POLISHING MATERIAL SLURRY AND POLISHING METHOD OF SAME
An abrasive slurry of the present invention includes manganese oxide abrasive grains containing manganese oxide particles, permanganate ions, and phosphates. Furthermore, in a polishing method of the abrasive slurry of the present invention, an object to be polished is polished using the abrasive slurry of the present invention.
1 . An abrasive slurry comprising:
manganese oxide abrasive grains containing manganese oxide particles;
permanganate ions; and
phosphates.
2 . The abrasive slurry according to claim 1 , wherein the phosphates are inorganic phosphorus compounds.
3 . The abrasive slurry according to claim 2 , wherein the inorganic phosphorus compounds are pyrophosphate compounds.
4 . The abrasive slurry according to claim 1 , further comprising:
a cellulose-based surfactant and/or a cationic surfactant.
5 . The abrasive slurry according to claim 4 , wherein the cellulose-based surfactant contains carboxymethyl cellulose.
6 . The abrasive slurry according to claim 1 , wherein the content of the manganese oxide abrasive grains is 0.5 mass % or more and 20 mass % or less,
the content of the permanganate ions is 0.5 mass % or more and 3.2 mass % or less, and
the content of the phosphates is 0.01 mass % or more and 0.1 mass % or less.
7 . The abrasive slurry according to claim 4 , wherein the content of the manganese oxide abrasive grains is 0.5 mass % or more and 20 mass % or less,
the content of the permanganate ions is 0.5 mass % or more and 3.2 mass % or less,
the content of the phosphates is 0.01 mass % or more and 0.1 mass % or less, and
the total content of the cellulose-based surfactant and/or the cationic surfactant is 1.0 mass % or less.
8 . A polishing method comprising:
polishing an object to be polished using the abrasive slurry according to claim 1 .
9 . A polishing method comprising:
polishing an object to be polished using the abrasive slurry according to claim 6 .
10 . A polishing method comprising:
polishing an object to be polished using the abrasive slurry according to claim 7 .
11 . The abrasive slurry according to claim 2 , wherein the content of the manganese oxide abrasive grains is 0.5 mass % or more and 20 mass % or less,
the content of the permanganate ions is 0.5 mass % or more and 3.2 mass % or less, and
the content of the phosphates is 0.01 mass % or more and 0.1 mass % or less.
12 . The abrasive slurry according to claim 3 , wherein the content of the manganese oxide abrasive grains is 0.5 mass % or more and 20 mass % or less,
the content of the permanganate ions is 0.5 mass % or more and 3.2 mass % or less, and
the content of the phosphates is 0.01 mass % or more and 0.1 mass % or less.
13 . The abrasive slurry according to claim 5 , wherein the content of the manganese oxide abrasive grains is 0.5 mass % or more and 20 mass % or less,
the content of the permanganate ions is 0.5 mass % or more and 3.2 mass % or less,
the content of the phosphates is 0.01 mass % or more and 0.1 mass % or less, and
the total content of the cellulose-based surfactant and/or the cationic surfactant is 1.0 mass % or less.