Crystalline Forms of (R)-1-(1-Acryloylpiperidin-3-YL)-4-Amino-3-(4-Phenoxyphenyl)-1H-Imidazo[4,5-C]Pyridin-2(3H)-One and salts Thereof
The present disclosure relates to crystalline forms of (R)-1-(1-acryloylpiperidin-3-yl)-4-amino-3-(4-phenoxyphenyl)-1H-imidazo[4,5-c]pyridin-2(3H)-one free base and HCl salt thereof.
1 . A substantially crystalline compound of Formula (1)
2 . The substantially crystalline compound of claim 1 , wherein the compound of Formula (1) is Form 1.
3 . The substantially crystalline compound of claim 2 , wherein the compound of Formula (1) Form 1 is characterized by an XRPD pattern substantially the same as FIG. 1 .
4 . The substantially crystalline compound of claim 3 , wherein the compound of Formula (1) Form 1 is characterized by an XRPD pattern comprising one or more peaks chosen from peaks at about 7.66° 2θ, 7.86° 2θ, 10.03° 2θ, 10.51° 2θ, 10.97° 2θ, 11.99° 2θ, 13.19° 2θ, 13.59° 2θ and 13.96° 2θ.
5 . The substantially crystalline compound of claim 1 , wherein the compound of Formula (1) is Form 2.
6 . The substantially crystalline compound of claim 5 , wherein the compound of Formula (1) Form 2 is characterized by an XRPD pattern substantially the same as FIG. 2 .
7 . The substantially crystalline compound of claim 3 , wherein the compound of Formula (1) Form 2 is characterized by an XRPD pattern comprising one or more peaks chosen from peaks at about 4.15° 2θ, 10.22° 2θ, 10.41° 2θ, 11.03° 2θ, 14.41° 2θ, 14.85° 2θ, 15.63° 2θ, 16.55° 2θ and 17.73° 2θ.
8 . A substantially crystalline form of a compound of Formula (1)·HCl.
9 . The substantially crystalline compound of claim 8 , wherein the compound of Formula (1)·HCl is Form 1.
10 . The substantially crystalline compound of claim 9 , wherein the compound of Formula (1)·HCl Form 1 is characterized by an XRPD pattern substantially the same as FIG. 5 .
11 . The substantially crystalline compound of claim 9 , wherein the compound of Formula (1)·HCl Form 1 is characterized by an XRPD pattern comprising one or more peaks chosen from peaks at about 6.309° 2θ, 9.480° 2θ, 10.933° 2θ, 12.261° 2θ, 12.647° 2θ, 14.482° 2θ, 14.918° 2θ, 16.253° 2θ and 16.425° 2θ.
12 . The substantially crystalline compound of claim 8 , wherein the compound of Formula (1)·HCl is Form 2.
13 . The substantially crystalline compound of claim 12 , wherein the compound of Formula (1)·HCl Form 2 is characterized by an XRPD pattern substantially the same as FIG. 8 .
14 . The substantially crystalline compound of claim 12 , wherein the compound of Formula (1)·HCl Form 2 is characterized by an XRPD pattern comprising one or more peaks chosen from peaks at about 8.00° 2θ, 10.11° 2θ, 11.98° 2θ, 13.33° 2θ, 14.40° 2θ, 14.92° 2θ, 15.66° 2θ, 16.05° 2θ, 16.72° 2θ, and 17.28° 2θ.
15 . The substantially crystalline compound of any one of the preceding claims , wherein the substantially crystalline compound is at least 85% crystalline.
16 . The substantially crystalline compound of any one of the preceding claims , wherein the substantially crystalline compound is at least 90% crystalline.
17 . The substantially crystalline compound of any one of the preceding claims , wherein the substantially crystalline compound is at least 95% crystalline.
18 . The substantially crystalline compound of any one of the preceding claims , wherein the substantially crystalline compound is at least 97% crystalline.
19 . The substantially crystalline compound of any one of the preceding claims , wherein the substantially crystalline compound is at least 99% crystalline.