SEMICONDUCTOR DEVICE, CORRESPONDING MANUFACTURING METHOD AND SUBSTRATE FOR USE THEREIN
A semiconductor die is arranged at a first surface of a die pad. The die pad has a peripheral edge and a second surface opposite to the first surface that includes a first region and a second region surrounding the first region. The second region extends to the peripheral edge of the die pad from a border line at the first region and includes a recessed formation extending continuously along the border line. An insulating encapsulation is molded onto the die pad with the first region of the second surface left uncovered and the second region of the second surface of the die pad being covered by the insulating encapsulation that fills the recessed formation. The recessed formation has a variable recess depth between the border line and the peripheral edge of the die pad to provide an extended length delamination path from the border line to the semiconductor die.
1 . A device, comprising:
a semiconductor die arranged at a first surface of a die pad, the die pad having a peripheral edge and a second surface opposite to the first surface, the second surface of the die pad comprising a first region and a second region surrounding the first region, wherein the second region extends from a border line at the first region to the peripheral edge of the die pad and comprises a recessed formation extending continuously along the border line at the first region; and
an insulating encapsulation molded onto the die pad having the at least one semiconductor die arranged on the first surface, wherein the first region of the second surface of the die pad is left uncovered by the insulating encapsulation and the second region of the second surface of the die pad is covered by the insulating encapsulation;
wherein the insulating encapsulation fills the recessed formation with a pad-to-encapsulation interface at said border line; and
wherein the recessed formation has a variable recess depth between said border line and the peripheral edge of the die pad.
2 . The device of claim 1 , wherein the recessed formation comprises at least one groove extending continuously along the border line.
3 . The device of claim 1 , wherein the recessed formation comprises a plurality of grooves extending side-by-side along the border line.
4 . The device of claim 1 , wherein the recessed formation comprises at least one triangular cross-sectional profile from said border line to the peripheral edge of the die pad.
5 . The device of claim 1 , wherein the recessed formation comprises a plurality of grooves extending side-by-side along the border line, each groove of the plurality of grooves having a triangular cross-sectional profile; and wherein the triangular cross-sectional profiles of the groove for the recessed formation define a sawtooth cross-sectional profile from said border line to the peripheral edge of the die pad.
6 . The device of claim 1 , wherein the recessed formation has a decreasing recess depth from said border line to the peripheral edge of the die pad.
7 . A method, comprising:
arranging at least one semiconductor die at a first surface of a die pad, the die pad having a peripheral edge and a second surface opposite to the first surface, the second surface of the die pad comprising a first region and a second region surrounding the first region, wherein the second region extends from a border line at the first region to the peripheral edge of the die pad and comprises a recessed formation extending continuously along the border line at the first region; and
molding an insulating encapsulation onto the die pad having the at least one semiconductor die arranged on the first surface, wherein the insulating encapsulation leaves the first region of the second surface of the die pad uncovered by the insulating encapsulation and covers the second region of the second surface of the die pad;
wherein the insulating encapsulation fills the recessed formation and provides a pad-to-encapsulation interface at said border line; and
wherein the recessed formation has a variable recess depth between said border line and the peripheral edge of the die pad.
8 . The method of claim 7 , wherein the recessed formation comprises at least one groove extending continuously along the border line.
9 . The method of claim 7 , wherein the recessed formation comprises a plurality of grooves extending side-by-side along the border line.
10 . The method of claim 7 , wherein the recessed formation comprises at least one triangular cross-sectional profile from said border line to the peripheral edge of the die pad.
11 . The method of claim 7 , wherein the recessed formation comprises a plurality of grooves extending side-by-side along the border line, each groove of the plurality of grooves having a triangular cross-sectional profile; and wherein the triangular cross-sectional profiles of the groove for the recessed formation define a sawtooth cross-sectional profile from said border line to the peripheral edge of the die pad.
12 . The method of claim 7 , wherein the recessed formation has a decreasing recess depth from said border line to the peripheral edge of the die pad.
13 . A substrate for use in manufacturing semiconductor devices, the substrate comprising:
die pad having a first surface, a peripheral edge and a second surface opposite to the first surface, the second surface of the die pad comprising a first region and a second region surrounding the first region, wherein the second region extends from a border line at the first region to the peripheral edge of the die pad and comprises a recessed formation extending continuously along the border line at the first region;
wherein the recessed formation has a variable recess depth between said border line and the peripheral edge of the die pad.
14 . The substrate of claim 13 , wherein:
the recessed formation comprises at least one groove extending continuously along the border line to the first region.
15 . The substrate of claim 13 , wherein:
the recessed formation comprises at least one triangular cross-sectional profile from said border line to the peripheral edge of the die pad.
16 . The substrate of claim 13 , wherein:
the recessed formation has a decreasing recess depth from said border line to the peripheral edge of the die pad.
17 . A device, comprising:
a die pad having a first surface, a peripheral edge and a second surface opposite to the first surface;
a semiconductor die arranged at the first surface of the die pad;
wherein the second surface includes a recessed formation comprising a plurality of grooves extending side-by-side parallel to the peripheral edge, each groove of the plurality of grooves having a right triangular cross-sectional profile;
wherein the triangular cross-sectional profiles of the grooves define a sawtooth cross-sectional profile extending inwardly from the peripheral edge of the die pad; and
an insulating encapsulation molded onto the semiconductor die and the die pad, said insulating encapsulation completely covering the sawtooth cross-sectional profile.