . An apparatus for fabricating an electrochromic device, the apparatus comprising:

(a) an integrated deposition system for forming an electrochromic stack on a substrate, the system comprising:

(i) a first deposition station containing a first target comprising a first material for depositing a layer of an electrochromic material on a substrate when the substrate is positioned in the first deposition station;

(ii) a second deposition station containing a second target comprising a second material for depositing a layer of a counter electrode material on the substrate when the substrate is positioned in the second deposition station;

(iii) a particle-removal device for removing particles from a surface of the substrate and/or the surface of the electrochromic stack before it is fully-formed;

(iv) a track configured to move the substrate from the first deposition station to the second deposition station; and

(v) a pallet hanging vertically from the track, configured to position the substrate in a vertical orientation; and

(b) a controller comprising:

program instructions for passing the substrate through the first and second deposition stations in a manner that sequentially deposits a stack on the substrate, the stack comprising the layer of electrochromic material and the layer of counter electrode material; and

program instructions for operating the particle-removal device to remove particles from the surface of the substrate and/or the surface of the electrochromic stack before it is fully-formed,

wherein at least one of the pallet and the first target or the second target is configured to move in two opposing linear directions relative to the other during deposition of the first material or the second material.

2 . The apparatus of claim 1 , wherein the program instructions comprise instructions for operating the particle-removal device to remove particles before the layer of electrochromic material is fully-formed.

3 . The apparatus of claim 1 , wherein the program instructions comprise instructions for operating the particle-removal device to remove particles before the counter electrode layer is fully formed.

4 . The apparatus of claim 1 , wherein operation of the particle-removal device reduces the number of visible short-related pinhole defects in the fabricated electrochromic device to a level no greater than about 0.005 per square centimeter.

5 . The apparatus of any of claim 1 , wherein the integrated deposition system further comprises:

(v) a third deposition station containing a third target comprising a third material, wherein the third deposition station is configured to deposit an electrode layer on the electrochromic stack when the substrate having the electrochromic stack is positioned in the third deposition station, and wherein the electrode layer comprises a transparent electronically conductive material.

6 . The apparatus of claim 1 , wherein at least one of the first target and the second target comprises a roller that rotates about an axis that is substantially parallel to a plane formed by the substrate, the roller having an outer surface configured to make contact with a surface of the substrate.

Assignments (2)
MERGER AND CHANGE OF NAME Recorded Dec 19, 2024
From: VIEW, INC.; PVMS MERGER SUB, INC.; VIEW OPERATING CORPORATION
To: VIEW OPERATING CORPORATION
Reel/Frame 069743/0586 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 25, 2023
From: ROZBICKI, ROBERT
To: VIEW, INC.
Reel/Frame 065343/0868 →
Continuity (18)
Continuation 16868455 · May 6, 2020
Continuation 16836420 · Mar 31, 2020
Continuation 16719700 · Dec 18, 2019
Continuation In Part 16209514 · Dec 4, 2018
Continuation 15331526 · Oct 21, 2016
Continuation 15086438 · Mar 31, 2016
Continuation 14885734 · Oct 16, 2015
Continuation In Part 14885734 · Oct 16, 2015
Continuation 14884683 · Oct 15, 2015
Continuation PCTUS2015026150 · Apr 16, 2015
Continuation 14601141 · Jan 20, 2015
Continuation 13763505 · Feb 8, 2013
Continuation In Part PCTUS2012057606 · Sep 27, 2012
Continuation 12645111 · Dec 22, 2009
Provisional Application 61982427 · Apr 22, 2014
Provisional Application 61541999 · Sep 30, 2011
Provisional Application 61165484 · Mar 31, 2009
Related Publication 20240012306A1 · Jan 11, 2024
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