Semiconductor light emitting device and method of fabricating the same
A semiconductor light-emitting device comprises a substrate; a first adhesive layer on the substrate; multiple epitaxial units on the first adhesive layer; a second adhesive layer on the multiple epitaxial units; multiple first electrodes between the first adhesive layer and the multiple epitaxial units, and contacting the first adhesive layer and the multiple epitaxial units; and multiple second electrodes between the second adhesive layer and the multiple epitaxial units, and contacting the second adhesive layer and the multiple epitaxial units; wherein the multiple epitaxial units are totally separated.
1 . A method of forming a semiconductor light-emitting device, comprising the steps of:
providing a first substrate;
forming a semiconductor epitaxial stack on the first substrate;
dividing the semiconductor epitaxial stack to multiple epitaxial units;
forming an adhesive layer on some of the multiple epitaxial units; providing a second substrate; and
transferring the some of the multiple epitaxial units to the second substrate;
wherein the adhesive layer comprises ITO, IZO, InO, SnO, FTO, ATO, CTO, AZO, GZO or the combination thereof.
2 . The method of forming a semiconductor light-emitting device according to claim 1 , further comprising forming multiple electrodes between the adhesive layer and the multiple epitaxial units.
3 . The method of forming a semiconductor light-emitting device according to claim 2 , wherein each of the multiple electrodes contacts the adhesive layer and a corresponding one of the multiple epitaxial units.
4 . The method of forming a semiconductor light-emitting device according to claim 2 , wherein the multiple electrodes comprise a metal material.
5 . The method of forming a semiconductor light-emitting device according to claim 4 , wherein the metal material comprises Au, Ag, Cu, Al, Pt, Ni, Ti or Sn.
6 . The method of forming a semiconductor light-emitting device according to claim 1 , wherein the adhesive layer comprises a first portion and a second portion, and the first portion and the second portion are totally separated.
7 . The method of forming a semiconductor light-emitting device according to claim 6 , wherein the first portion and the second portion are corresponding to different epitaxial units.
8 . The method of forming a semiconductor light-emitting device according to claim 1 , wherein the epitaxial unit comprises: a first type conductivity semiconductor layer on the first substrate; a second type conductivity semiconductor layer on the first type conductivity semiconductor layer; and an active layer between the first type conductivity semiconductor layer and the second type conductivity semiconductor layer.
9 . The method of forming a semiconductor light-emitting device according to claim 1 , furthering comprising removing the some of the multiple epitaxial units from the first substrate.
10 . The method of forming a semiconductor light-emitting device according to claim 9 , after removing the some of the multiple epitaxial units from the first substrate, the exposed surfaces of the some of the multiple epitaxial units are rough.
11 . The method of forming a semiconductor light-emitting device according to claim 10 , the exposed surfaces of the some of the multiple epitaxial units are roughened by dry etching or wet etching.