IP Library Patent Application 18845155
Patent Application
App. No. 18/845,155

TANTALIC ACID COMPOUND DISPERSION LIQUID AND METHOD FOR PRODUCING SAME

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Patent No.
US None
App. No.
18/845,155
Abstract

A tantalic acid compound dispersion is provided. The tantalic acid compound dispersion contains tantalum in an amount of 0.1 mass % or more and less than 30 mass % in terms of Ta 2 O 5 , in which a particle diameter (D50) of a tantalic acid compound in the tantalic acid compound dispersion as determined by a dynamic light scattering method is 100 nm or smaller. A method of producing the tantalic acid compound dispersion is also provided and includes: a reaction step of generating a tantalum compound aqueous solution by adding hydrogen peroxide to a tantalum fluoride aqueous solution; and a reverse neutralization step of generating a tantalum-containing precipitate by adding the tantalum compound aqueous solution to an alkaline aqueous solution.

Claims (22)

1 . A tantalic acid compound dispersion comprising tantalum in an amount of 0.1 mass % or more and less than 30 mass % in terms of Ta 2 O 5 , wherein

a particle diameter (D50) of a tantalic acid compound in the tantalic acid compound dispersion as determined by a dynamic light scattering method is 100 nm or smaller.

2 . The tantalic acid compound dispersion according to claim 1 , comprising an organic nitrogen compound.

3 . The tantalic acid compound dispersion according to claim 1 , comprising one or more elements M selected from the group consisting of alkali metal elements or alkaline earth metal elements.

4 . The tantalic acid compound dispersion according to claim 3 , wherein the element M is Li.

5 . The tantalic acid compound dispersion according to claim 4 , wherein a tantalic acid concentration in the tantalic acid compound dispersion is 0.1 mass % or higher and 15 mass % or lower in terms of Ta 2 O 5 .

6 . The tantalic acid compound dispersion according to claim 4 , wherein a molar ratio Li/Ta of lithium (Li) to tantalum (Ta) of lithium tantalate in the tantalic acid compound dispersion is 0.8 or higher and 1.5 or lower.

7 . The tantalic acid compound dispersion according to claim 1 , wherein the tantalic acid compound dispersion is an aqueous dispersion.

8 . The tantalic acid compound dispersion according to claim 1 , wherein the particle diameter (D50) of the tantalic acid compound is 30 nm or smaller.

9 . The tantalic acid compound dispersion according to claim 1 , wherein a pH of the tantalic acid compound dispersion is more than 7.

10 . A tantalic acid compound powder comprising the tantalic acid compound in the tantalic acid compound dispersion according to claim 1 .

11 . A tantalic acid compound film comprising the tantalic acid compound in the tantalic acid compound dispersion according to claim 1 .

12 . A coating agent comprising the tantalic acid compound dispersion according to claim 1 .

13 . A coating agent comprising the tantalic acid compound powder according to claim 10 .

14 . A positive electrode active material for a lithium ion secondary battery, wherein a surface of the positive electrode active material is covered with the tantalic acid compound contained in the tantalic acid compound dispersion according to claim 1 .

15 . A lithium ion secondary battery comprising a positive electrode covered with the positive electrode active material according to claim 14 .

16 . A method of producing a tantalic acid compound dispersion, the method comprising:

a reaction step of generating a tantalum compound aqueous solution by adding hydrogen peroxide to a tantalum fluoride aqueous solution; and

a reverse neutralization step of generating a tantalum-containing precipitate by adding the tantalum compound aqueous solution to an alkaline aqueous solution.

17 . The method of producing the tantalic acid compound dispersion according to claim 16 , the method comprising a step of mixing the tantalum-containing precipitate with an organic nitrogen compound.

18 . The method of producing the tantalic acid compound dispersion according to claim 16 , the method comprising a step of mixing the tantalum-containing precipitate with a hydroxide of an element M including one or more elements M selected from the group consisting of alkali metal elements and alkaline earth metal elements.

19 . The method of producing the tantalic acid compound dispersion according to claim 18 , wherein the hydroxide of the element M is lithium hydroxide.

Assignments (2)
CHANGE OF NAME Recorded Nov 14, 2025
From: MITSUI MINING & SMELTING CO., LTD.
To: MITSUI KINZOKU COMPANY, LIMITED
Reel/Frame 073570/0734 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 23, 2024
From: ARAKAWA, DAIKI; SEKI SATO, RIKO; HARA, SYUHEI
To: MITSUI MINING & SMELTING CO., LTD.
Reel/Frame 068988/0645 →