Methods of Making SiC Boules and Wafers
Organosilicon chemistry, polymer derived ceramic materials, and methods. Such materials and methods for making polysilocarb (SiOC) and Silicon Carbide (SiC) materials having 3-nines, 4-nines, 6-nines and greater purity. Processes for making SiC boules and SiC wafers utilizing such high purity SiOC and SiC.
1 - 27 . (canceled)
28 . A method of making a silicon carbide boule, using a vapor deposition process, the method including:
a. providing in a vapor deposition apparatus a porous mass of SiC;
i. the porous mass of SiC, comprising granules of SiC;
ii. the porous mass of SiC having an apparent density that is less than 3 g/cc; and a hardness that is less than about 1,400 Kg/mm 2 ;
b. heating the porous mass of SiC in the vapor deposition apparatus to sublimate the SiC and thereby form a vapor in the vapor deposition apparatus;
c. the vapor deposition apparatus having an SiC seed crystal positioned inside the vapor disposition apparatus; and,
d. depositing the vapor on the SiC seed crystal, thereby growing an SiC boule.
29 . The method of claim 28 , wherein the porous mass of SiC has an open hole porosity.
30 . The method of claim 28 , wherein the granules of SiC have a hardness of about 2,800 Kg/mm 2 .
31 . The method of claim 28 , wherein the porous mass of SiC has an elastic modulus of less than about 150 GPa.
32 . The method of claim 28 , wherein the porous mass has an apparent density of less than about 2 g/cc.
33 . The method of claim 28 , wherein the porous mass has hardness of less than 800 Kg/mm 2 .
34 . The method of claim 29 , wherein the porous mass of SiC has an elastic modulus of less than about 150 GPa.
35 . The method of claim 34 , wherein the porous mass has an apparent density of less than about 2 g/cc.
36 . The method of claim 35 , wherein the porous mass has hardness of less than 800 Kg/mm 2 .
37 . A method of making a silicon carbide boule, using a vapor deposition process, the method including:
a. providing in a vapor deposition apparatus a porous mass of SiC;
i. the porous mass of SiC, comprising granules of SiC, the granules of SiC having an actual density and a hardness of X;
ii. the porous mass of SiC having an apparent density and a hardness of Y;
iii. wherein the actual density of the SiC granules is greater than the apparent density of the porous mass of SiC;
iv. wherein the X is at least 2× greater than Y;
b. heating the porous mass of SiC in the vapor deposition apparatus to sublimate the SiC and thereby form a vapor in the vapor deposition apparatus;
c. the vapor deposition apparatus having an SiC seed crystal positioned inside the vapor disposition apparatus; and,
d. depositing the vapor on the SiC seed crystal, thereby growing an SiC boule.
38 . The method of claim 37 , wherein the apparent density is less than about 2 g/cc.
39 . The method of claim 37 or 38 , wherein the porous mass of SiC has an open hole porosity.
40 . The methods of claim 37 or 38 , wherein the X is about 2,800 Kg/mm 2 .
41 . The methods of claim 37 or 38 , wherein the mass of SiC comprises a dopant.
42 . The method of claims 28, 29, 30, 31, 32, 36, 37 or 38 , wherein the boule comprises 4H—SiC.
43 . The method of claims 28, 29, 30, 31, 32, 36, 37 or 38 , wherein the boule comprises 6H—SiC
44 . A boule made by the method of claims 28, 29, 37 or 38 .
45 . Cutting an SiC wafer from the boule of claim 44 .