POLISHING MATERIAL SLURRY AND POLISHING METHOD OF SAME

1 . An abrasive slurry comprising:

manganese oxide abrasive grains containing manganese oxide particles;

permanganate ions;

phosphates; and

a polymeric additive containing one or more water-soluble organic polymers selected from the group consisting of a polycarboxylic acid, a polycarboxylate, a salt of naphthalene sulfonic acid formalin condensate, polyvinyl alcohol, polyethylene glycose, polyvinylpyrrolidone, and copolymers thereof.

2 . The abrasive slurry according to claim 1 , wherein the polymeric additive is one or more water-soluble organic polymers selected from a polycarboxylic acid, a polycarboxylate, and copolymers thereof.

3 . The abrasive slurry according to claim 2 , wherein the polymeric additive is one or more water-soluble organic polymers selected from polyacrylic acid, a polyacrylate, and copolymers thereof.

4 . The abrasive slurry according to claim 3 , wherein the polymeric additive is ammonium polyacrylate.

5 . The abrasive slurry according to claim 1 , wherein the phosphates are pyrophosphate compounds.

6 . The abrasive slurry according to claim 1 , wherein

the content of the manganese oxide abrasive grains is 0.5 mass % or more and 20 mass % or less,

the content of the permanganate ions is 0.5 mass % or more and 3.2 mass % or less,

the content of the phosphates is 0.001 mass % or more and 0.1 mass % or less, and

the content of the polymeric additive is 0.006 mass % or more and 0.05 mass % or less.

7 . A polishing method comprising:

polishing an object to be polished using the abrasive slurry according to claim 1 .

8 . A polishing method comprising:

polishing an object to be polished using the abrasive slurry according to claim 6 .