Exposure apparatus
An exposure apparatus includes a conveying mechanism and an exposure mechanism. The conveying mechanism is configured to convey a substrate, a surface of the substrate being coated with photoresist. The exposure mechanism includes an exposure source and an exposure member. The exposure source is configured to provide light to the substrate. The exposure member includes an exposure section opposite the substrate, where the exposure section is located between the exposure source and the substrate and disposed in close proximity to the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate.
1 . An exposure apparatus comprising:
a conveying mechanism configured to convey a substrate, a surface of the substrate being coated with photoresist; and
an exposure mechanism, comprising:
a plurality of exposure sources spaced apart from each other and configured to provide light to the substrate;
an exposure member comprising an exposure section opposite the substrate, wherein the exposure section is located between the exposure source and the substrate, the exposure section has a light-transmitting portion that allows light to be incident on the substrate and a light-shielding portion that prevents light from being incident on the substrate, and the exposure section is configured to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate; and
a drive assembly configured to drive the exposure member to move to keep the light-transmitting portion and the light-shielding portion in synchronized movement with the substrate, and comprising:
a first drive roller and a second drive roller spaced apart, the exposure member being wound around the first drive roller and the second drive roller, and a part of the exposure member between the first drive roller and the second drive roller forming the exposure section; and
a plurality of third drive rollers provided on a side of the exposure section facing away from the substrate, at least one of the plurality of third drive rollers being provided between two adjacent exposure sources of the plurality of exposure sources.
2 . The exposure apparatus according to claim 1 , wherein the drive assembly further comprises a fourth drive roller and a fifth drive roller, the first drive roller, the second drive roller, the fourth drive roller, and the fifth drive roller are distributed at four corners of a rectangle, and the exposure member is wound around the first drive roller, the second drive roller, the fourth drive roller, and the fifth drive roller.
3 . The exposure apparatus according to claim 1 , wherein the exposure member is a closed-loop structure with ends connected.
4 . The exposure apparatus according to claim 1 , wherein the light-shielding portion is one of a plurality of light-shielding portions arranged in a rectangular array.
5 . The exposure apparatus according to claim 1 , wherein the exposure mechanism is one of two exposure mechanisms located on two sides of the substrate, respectively.
6 . The exposure apparatus according to claim 1 , wherein the conveying mechanism comprises a discharge roller and a winding roller, the discharge roller being configured to release the substrate, the winding roller being provided downstream of the discharge roller, and the winding roller being configured to wind the substrate released by the discharge roller.
7 . The exposure apparatus according to claim 6 , wherein the conveying mechanism further comprises a fourth drive roller, the fourth drive roller being provided downstream of the discharge roller and upstream of the winding roller, and the fourth drive roller being configured to convey the substrate from the discharge roller to the winding roller.
8 . The exposure apparatus according to claim 1 , wherein the substrate is a current collector coated with photoresist, the exposure member is a mask film, and/or the exposure source is an ultraviolet light source.
9 . The exposure apparatus according to claim 1 ,
wherein the exposure mechanism is a first mechanism,
the exposure apparatus further comprising:
a second exposure mechanism, the first exposure mechanism and the second exposure mechanism being located on two opposite sides of the substrate, a structure of the second exposure mechanism being different from a structure of the first exposure mechanism, and the first exposure mechanism and the second exposure mechanism being configured to operate simultaneously.