ENHANCED EUV PHOTORESISTS AND METHODS OF THEIR USE

1 . A composition of matter comprising a solvent; and an ester having a chemical structure (I),

wherein X, Y and R 1 -R 4 and are branched or unbranched, substituted or unsubstituted alkyl chains of 1-24 carbon atoms having 0-16 heteroatoms substituted into the chain, are substituted or unsubstituted phenyl groups, heteroaromatic groups, or fused aromatic or fused heteroaromatic groups or combinations of both.

2 . The composition of matter of claim 1 , further comprising, in admixture, one or more photoacid generators chosen from a sulfonium salt, an iodonium salt, a sulfone imide, a halogen-containing compound, a sulfone compound, an ester sulfonate compound, a diazomethane compound, a dicarboximidyl sulfonic acid ester, an ylideneaminooxy sulfonic acid ester, a sulfanyldiazomethane, or a mixture thereof.

3 . The composition of matter of claim 2 , further comprising at least one crosslinker, wherein the at least one crosslinker comprises an acid sensitive monomer or polymer, and wherein the at least one crosslinker comprises at least one of a glycidyl ether, a glycidyl ether of novolac resin, glycidyl ester, glycidyl amine, a methoxymethyl group, an ethoxy methyl group, a butoxymethyl group, a benzyloxymethyl group, dimethylamino methyl group, diethylamino methyl group, a dibutoxymethyl group, a dimethylol amino methyl group, diethylol amino methyl group, a dibutylol amino methyl group, a morpholino methyl group, acetoxymethyl group, benzyloxy methyl group, formyl group, acetyl group, vinyl group or an isopropenyl group.

4 . The composition of matter of claim 3 , wherein the composition is a photoresist sensitive to ultraviolet (UV), deep UV, vacuum UV, extreme UV, beyond EUV (BEUV), x-rays, electron beams and ion beams.

5 . A composition of matter comprising: a solvent; and an ester having a chemical structure chosen from (IV):

wherein m=1-4, n=1-4, and wherein X and Y are the same or different and are branched or unbranched, substituted or unsubstituted alkyl chains of 1-24 carbon atoms having 0-16 heteroatoms substituted into the chain, are substituted or unsubstituted phenyl groups, heteroaromatic groups, or fused aromatic or fused heteroaromatic groups or combinations of both.

6 . The composition of matter of claim 5 , wherein m=2 and n=3.

7 . The composition of matter of claim 6 , further comprising, in admixture, one or more photoacid generators chosen from a sulfonium salt, an iodonium salt, a sulfone imide, a halogen-containing compound, a sulfone compound, an ester sulfonate compound, a diazomethane compound, a dicarboximidyl sulfonic acid ester, an ylideneaminooxy sulfonic acid ester, a sulfanyldiazomethane, or a mixture thereof.

8 . The composition of matter of claim 7 , further comprising at least one crosslinker, wherein the at least one crosslinker comprises an acid sensitive monomer or polymer, and wherein the at least one crosslinker comprises at least one of a glycidyl ether, a glycidyl ether of a novolac resin, glycidyl ester, glycidyl amine, a methoxymethyl group, an ethoxy methyl group, a butoxymethyl group, a benzyloxymethyl group, dimethylamino methyl group, diethylamino methyl group, a dibutoxymethyl group, a dimethylol amino methyl group, diethylol amino methyl group, a dibutylol amino methyl group, a morpholino methyl group, acetoxymethyl group, benzyloxy methyl group, formyl group, acetyl group, vinyl group or an isopropenyl group.

9 . The composition of matter of claim 8 , wherein the composition is a photoresist sensitive to ultraviolet (UV), deep UV, vacuum UV, extreme UV, x-rays, electron beams and ion beams.