IMPRINT LITHOGRAPHY PROCESS AND METHODS ON CURVED SURFACES

1 . A method, comprising:

depositing a first patterning material on a curved surface;

positioning a superstrate over the patterning material, the superstrate comprising a template associated with a pattern;

applying, using the first patterning material, a force between the curved surface and the superstrate;

curing the first patterning material, said curing resulting in a cured patterning material comprising the pattern; and

removing the superstrate.

2 . The method of claim 1 , further comprising forming an optical structure using the pattern.

3 . The method of claim 1 , wherein the curved surface comprises one or more nano-channel arrangements.

4 . The method of claim 1 , wherein the force comprises a capillary force.

5 . The method of claim 1 , wherein the force is based on one or more of a thickness of the patterning material and a contact angle of the patterning material.

6 . The method of claim 1 , wherein the force maintains a position of the applied superstrate relative to the curved surface.

7 . The method of claim 1 , wherein depositing the patterning material on the curved surface comprises inkjetting the patterning material.

8 . The method of claim 1 , wherein positioning the superstrate over the patterning material comprises applying a force on the superstrate to bend the superstrate toward the curved surface.

9 . The method of claim 1 , wherein the superstrate comprises a flexible coated resist template.

10 . The method of claim 1 , wherein the superstrate comprises one or more of Polycarbonate and polyethylene terephthalate.

11 . The method of claim 1 , wherein the superstrate has a thickness of 50-550 μm.

12 . The method of claim 1 , wherein the superstrate has an elastic modulus less than 10 GPa.

13 . The method of claim 1 , further comprising coating the pattern with a release layer.

14 . The method of claim 1 , further comprising bonding the patterning material with the curved surface via a covalent bond.

15 . The method of claim 1 , wherein:

the first patterning material has a first volume,

the first patterning material is deposited at a first location with respect to the curved surface, and

the method further comprises depositing a second patterning material having a second volume at a second location with respect to the curved surface, wherein:

a first thickness of the first patterning material at the first location corresponds to a thickness of the first volume, and

a second thickness of the second patterning material at the second location corresponds to a thickness of the second volume.

16 . The method of claim 1 , wherein:

the first patterning material comprises a first material,

the first patterning material is deposited at a first location with respect to the curved surface, and

the method further comprises depositing a second patterning material comprising a second material at a second location with respect to the curved surface, wherein:

a first thickness of the first patterning material at the first location corresponds to a property of the first material, and

a second thickness of the second patterning material at the second location corresponds to a property of the second material.

17 . The method of claim 1 , wherein:

the first patterning material is deposited at a plurality of first locations of the curved surface, the first locations separated by first intervals,

the cured patterning material further comprises a second pattern, and

the method further comprises depositing a second patterning material at a plurality of second locations of the curved surface, the second locations separated by second intervals, wherein:

the first intervals correspond to a first thickness for applying the first force for creating the first pattern, and

the second intervals correspond to a second thickness for applying a second force for creating the second pattern.

18 . The method of claim 1 , further comprising transferring, via etching, the pattern onto the curved surface.

19 . An optical stack comprising an optical feature, wherein the optical feature is formed using a method comprising:

depositing a first patterning material on a curved surface;

positioning a superstrate over the first patterning material, the superstrate comprising a template associated with a pattern, wherein the optical feature comprises the pattern;

applying, using the first patterning material, a force between the curved surface and the superstrate;

curing the first patterning material, said curing resulting in a cured patterning material comprising the pattern; and

removing the superstrate.

20 . A system comprising:

a wearable head device comprising a display, wherein:

the display comprises an optical stack comprising an optical feature, and

the optical feature is formed using a method comprising:

depositing a first patterning material on a curved surface;

positioning a superstrate over the patterning material, the superstrate comprising a template associated with a pattern, wherein the optical feature comprises the pattern;

applying, using the first patterning material, a force between the curved surface and the superstrate;

curing the first patterning material, said curing resulting in a cured patterning material comprising the pattern; and

removing the superstrate; and

one or more processors configured to execute a method comprising:

presenting, on the display, content associated with a mixed reality environment, wherein the content is presented based on the optical feature.