BIPOLAR PLATE AND CURRENT COLLECTOR PLATE OF FLOW BATTERY
The present disclosure provides a bipolar plate and a current collector plate of a flow battery. The bipolar plate or the current collector plate includes a support layer, wherein the support layer includes a first surface in contact with an electrode and a second surface opposite thereto; the support layer is provided with holes passing through the first surface and the second surface; the holes are provided with a conductive filler therein; the first surface is provided with a first region and a second region, the first region surrounds all of the holes, and the second region is the remaining region of the first surface; the second surface is provided with a third region and a fourth region, the third region surrounds all of the holes, and the fourth region is the remaining region of the second surface; and the first region has a resistivity less than that of the second region. In the present disclosure, on the basis of ensuring the physical strength of the bipolar plate or current collector plate, optimization has been carried out to greatly improve the corrosion resistance and electrical performance.
1 . A support layer for a bipolar plate or a current collector plate, characterized by comprising a first surface in contact with an electrode and a second surface opposite thereto;
wherein the support layer is provided with holes passing through the first surface and the second surface;
the holes are provided with a conductive filler therein;
the first surface is provided with a first region and a second region, the first region surrounds all of the holes, and the second region is a remaining region of the first surface; the second surface is provided with a third region and a fourth region, the third region surrounds all of the holes, and the fourth region is a remaining region of the second surface; and
the first region has a resistivity less than that of the second region.
2 . The support layer for the bipolar plate or the current collector plate according to claim 1 , wherein the area of all of the holes accounts for 10% to 70% of the area of the first region; and
the area of all of the holes accounts for 10% to 70% of the area of the third region.
3 . The support layer for the bipolar plate or the current collector plate according to claim 1 , wherein the conductive filler has a density lower than that of a material of the support layer; and
the conductive filler has a resistivity of 1 mΩ×cm to 10 mΩ×cm.
4 . The support layer for the bipolar plate or the current collector plate according to claim 1 , wherein the support layer has a Brinell hardness ranging from 20 HB to 500 HB.
5 . The support layer for the bipolar plate or the current collector plate according to claim 1 , wherein a material of the support layer is selected from any one or more of stainless steel, copper alloy, titanium alloy, aluminum alloy and magnesium alloy.
6 . A bipolar plate characterized by comprising the support layer according to claim 1 ,
wherein the third region has a resistivity less than that of the fourth region; and
the first region and the third region are provided with a conductive coating, and the second region and the fourth region are provided with an insulating coating.
7 . The bipolar plate according to claim 6 , wherein a thickness ratio of the conductive coating to the support layer is (1 to 10):(10 to 100);
a thickness ratio of the insulating coating to the support layer is (1 to 10):(10 to 100);
the conductive coating has a resistivity of 1 mΩ×cm to 10 mΩ×cm;
the insulating coating has a resistivity of 1000 mΩ×cm or more; and
a material of the conductive coating is a doped C/CrN multilayer gradient coating, wherein a doping element is selected from any one or more of Ti, Al, Mo, W, Nb, Ni, Zr, Fe and Si.
8 . A current collector plate, characterized by comprising the support layer according to claim 1 ,
wherein the first region is provided with a conductive coating, and the second region is provided with an insulating coating.
9 . The current collector plate according to claim 8 , wherein a thickness ratio of the conductive coating to the support layer is (1 to 10):(10 to 100);
a thickness ratio of the insulating coating to the support layer is (1 to 10):(10 to 100);
the conductive coating has a resistivity of 1 mΩ×cm to 10 mΩ×cm;
the insulating coating has a resistivity of 1000 mΩ×cm or more; and
a material of the conductive coating is a doped C/CrN multilayer gradient coating, wherein a doping element is selected from any one or more of Ti, Al, Mo, W, Nb, Ni, Zr, Fe and Si.
10 . A flow battery, characterized by comprising the bipolar plate according to claim 6 ,
wherein the flow battery is selected from any one or more of an all-vanadium flow battery, an iron-chromium flow battery, a zinc-iron flow battery and a zinc-bromine flow battery.