IP Library Granted Patent US 12,193,569
Granted Patent B1
US 12,193,569 · App. 18/648,253 · Granted Jan 14, 2025

Desktop workspace that adjusts vertically

Inventor: Nathan Mark Poniatowski (St. Petersburg, FL)
Assignee: Office Kick, Inc.
A47B9/16A47B21/02A47B21/0314A47B21/04A47B2021/0335
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,193,569
App. No.
18/648,253
Granted
Jan 14, 2025
Kind
B1
Abstract

A desktop workspace that adjusts vertically includes a work surface platform, a base configured to sit on an existing platform, such as a desk, a height adjustable mechanism including at least one set of arms that connect at a pivot point(s) creating a scissoring motion to raise and lower the said work surface platform to various heights. A locking and unlocking mechanism may connect to the height adjustable mechanism. In some cases, the apparatus includes an adjustable mechanism to support items such as a keyboard. In some cases, the apparatus includes elements to raise items such as a monitor to an additional height.

Claims (67)

1. A desktop workspace that adjusts vertically, comprising:

a work surface platform;

a base configured to sit on an existing platform;

a height adjustment mechanism connecting the work surface platform and the base, the height adjustment mechanism including:

a set of pivot arms including a base pivot arm pivotably connected to the base and a platform pivot arm pivotably connected to the work surface platform, the base pivot arm pivotably connected to the platform pivot arm to provide a scissoring motion when raising and lowering the work surface platform to various heights;

a first sliding mechanism on an end of the platform pivot arm between the end of the platform pivot arm and the base; and

a second sliding mechanism on an end of the base pivot arm between the end of the base pivot arm and the work surface platform; and

a force applying mechanism attached to the height adjustment mechanism to provide a force to assist in elevation of the work surface platform,

wherein the force applying mechanism is a spring that acts as a locking device that holds the work surface platform at various heights above the base,

wherein the force applying mechanism is adjacent an underside of the work surface platform and extends between an underside of the work surface platform and the height adjustment mechanism along a direction generally parallel to a work surface of the work surface platform.

2. The desktop workspace of claim 1 , wherein the base pivot arm is a first base pivot arm, the height adjustment mechanism further comprising:

a second base pivot arm; and

an element that connects the first base pivot arm to the second base pivot arm,

wherein the force applying mechanism is attached to the element.

3. The desktop workspace of claim 2 , wherein the element is attached on the same side of the base pivot arm as the second sliding mechanism relative to the pivot connection between the base pivot arm and the platform pivot arm.

4. The desktop workspace of claim 2 , wherein the element includes a cross beam.

5. The desktop workspace of claim 1 , wherein the platform pivot arm is a first platform pivot arm, the height adjustment mechanism further comprising a second platform pivot arm.

6. The desktop workspace of claim 1 , wherein the scissoring motion when raising and lowering the work surface platform to various heights of the height adjustment mechanism moves the work surface platform parallel to the existing platform.

7. The desktop workspace of claim 6 , wherein the scissoring motion when raising and lowering the work surface platform to various heights of the height adjustment mechanism moves the work surface platform without moving back and forth or left to right.

8. The desktop workspace of claim 1 , further comprising a keyboard platform that protrudes out, down, and parallel to the work surface platform.

9. The desktop workspace of claim 8 , further comprising a keyboard tray mechanism configured to hold the keyboard platform in the position that protrudes out, down, and parallel to the work surface platform and to allow the keyboard platform to be stored under the work surface platform.

10. The desktop workspace of claim 1 , wherein the locking device includes a user-operated handle for controlling the locking device.

11. The desktop workspace of claim 1 , further comprising a keyboard holder.

12. The desktop workspace of claim 1 , wherein the force applying mechanism is configured to apply pushing and pulling forces to move the set of pivot arms in the scissoring motion.

13. The desktop workspace of claim 1 , wherein the force to assist in elevation of the work surface platform extends along the direction generally parallel to the work surface of the work surface platform.

14. The desktop workspace of claim 1 , wherein the force applying mechanism acts as a locking device that holds the work surface platform at any various height above the base chosen by a user.

15. A desktop workspace that adjusts vertically, comprising:

a work surface platform;

a base configured to sit on an existing platform;

a height adjustment mechanism connecting the work surface platform and the base, the height adjustment mechanism including:

a set of pivot arms including a base pivot arm pivotably connected to the base and a platform pivot arm pivotably connected to the work surface platform, the base pivot arm pivotably connected to the platform pivot arm to provide a scissoring motion when raising and lowering the work surface platform to various heights;

a first sliding mechanism on an end of the platform pivot arm between the end of the platform pivot arm and the base; and

a second sliding mechanism on an end of the base pivot arm between the end of the base pivot arm and the work surface platform:

a force applying mechanism attached to the height adjustment mechanism to provide a force to assist in elevation of the work surface platform,

wherein the force applying mechanism is adjacent an underside of the work surface platform and extends between an underside of the work surface platform and the height adjustment mechanism along a direction generally parallel to a work surface of the work surface platform; and

a locking device that holds the work surface platform at various heights above the base,

wherein the locking device includes a handle that a user pulls on to unlock the locking device.

16. A desktop workspace that adjusts vertically, comprising:

a work surface platform;

a base configured to sit on an existing platform;

a height adjustment mechanism connecting the work surface platform and the base, the height adjustment mechanism including:

a set of pivot arms including a base pivot arm pivotably connected to the base and a platform pivot arm pivotably connected to the work surface platform, the base pivot arm pivotably connected to the platform pivot arm to provide a scissoring motion when raising and lowering the work surface platform to various heights;

a first sliding mechanism on an end of the platform pivot arm between the end of the platform pivot arm and the base; and

a second sliding mechanism on an end of the base pivot arm between the end of the base pivot arm and the work surface platform; and

a force applying mechanism attached to the height adjustment mechanism to provide a force to assist in elevation of the work surface platform,

wherein the force applying mechanism comprises a motorized linear actuator,

wherein the force applying mechanism is adjacent an underside of the work surface platform and extends between an underside of the work surface platform and the height adjustment mechanism along a direction generally parallel to a work surface of the work surface platform.

17. A desktop workspace that adjusts vertically, comprising:

a work surface platform;

a base configured to sit on an existing platform;

a height adjustment mechanism connecting the work surface platform and the base, the height adjustment mechanism including:

a set of pivot arms including a base pivot arm pivotably connected to the base and a platform pivot arm pivotably connected to the work surface platform, the base pivot arm pivotably connected to the platform pivot arm to provide a scissoring motion when raising and lowering the work surface platform to various heights;

a first sliding mechanism on an end of the platform pivot arm between the end of the platform pivot arm and the base; and

a second sliding mechanism on an end of the base pivot arm between the end of the base pivot arm and the work surface platform; and

a force applying mechanism attached to the height adjustment mechanism to provide a force to assist in elevation of the work surface platform,

wherein the force applying mechanism comprises a motor,

wherein the force applying mechanism is adjacent an underside of the work surface platform and extends between an underside of the work surface platform and the height adjustment mechanism along a direction generally parallel to a work surface of the work surface platform.

18. A desktop workspace that adjusts vertically, comprising:

a work surface platform;

a base configured to sit on an existing platform;

a height adjustment mechanism connecting the work surface platform and the base, the height adjustment mechanism including:

a set of pivot arms including a base pivot arm pivotably connected to the base and a platform pivot arm pivotably connected to the work surface platform, the base pivot arm pivotably connected to the platform pivot arm to provide a scissoring motion when raising and lowering the work surface platform to various heights;

a first sliding mechanism on an end of the platform pivot arm between the end of the platform pivot arm and the base; and

a second sliding mechanism on an end of the base pivot arm between the end of the base pivot arm and the work surface platform; and

a force applying mechanism attached to the height adjustment mechanism to provide a force to assist in elevation of the work surface platform,

wherein the force applying mechanism is adjacent an underside of the work surface platform and extends between an underside of the work surface platform and the height adjustment mechanism along a direction generally parallel to a work surface of the work surface platform,

wherein the force applying mechanism, the set of pivot arms, the base pivot arm connection to the base, and the platform pivot arm connection to the platform are positioned side-by-side when the desktop workspace is in a fully lowered position.

Continuity (8)
Continuation 18481082 · Oct 4, 2023
Continuation 17985137 · Nov 10, 2022
Continuation 17493812 · Oct 4, 2021
Continuation 16785647 · Feb 9, 2020
Continuation 16372334 · Apr 1, 2019
Division 15628558 · Jun 20, 2017
Division 15004926 · Jan 23, 2016
Provisional Application 62107380 · Jan 24, 2015
References Cited (367)
US 200057A · Hart · 1878 [cited by applicant]
US 317468A · Morstatt · 1885 [cited by applicant]
US 606845A · Simmons · 1898 [cited by applicant]
US 835247A · Morgan · 1906 [cited by applicant]
US 1217772A · Kade · 1917 [cited by applicant]
US 1318564A · Jenkins · 1919 [cited by applicant]
US 2225243A · Zottel · 1940 [cited by applicant]
US 2260695A · Clyde · 1941 [cited by applicant]
US 2692807A · Fred · 1954 [cited by applicant]
US 2843418A · Gray · 1958 [cited by applicant]
US 2916340A · Jackson · 1959 [cited by applicant]
US 2937003A · Croll · 1960 [cited by applicant]
US 3092918A · Haeussermann et al. · 1963 [cited by applicant]
US 3110476A · Farris · 1963 [cited by applicant]
US 3152833A · Creveling et al. · 1964 [cited by applicant]
US 3282566A · Clarke · 1966 [cited by applicant]
US 3295800A · Karl-Erik et al. · 1967 [cited by applicant]
US 3404791A · Roy · 1968 [cited by applicant]
US 3444830A · Doetsch · 1969 [cited by applicant]
US 3727245A · Gerth · 1973 [cited by applicant]
US 3823915A · Koehler · 1974 [cited by applicant]
US 3826457A · De · 1974 [cited by applicant]
US 4072288A · Wirges et al. · 1978 [cited by applicant]
US 4097941A · Merkel · 1978 [cited by applicant]
US 4221280A · Richards · 1980 [cited by applicant]
US 4249749A · Collier · 1981 [cited by applicant]
US 4382573A · Aondetto · 1983 [cited by applicant]
US 4403680A · Hillesheimer · 1983 [cited by applicant]
US 4433759A · Ichinose · 1984 [cited by applicant]
US 4448386A · Moorhouse et al. · 1984 [cited by applicant]
US 4449262A · Jahsman et al. · 1984 [cited by applicant]
US 4534544A · Heide · 1985 [cited by applicant]
US 4549720A · Bergenwall · 1985 [cited by applicant]
US 4558648A · Franklin et al. · 1985 [cited by applicant]
US 4558847A · Coates · 1985 [cited by applicant]
US 4574785A · Yamamoto · 1986 [cited by applicant]
US 4577821A · Edmo et al. · 1986 [cited by applicant]
US 4611823A · Haas · 1986 [cited by applicant]
US 4625657A · Little et al. · 1986 [cited by applicant]
US 4640488A · Sakamoto · 1987 [cited by applicant]
US 4659052A · Nagata · 1987 [cited by applicant]
US 4702454A · Izumida · 1987 [cited by applicant]
US 4709972A · LaBudde et al. · 1987 [cited by applicant]
US 4717112A · Pirkle · 1988 [cited by applicant]
US 4741512A · Elkuch et al. · 1988 [cited by applicant]
US 4753419A · Johansson · 1988 [cited by applicant]
US 4826123A · Hannah et al. · 1989 [cited by applicant]
US 4843978A · Schmidt et al. · 1989 [cited by applicant]
US D302893S · Wakefield · 1989 [cited by applicant]
US 4899987A · Craig · 1990 [cited by applicant]
US 4909159A · Gonsoulin · 1990 [cited by applicant]
US D308537S · Clark · 1990 [cited by applicant]
US 4941641A · Granzow et al. · 1990 [cited by applicant]
US 4967672A · Leather · 1990 [cited by applicant]
US 4995130A · Hahn et al. · 1991 [cited by applicant]
US 5037163A · Hatcher · 1991 [cited by applicant]
US 5048784A · Schwartz et al. · 1991 [cited by applicant]
US 5074000A · Soltani et al. · 1991 [cited by applicant]
US 5211367A · Musculus · 1993 [cited by applicant]
US 5251864A · Itou · 1993 [cited by applicant]
US 5257767A · McConnell · 1993 [cited by applicant]
US 5294087A · Drabczyk et al. · 1994 [cited by applicant]
US 5400720A · Stevens · 1995 [cited by applicant]
US 5460460A · Alexander · 1995 [cited by applicant]
US 5580027A · Brodersen · 1996 [cited by applicant]
US 5588377A · Fahmian · 1996 [cited by applicant]
US 5588727A · D'Agaro et al. · 1996 [cited by applicant]
US 5626323A · Lechman et al. · 1997 [cited by applicant]
US 5632209A · Sakakibara · 1997 [cited by applicant]
US 5694864A · Langewellpott · 1997 [cited by applicant]
US 5695173A · Ochoa et al. · 1997 [cited by applicant]
US 5722513A · Rowan et al. · 1998 [cited by applicant]
US 5729430A · Johnson · 1998 [cited by applicant]
US 5765797A · Greene et al. · 1998 [cited by applicant]
US 5823487A · Kirchhoff et al. · 1998 [cited by applicant]
US 5829948A · Becklund · 1998 [cited by applicant]
US 5836562A · Danzyger et al. · 1998 [cited by applicant]
US 5895020A · Danzyger et al. · 1999 [cited by applicant]
US 5926876A · Haigh et al. · 1999 [cited by applicant]
US 5957426A · Brodersen · 1999 [cited by applicant]
US 6076785A · Oddsen, Jr. · 2000 [cited by applicant]
US 6098961A · Gionet · 2000 [cited by applicant]
US 6135546A · Demtchouk · 2000 [cited by applicant]
US 6148739A · Martin · 2000 [cited by applicant]
US 6176456B1 · Wisniewski · 2001 [cited by applicant]
US 6179261B1 · Lin · 2001 [cited by applicant]
US 6220558B1 · Broder et al. · 2001 [cited by applicant]
US 6269753B1 · Roddan · 2001 [cited by applicant]
US 6273382B1 · Pemberton · 2001 [cited by applicant]
US 6381335B2 · Juszkiewicz et al. · 2002 [cited by applicant]
US 6488248B1 · Watt et al. · 2002 [cited by applicant]
US 6516478B2 · Cook et al. · 2003 [cited by applicant]
US 6533229B1 · Hung · 2003 [cited by applicant]
US 6533479B2 · Kochanski · 2003 [cited by applicant]
US 6550740B1 · Burer · 2003 [cited by applicant]
US 6672430B2 · Boucher et al. · 2004 [cited by applicant]
US 6701853B1 · Hwang · 2004 [cited by applicant]
US 6702372B2 · Tholkes et al. · 2004 [cited by applicant]
US 6722618B1 · Wu · 2004 [cited by applicant]
US 6742768B2 · Alba · 2004 [cited by applicant]
US 6792876B2 · Lin · 2004 [cited by applicant]
US 6857493B2 · Shupp et al. · 2005 [cited by applicant]
US 6938866B2 · Kirchhoff · 2005 [cited by applicant]
US 7048236B2 · Benden et al. · 2006 [cited by applicant]
US 7188813B2 · Kollar · 2007 [cited by applicant]
US 7204193B2 · Scherrer et al. · 2007 [cited by applicant]
US 7207629B2 · Goetz et al. · 2007 [cited by applicant]
US 7246784B1 · Lopez · 2007 [cited by applicant]
US 7568675B2 · Catton · 2009 [cited by applicant]
US 7575205B2 · Kirchhoff · 2009 [cited by applicant]
US 7677518B2 · Chouinard et al. · 2010 [cited by applicant]
US D622350S · Gramegna et al. · 2010 [cited by applicant]
US 7793597B2 · Bart et al. · 2010 [cited by applicant]
US 7841570B2 · Mileos et al. · 2010 [cited by applicant]
US 7845665B2 · Borisoff · 2010 [cited by applicant]
US 7946551B1 · Cvek · 2011 [cited by applicant]
US 7950338B2 · Smed · 2011 [cited by applicant]
US 7988232B2 · Weber et al. · 2011 [cited by applicant]
US 8015638B2 · Shimada et al. · 2011 [cited by applicant]
US 8132518B2 · Kim et al. · 2012 [cited by applicant]
US 8303062B2 · Zanelli · 2012 [cited by applicant]
US 8469152B2 · Olsen et al. · 2013 [cited by applicant]
US 8490933B2 · Papic et al. · 2013 [cited by applicant]
US 8544391B2 · Knox et al. · 2013 [cited by applicant]
US 8671853B2 · Flaherty · 2014 [cited by applicant]
US 8684339B2 · Deml et al. · 2014 [cited by applicant]
US 8800976B2 · Bethina et al. · 2014 [cited by applicant]
US 8931750B2 · Kohl et al. · 2015 [cited by applicant]
US 8950343B2 · Huang · 2015 [cited by applicant]
US 9049923B1 · Delagey et al. · 2015 [cited by applicant]
US 9055810B2 · Flaherty · 2015 [cited by applicant]
US 9113703B2 · Flaherty · 2015 [cited by applicant]
US 9133974B2 · Tholkes et al. · 2015 [cited by applicant]
US 9133976B2 · Lin et al. · 2015 [cited by applicant]
US 9232855B2 · Ergun et al. · 2016 [cited by applicant]
US 9326598B1 · West et al. · 2016 [cited by applicant]
US 9440559B2 · Gundall et al. · 2016 [cited by applicant]
US 9480332B2 · Han · 2016 [cited by applicant]
US 9504316B1 · Streicher et al. · 2016 [cited by applicant]
US 9554644B2 · Flaherty et al. · 2017 [cited by applicant]
US 9668572B2 · Ergun et al. · 2017 [cited by applicant]
US 9681746B1 · Chen · 2017 [cited by applicant]
US 9809136B2 · Haller et al. · 2017 [cited by applicant]
US 9815672B2 · Baudermann · 2017 [cited by applicant]
US 9854904B2 · Getz · 2018 [cited by applicant]
US 9955780B2 · Koch · 2018 [cited by applicant]
US 9961991B1 · Chen · 2018 [cited by applicant]
US 9981571B2 · Garing · 2018 [cited by applicant]
US 9993068B2 · Lin et al. · 2018 [cited by applicant]
US 10018298B2 · Goldish et al. · 2018 [cited by applicant]
US 10023355B2 · Taylor et al. · 2018 [cited by applicant]
US D830739S · Min · 2018 [cited by applicant]
US 10114352B2 · Matlin · 2018 [cited by applicant]
US D832623S · Flaherty et al. · 2018 [cited by applicant]
US 10123613B2 · Hall et al. · 2018 [cited by applicant]
US 10159336B2 · Liao et al. · 2018 [cited by applicant]
US D841014S · Laudadio et al. · 2019 [cited by applicant]
US D845037S · Min · 2019 [cited by applicant]
US D845678S · Laudadio et al. · 2019 [cited by applicant]
US 10244861B1 · Poniatowski · 2019 [cited by applicant]
US 10258148B1 · Donner et al. · 2019 [cited by applicant]
US 10258149B2 · Zhong · 2019 [cited by applicant]
US 10264877B2 · Hu et al. · 2019 [cited by applicant]
US 10306977B2 · Wong · 2019 [cited by applicant]
US D854775S · Chang et al. · 2019 [cited by applicant]
US 10405647B2 · Laudadio et al. · 2019 [cited by applicant]
US 10413055B2 · Laudadio et al. · 2019 [cited by applicant]
US D862936S · Laudadio et al. · 2019 [cited by applicant]
US 10485336B1 · Laudadio et al. · 2019 [cited by applicant]
US D870490S · Hu · 2019 [cited by applicant]
US 10499730B2 · Kim et al. · 2019 [cited by applicant]
US 10517390B2 · Xiang et al. · 2019 [cited by applicant]
US 10524565B2 · Ergun et al. · 2020 [cited by applicant]
US 10542817B2 · Swartz et al. · 2020 [cited by applicant]
US 10544019B2 · Kochie et al. · 2020 [cited by applicant]
US 10568416B1 · Poniatowski · 2020 [cited by applicant]
US 10575630B1 · Poniatowski · 2020 [cited by applicant]
US D901959S · Chang · 2020 [cited by applicant]
US 10849424B2 · Laudadio et al. · 2020 [cited by applicant]
US 10869549B2 · Xiang et al. · 2020 [cited by applicant]
US 10893748B1 · Poniatowski · 2021 [cited by applicant]
US 11058217B2 · Laudadio et al. · 2021 [cited by applicant]
US 11083282B1 · Liu · 2021 [cited by applicant]
US 11134773B1 · Poniatowski · 2021 [cited by applicant]
US 11134774B1 · Poniatowski · 2021 [cited by applicant]
US 11140977B1 · Poniatowski · 2021 [cited by applicant]
US 11147366B1 · Poniatowski · 2021 [cited by applicant]
US 11160367B1 · Poniatowski · 2021 [cited by applicant]
US 11219307B2 · Laudadio et al. · 2022 [cited by applicant]
US 11388989B1 · Poniatowski · 2022 [cited by applicant]
US 11388991B1 · Poniatowski · 2022 [cited by applicant]
US 11395544B1 · Poniatowski · 2022 [cited by applicant]
US 11464325B1 · Poniatowski · 2022 [cited by applicant]
US 11470959B1 · Poniatowski · 2022 [cited by applicant]
US 11717080B2 · Laudadio et al. · 2023 [cited by applicant]
US 11771218B2 · Laudadio et al. · 2023 [cited by applicant]
US 11800927B1 · Poniatowski · 2023 [cited by applicant]
US 11849843B1 · Poniatowski · 2023 [cited by applicant]
US 11857073B1 · Poniatowski · 2024 [cited by applicant]
US 11864654B1 · Poniatowski · 2024 [cited by applicant]
US 11910926B1 · Poniatowski · 2024 [cited by applicant]
US 11925264B1 · Poniatowski · 2024 [cited by applicant]
US 11944196B1 · Poniatowski · 2024 [cited by applicant]
US 11950699B1 · Poniatowski · 2024 [cited by applicant]
US 11980289B1 · Poniatowski · 2024 [cited by applicant]
US 12082695B1 · Poniatowski · 2024 [cited by applicant]
US 12082696B1 · Poniatowski · 2024 [cited by applicant]
US 12102229B1 · Poniatowski · 2024 [cited by applicant]
US 12121149B1 · Poniatowski · 2024 [cited by applicant]
US 20030042380A1 · Hagglund et al. · 2003 [cited by applicant]
US 20030213415A1 · Ross et al. · 2003 [cited by applicant]
US 20040035332A1 · Lin · 2004 [cited by applicant]
US 20040040480A1 · Hwang · 2004 [cited by applicant]
US 20050029849A1 · Goetz et al. · 2005 [cited by applicant]
US 20050120922A1 · Brooks · 2005 [cited by applicant]
US 20070001077A1 · Kirchhoff · 2007 [cited by applicant]
US 20070080564A1 · Chen · 2007 [cited by applicant]
US 20070266912A1 · Swain · 2007 [cited by applicant]
US 20070295882A1 · Catton · 2007 [cited by applicant]
US 20080000393A1 · Wilson et al. · 2008 [cited by applicant]
US 20090090832A1 · Mileos et al. · 2009 [cited by applicant]
US 20090145336A1 · Kenny · 2009 [cited by applicant]
US 20090146389A1 · Borisoff · 2009 [cited by applicant]
US 20090200437A1 · Smed · 2009 [cited by applicant]
US 20100242174A1 · Morrison et al. · 2010 [cited by applicant]
US 20100257671A1 · Shimada et al. · 2010 [cited by applicant]
US 20110001033A1 · Kohl et al. · 2011 [cited by applicant]
US 20110024958A1 · Deml et al. · 2011 [cited by applicant]
US 20120060291A1 · Gamman et al. · 2012 [cited by applicant]
US 20120097822A1 · Hammarskiöld · 2012 [cited by applicant]
US 20120188302A1 · Zanelli · 2012 [cited by applicant]
US 20130145972A1 · Knox et al. · 2013 [cited by applicant]
US 20130193392A1 · McGinn · 2013 [cited by applicant]
US 20130199420A1 · Hjelm · 2013 [cited by applicant]
US 20130340655A1 · Flaherty · 2013 [cited by applicant]
US 20140041554A1 · Huang · 2014 [cited by applicant]
US 20140144352A1 · Roberts · 2014 [cited by applicant]
US 20140158026A1 · Flaherty · 2014 [cited by applicant]
US 20140248114A1 · Sawyer · 2014 [cited by applicant]
US 20140339747A1 · Bethina et al. · 2014 [cited by applicant]
US 20140360411A1 · Hatter · 2014 [cited by applicant]
US 20150028787A1 · Sekine et al. · 2015 [cited by applicant]
US 20150216296A1 · Mitchell · 2015 [cited by applicant]
US 20150231992A1 · Gundall et al. · 2015 [cited by applicant]
US 20150232005A1 · Haller et al. · 2015 [cited by applicant]
US 20150274038A1 · Garing · 2015 [cited by applicant]
US 20150289641A1 · Ergun et al. · 2015 [cited by applicant]
US 20150368082A1 · Davis et al. · 2015 [cited by applicant]
US 20150375896A1 · Taylor et al. · 2015 [cited by applicant]
US 20160051042A1 · Koch · 2016 [cited by applicant]
US 20160060084A1 · Baudermann · 2016 [cited by applicant]
US 20160106205A1 · Hall et al. · 2016 [cited by applicant]
US 20160170402A1 · Lindström · 2016 [cited by applicant]
US 20160249737A1 · Han · 2016 [cited by applicant]
US 20160258573A1 · Goldish et al. · 2016 [cited by applicant]
US 20160260019A1 · Ruiz et al. · 2016 [cited by applicant]
US 20160309889A1 · Lin et al. · 2016 [cited by applicant]
US 20160338486A1 · Martin · 2016 [cited by applicant]
US 20160353880A1 · Sigal et al. · 2016 [cited by applicant]
US 20170071332A1 · Herring et al. · 2017 [cited by applicant]
US 20170174486A1 · Kochie et al. · 2017 [cited by applicant]
US 20170196351A1 · Failing · 2017 [cited by applicant]
US 20170354245A1 · Martin et al. · 2017 [cited by applicant]
US 20170360192A1 · Hu · 2017 [cited by applicant]
US 20180008037A1 · Laudadio · 2018 [cited by applicant]
US 20180055214A1 · Kim et al. · 2018 [cited by applicant]
US 20180103752A1 · Zhong · 2018 [cited by applicant]
US 20180125227A1 · Xiang et al. · 2018 [cited by applicant]
US 20180160799A1 · Westergård et al. · 2018 [cited by applicant]
US 20180177289A1 · Chen · 2018 [cited by applicant]
US 20180213929A1 · Ergun et al. · 2018 [cited by applicant]
US 20180255919A1 · Swartz et al. · 2018 [cited by applicant]
US 20180279770A1 · Crowe et al. · 2018 [cited by applicant]
US 20180360208A1 · Liao et al. · 2018 [cited by applicant]
US 20190110588A1 · Wong · 2019 [cited by applicant]
US 20190183239A1 · Semmelrath et al. · 2019 [cited by applicant]
US 20190269237A1 · Zhu · 2019 [cited by applicant]
US 20200029685A1 · Du et al. · 2020 [cited by applicant]
US 20200107633A1 · Kang · 2020 [cited by applicant]
US 20230329430A1 · Laudadio et al. · 2023 [cited by applicant]
AU 5691386A · 1986 [cited by applicant]
AU 580874B2 · 1989 [cited by applicant]
AU 2014216002A1 · 2015 [cited by applicant]
CA 2814945C · 2019 [cited by applicant]
CN 1142343A · 1997 [cited by applicant]
CN 2637251Y · 2004 [cited by applicant]
CN 2781893Y · 2006 [cited by applicant]
CN 201657970U · 2010 [cited by applicant]
CN 102599728A · 2012 [cited by applicant]
CN 202681005U · 2013 [cited by applicant]
CN 202681013U · 2013 [cited by applicant]
CN 202874336U · 2013 [cited by applicant]
CN 101711220B · 2013 [cited by applicant]
CN 203333240U · 2013 [cited by applicant]
CN 103653780A · 2014 [cited by applicant]
CN 203934825U · 2014 [cited by applicant]
CN 204541230U · 2015 [cited by applicant]
CN 105124920A · 2015 [cited by applicant]
CN 204949970U · 2016 [cited by applicant]
CN 104692286B · 2017 [cited by applicant]
CN 104540707B · 2017 [cited by applicant]
CN 107048694A · 2017 [cited by applicant]
CN 107048695A · 2017 [cited by applicant]
CN 107212587A · 2017 [cited by applicant]
CN 107744256A · 2018 [cited by applicant]
CN 107756350A · 2018 [cited by applicant]
CN 107912868A · 2018 [cited by applicant]
CN 207186305U · 2018 [cited by applicant]
CN 109008216A · 2018 [cited by applicant]
CN 208403596U · 2019 [cited by applicant]
CN 110840072A · 2020 [cited by applicant]
CN 108024625B · 2021 [cited by applicant]
DE 2851555A1 · 1980 [cited by applicant]
DE 8606822U1 · 1991 [cited by applicant]
DE 9302967U1 · 1993 [cited by applicant]
DE 4424564A1 · 1996 [cited by applicant]
DE 29515642U1 · 1996 [cited by applicant]
DE 69111809T2 · 1996 [cited by applicant]
DE 19526596A1 · 2004 [cited by applicant]
DE 102013008020A1 · 2014 [cited by applicant]
DE 202016101126U1 · 2016 [cited by applicant]
EP 0342779B1 · 1993 [cited by applicant]
EP 0531385B1 · 1995 [cited by applicant]
EP 0448340B1 · 1996 [cited by applicant]
EP 0613852B1 · 1997 [cited by applicant]
EP 2745733A1 · 2014 [cited by applicant]
EP 3092918A1 · 2016 [cited by applicant]
FR 2252835A1 · 1975 [cited by applicant]
FR 2637165A1 · 1990 [cited by applicant]
FR 2894794A1 · 2007 [cited by applicant]
FR 3028735A1 · 2016 [cited by applicant]
JP 2012030022A · 2012 [cited by applicant]
JP 5861051B2 · 2016 [cited by applicant]
JP 2017045506A · 2017 [cited by applicant]
KR 100802663B1 · 2008 [cited by applicant]
KR 20140004886U · 2014 [cited by applicant]
KR 200479292Y1 · 2016 [cited by applicant]
KR 20160074221A · 2016 [cited by applicant]
KR 101635611B1 · 2016 [cited by applicant]
KR 101747132B1 · 2017 [cited by applicant]
KR 101969133B1 · 2019 [cited by applicant]
NL 1011051C2 · 2000 [cited by applicant]
NL 2000346C2 · 2008 [cited by applicant]
TW I531523B · 2016 [cited by applicant]
WO 8304168A1 · 1983 [cited by applicant]
WO 8606053A1 · 1986 [cited by applicant]
WO 1986006054A1 · 1986 [cited by applicant]
WO 1988005759A1 · 1988 [cited by applicant]
WO 1991011979A1 · 1991 [cited by applicant]
WO 1991017906A1 · 1991 [cited by applicant]
WO 2008002373A2 · 2008 [cited by applicant]
WO 2014027010A1 · 2014 [cited by applicant]
WO 2014180572A1 · 2014 [cited by applicant]
WO 2015160825A2 · 2015 [cited by applicant]
WO 2016129971A1 · 2016 [cited by applicant]
WO 2016187212A1 · 2016 [cited by applicant]
WO 2016200318A1 · 2016 [cited by applicant]
WO 2017045506A1 · 2017 [cited by applicant]
WO 2017053200A1 · 2017 [cited by applicant]
WO 2018093007A1 · 2018 [cited by applicant]
WO 2019001506A1 · 2019 [cited by applicant]
WO 2019001507A1 · 2019 [cited by applicant]
“Easylift Gas Springs: Technical Information,” Web page, Aug. 24, 2008, retrieved from Internet Archive Wayback Machine on Aug. 29, 2022. [cited by applicant]
Adjustable Desk: Varidesk, http://www.varidesk.com, United States of America, Mar. 30, 2013. [cited by applicant]
Ergotron, http://www.ergotron.com, United States of America, Sep. 29, 2014. [cited by applicant]
Levine, James A. “Sitting down is Killing you! Heart disease, obesity, depression and crumbling bones—a terrifying new book by a top doctor reveals they are all linked to the hours we spend in chairs” Daily Mail Online,… [cited by applicant]
Lohr, Steve, Taking a Stand for Office Ergonomics, Dec. 1, 2012, New York Times, United States, retrieved from http://www.nytimes.com/2012/12/02/business/stand-up-desks-gaining-favor-in-the-workplace.html on Aug. 29, 20… [cited by applicant]
Cited By (4)
US 12,318,002 US 12,318,003 US 12,342,937 US 12,593,912