Systems, methods, and devices for generating predominantly radially expanded plasma flow
Systems, devices, and methods generating a plasma flow are disclosed. A method may include applying energy that alternates between being at a base level for a first duration and at a pulse level for a second duration according to a controlled pattern, generating a plasma flow having a directional axis, and discharging the plasma flow alternating between a base configuration and a pulse configuration according to the controlled pattern. The plasma flow in the base configuration may have (1) a first temperature at the outlet and (2) a first flow front that advances along the directional axis. The plasma flow in the pulse configuration may have (1) a second temperature at the outlet that is greater than the first temperature and (2) a second flow front that advances along the directional axis at a speed greater than the first flow front.
1. A method, comprising:
supplying a plasma-generating gas to a plasma generating device having an outlet;
applying energy to the plasma-generating gas according to a predetermined energy pattern; and
discharging, in response to applying the energy, a plasma flow from the outlet of the plasma generating device, the plasma flow having a periodic pattern including a base plasma flow and a pulse plasma flow,
the base plasma flow having a first temperature at the outlet of the device, and the pulse plasma flow having a second temperature at the outlet of the device that is greater than the first temperature, the first temperature at the outlet being no greater than 10,000K and the second temperature at the outlet of the device being no greater than 20,000K,
the plasma flow having a first density at the first temperature, and the pulse plasma flow having a second density at the second temperature, the first density being at least two times the second density,
the base plasma flow having a first speed of sound, and the pulse plasma flow having a second speed of sound that is at most four times greater than the first speed of sound.
2. The method of claim 1 , wherein the first temperature at the outlet is equal to or greater than 2,000K.
3. The method of claim 1 , wherein the pattern includes alternating between discharging the base plasma flow for a base duration and discharging the pulse plasma flow for a pulse duration, the pulse duration being less than the base duration.
4. The method of claim 3 , wherein the plasma-generating gas is supplied at a predetermined flow rate, and
the sum of the base duration and the pulse duration is based at least in part on the flow rate.
5. The method of claim 4 , wherein the sum of the base duration and the pulse duration is further based on the second temperature.
6. The method of claim 3 , wherein a frequency of the alternating between the base plasma flow and the pulse plasma flow is greater than 1 kHz.
7. A method, comprising:
supplying a plasma-generating gas to a plasma generating device having an outlet;
applying energy to the plasma-generating gas according to a predetermined energy pattern; and
discharging, in response to applying the energy, a plasma flow from the outlet of the plasma generating device, the plasma flow having a periodic pattern including a base plasma flow and a pulse plasma flow,
the base plasma flow having a first temperature at the outlet of the device, and the pulse plasma flow having a second temperature at the outlet of the device that is greater than the first temperature, the second temperature at the outlet of the device being no greater than 20,000K,
wherein a ratio of a speed of sound of the base plasma flow to a speed of sound of the pulse plasma flow is between 0.25 to 0.60.
8. The method of claim 7 , wherein the first temperature at the outlet is no greater than 10,000K.
9. The method of claim 7 , wherein the first temperature at the outlet is equal to or greater than 2,000K.
10. The method of claim 7 , wherein the pattern includes alternating between discharging the base plasma flow for a base duration and discharging the pulse plasma flow for a pulse duration, the pulse duration being less than the base duration.
11. The method of claim 10 , wherein the plasma-generating gas is supplied at a predetermined flow rate, and
the sum of the base duration and the pulse duration is based at least in part on the flow rate.
12. The method of claim 11 , wherein the sum of the base duration and the pulse duration is further based on the second temperature.
13. The method of claim 10 , wherein a frequency of the alternating between the base plasma flow and the pulse plasma flow is greater than 1 kHz.
14. A system, comprising:
a power supply for a current control generator configured to generate a current wave having a low current level and pulses reaching a high current level according to a controlled pattern; and
a plasma-generating device operatively coupled to the current control generator, the plasma-generating device configured to:
heat a plasma-generating gas to a first temperature for a first duration of time t 1 with the current wave at the low current level;
heat the plasma-generating gas to a second temperature for a second duration of time t 2 with the current wave at the high current level;
discharge from an outlet of the plasma-generating device, after heating the plasma-generating gas at the first and second temperatures, a base plasma flow and a pulse plasma flow that interact to form a radially expanded plasma flow, wherein a length of the base plasma flow equals a length of the pulse plasma flow at a time equal to t 1 +t 2 .
15. The system of claim 14 , wherein the plasma flow includes an active zone defined by plasma having a temperature above 1,000 K, the active zone having a diameter that is at least ten times greater than a diameter of the outlet.
16. The system of claim 14 , wherein the plasma-generating device is configured to iteratively perform the heating the plasma-generating gas to the first temperature, the heating the plasma-generating gas to the second temperature, and the discharging the base plasma flow and the pulse plasma flow.
17. The system of claim 16 , wherein the plasma-generating device is configured to alternate between discharging the base plasma flow and the pulse plasma flow.
18. The system of claim 14 , wherein the base plasma flow has a temperature at the outlet that is no greater than 10,000K, and the pulse plasma flow has a temperature at the outlet being no greater than 20,000K.
19. The system of claim 14 , wherein the base plasma flow has a temperature at the outlet of between 2,000K and 10,000K.
20. The system of claim 14 , wherein a ratio of a speed of sound of the base plasma flow to a speed of sound of the pulse plasma flow is between 0.25 to 0.60.