IP Library Granted Patent US 12,342,937
Granted Patent B1
US 12,342,937 · App. 18/932,203 · Granted Jul 1, 2025

Desktop workspace that adjusts vertically

Inventor: Nathan Mark Poniatowski (St. Petersburg, FL)
Assignee: Office Kick, Inc.
A47B9/16A47B21/02A47B21/0314A47B21/04A47B2021/0335
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12,342,937
App. No.
18/932,203
Granted
Jul 1, 2025
Kind
B1
Abstract

A desktop workspace that adjusts vertically includes a work surface platform, a base configured to sit on an existing platform, such as a desk, a height adjustable mechanism including at least one set of arms that connect at a pivot point(s) creating a scissoring motion to raise and lower the said work surface platform to various heights. A locking and unlocking mechanism may connect to the height adjustable mechanism. In some cases, the apparatus includes an adjustable mechanism to support items such as a keyboard. In some cases, the apparatus includes elements to raise items such as a monitor to an additional height.

Claims (82)

1. A desktop workspace that adjusts vertically, comprising:

a work surface platform;

a keyboard platform that protrudes out, down, and parallel to the work surface platform;

a base configured to sit on an existing platform;

a height adjustment mechanism connecting the work surface platform and the base, the height adjustment mechanism including:

a set of scissoring arms including a first arm rotatably connected to the base and a second arm rotatably connected to the work surface platform, the first arm and the second arm being pivotably connected to one another,

wherein the set of scissoring arms further includes a third arm rotatably connected to the base;

the set of scissoring arms creating a scissoring motion when raising and lowering the work surface platform to various heights;

a first sliding mechanism on an end of the second arm between the end of the second arm and the base; and

a second sliding mechanism on an end of the first arm between the end of the first arm and the work surface platform;

a gas spring attached to the height adjustment mechanism to provide a force to assist in elevation of the work surface platform; and

an element that connects the first arm to the third arm,

wherein the gas spring is attached to the element to provide the force to assist in elevation of the work surface platform, and

wherein the gas spring acts as a locking device that holds the work surface platform at various vertical heights above the base.

2. The desktop workspace of claim 1 , wherein the first arm is rotatably connected to the base with a base pivot point, and wherein the second arm is rotatably connected to the work surface platform with a platform pivot point.

3. The desktop workspace of claim 1 , wherein the first arm is rotatably connected to the work surface platform by a sliding point.

4. The desktop workspace of claim 3 ,

wherein the sliding point is a first sliding point, and

wherein the second arm is rotatably connected to the base by a second sliding point.

5. The desktop workspace of claim 1 , wherein the element extends between ends of the first arm and the third arm that are adjacent to the work surface platform.

6. The desktop workspace of claim 1 , wherein the element is attached on the same side of the first arm as the second sliding mechanism relative to the connection between the first arm and the second arm.

7. The desktop workspace of claim 1 , wherein the element includes a cross beam.

8. The desktop workspace of claim 1 , wherein the gas spring is a first spring, the desktop workspace comprising a pair of springs attached to the height adjustment mechanism to assist in the elevation of the work surface platform, the pair of springs including the first spring and a second spring.

9. The desktop workspace of claim 1 ,

wherein the first sliding mechanism includes a first channel or track mounted to the base, and

wherein the second sliding mechanism includes a second channel or track mounted to the work surface platform.

10. The desktop workspace of claim 9 ,

wherein a first sliding point of the first arm is slideably engaged with the second channel or track; and

wherein a second sliding point of the second arm is slideably engaged with the first channel or track.

11. The desktop workspace of claim 1 , wherein the scissoring motion when raising and lowering the work surface platform to various heights of the height adjustment mechanism moves the work surface platform in a straight vertical direction relative to the base.

12. The desktop workspace of claim 1 ,

wherein the work surface platform forms an upper work surface, and

wherein the gas spring is completely covered by a profile of the work surface platform when viewed from above the upper work surface relative to the base, the profile of the work surface platform being defined by an outer perimeter of the upper work surface.

13. The desktop workspace of claim 1 , further comprising a keyboard tray mechanism configured to hold the keyboard platform in the position that protrudes out, down, and parallel to the work surface platform and to allow the keyboard platform to be stored under the work surface platform.

14. The desktop workspace of claim 1 , further comprising a work surface platform element sitting on the work surface platform, the work surface platform element including an elevated platform surface above the work surface platform.

15. The desktop workspace of claim 1 , wherein the locking device applies pressure to prevent the height adjustment mechanism from moving.

16. The desktop workspace of claim 1 ,

wherein the set of scissoring arms is a first set of scissoring arms, wherein the first arm and the second arm connect at a first scissoring pivot point,

the desktop workspace further comprising:

a second set of scissoring arms including the third arm rotatably connected to the base and a fourth arm rotatably connected to the work surface platform, the third arm and the fourth arm connecting at a second scissoring pivot point.

17. The desktop workspace of claim 16 ,

wherein the first arm is rotatably connected to the work surface platform by a first sliding point,

wherein the second arm is rotatably connected to the base by a second sliding point,

wherein the third arm is rotatably connected to the work surface platform by a third sliding point, and

wherein the fourth arm is rotatably connected to the base by a fourth sliding point.

18. The desktop workspace of claim 16 , wherein the second set of scissoring arms is configured to operate in parallel to the first set of scissoring arms with the third arm moving parallel to the first arm and the fourth arm moving parallel to the second arm.

19. The desktop workspace of claim 1 , wherein the third arm is configured to operate in parallel to the first arm.

20. The desktop workspace of claim 1 , wherein the first arm is rotatably connected to the work surface platform by a first sliding point,

wherein the second arm is rotatably connected to the base by a second sliding point, and

wherein the third arm is rotatably connected to the work surface platform by a third sliding point.

21. The desktop workspace of claim 1 , wherein the gas spring is attached to an interior portion of the element with gaps between the first arm, the third arm and the gas spring.

22. A desktop workspace that adjusts vertically, comprising:

a work surface platform;

a keyboard platform that protrudes out, down, and parallel to the work surface platform;

a base configured to sit on an existing platform;

a height adjustment mechanism connecting the work surface platform and the base, the height adjustment mechanism including:

a set of scissoring arms including a first arm rotatably connected to the base and a second arm rotatably connected to the work surface platform, the first arm and the second arm being pivotably connected to one another,

the set of scissoring arms creating a scissoring motion when raising and lowering the work surface platform to various heights;

a first sliding mechanism on an end of the second arm between the end of the second arm and the base; and

a second sliding mechanism on an end of the first arm between the end of the first arm and the work surface platform; and

a spring attached to the height adjustment mechanism to provide a force to assist in elevation of the work surface platform,

wherein the spring is attached to the work surface platform, and

wherein the spring acts as a locking device that holds the work surface platform at various vertical heights above the base.

23. The desktop workspace of claim 22 ,

wherein the first arm is rotatably connected to the work surface platform by a first sliding point, and

wherein the second arm is rotatably connected to the base by a second sliding point.

24. The desktop workspace of claim 22 , wherein the spring is attached to a point of the first arm or the second arm.

25. A desktop workspace that adjusts vertically, comprising:

a work surface platform;

a keyboard platform that protrudes out, down, and parallel to the work surface platform;

a base configured to sit on an existing platform;

a height adjustment mechanism connecting the work surface platform and the base, the height adjustment mechanism including:

a set of scissoring arms including a first arm rotatably connected to the base and a second arm rotatably connected to the work surface platform, the first arm and the second arm being pivotably connected to one another,

the set of scissoring arms creating a scissoring motion when raising and lowering the work surface platform to various heights;

a first sliding mechanism on an end of the second arm between the end of the second arm and the base; and

a second sliding mechanism on an end of the first arm between the end of the first arm and the work surface platform; and

a spring attached to the height adjustment mechanism to provide a force to assist in elevation of the work surface platform,

wherein the spring is attached to a point of the first arm or the second arm, and

wherein the spring acts as a locking device that holds the work surface platform at various vertical heights above the base.

26. The desktop workspace of claim 25 ,

wherein the first arm is rotatably connected to the work surface platform by a first sliding point, and

wherein the second arm is rotatably connected to the base by a second sliding point.

Continuity (8)
Continuation 18481082 · Oct 4, 2023
Continuation 17985137 · Nov 10, 2022
Continuation 17493812 · Oct 4, 2021
Continuation 16785647 · Feb 9, 2020
Continuation 16372334 · Apr 1, 2019
Division 15628558 · Jun 20, 2017
Division 15004926 · Jan 23, 2016
Provisional Application 62107380 · Jan 24, 2015
References Cited (370)
US 200057A · Hart · 1878 [cited by applicant]
US 317468A · Morstatt · 1885 [cited by applicant]
US 606845A · Simmons · 1898 [cited by applicant]
US 835247A · Morgan · 1906 [cited by applicant]
US 1217772A · Kade · 1917 [cited by applicant]
US 1318564A · Jenkins · 1919 [cited by applicant]
US 2225243A · Zottel · 1940 [cited by applicant]
US 2260695A · Self · 1941 [cited by applicant]
US 2692807A · Fred · 1954 [cited by applicant]
US 2843418A · Gray · 1958 [cited by applicant]
US 2916340A · Jackson · 1959 [cited by applicant]
US 2937003A · Croll · 1960 [cited by applicant]
US 3092918A · Haeussermann et al. · 1963 [cited by applicant]
US 3110476A · Farris · 1963 [cited by applicant]
US 3152833A · Creveling et al. · 1964 [cited by applicant]
US 3282566A · Clarke · 1966 [cited by applicant]
US 3295800A · Karl-Erik et al. · 1967 [cited by applicant]
US 3404791A · Roy · 1968 [cited by applicant]
US 3444830A · Doetsch · 1969 [cited by applicant]
US 3727245A · Gerth · 1973 [cited by applicant]
US 3823915A · Koehler · 1974 [cited by applicant]
US 3826457A · De · 1974 [cited by applicant]
US 4072288A · Wirges et al. · 1978 [cited by applicant]
US 4097941A · Merkel · 1978 [cited by applicant]
US 4221280A · Richards · 1980 [cited by applicant]
US 4249749A · Collier · 1981 [cited by applicant]
US 4382573A · Aondetto · 1983 [cited by applicant]
US 4403680A · Hillesheimer · 1983 [cited by applicant]
US 4433759A · Ichinose · 1984 [cited by applicant]
US 4448386A · Moorhouse et al. · 1984 [cited by applicant]
US 4449262A · Jahsman et al. · 1984 [cited by applicant]
US 4534544A · Heide · 1985 [cited by applicant]
US 4549720A · Bergenwall · 1985 [cited by applicant]
US 4558648A · Franklin et al. · 1985 [cited by applicant]
US 4558847A · Coates · 1985 [cited by applicant]
US 4574785A · Yamamoto · 1986 [cited by applicant]
US 4577821A · Edmo et al. · 1986 [cited by applicant]
US 4611823A · Haas · 1986 [cited by applicant]
US 4625657A · Little et al. · 1986 [cited by applicant]
US 4640488A · Sakamoto · 1987 [cited by applicant]
US 4659052A · Nagata · 1987 [cited by applicant]
US 4702454A · Izumida · 1987 [cited by applicant]
US 4709972A · LaBudde et al. · 1987 [cited by applicant]
US 4717112A · Pirkle · 1988 [cited by applicant]
US 4741512A · Elkuch et al. · 1988 [cited by applicant]
US 4753419A · Johansson · 1988 [cited by applicant]
US 4826123A · Hannah et al. · 1989 [cited by applicant]
US 4843978A · Schmidt et al. · 1989 [cited by applicant]
US D302893S · Wakefield · 1989 [cited by applicant]
US 4899987A · Craig · 1990 [cited by applicant]
US 4909159A · Gonsoulin · 1990 [cited by applicant]
US D308537S · Clark · 1990 [cited by applicant]
US 4941641A · Granzow et al. · 1990 [cited by applicant]
US 4967672A · Leather · 1990 [cited by applicant]
US 4995130A · Hahn et al. · 1991 [cited by applicant]
US 5037163A · Hatcher · 1991 [cited by applicant]
US 5048784A · Schwartz et al. · 1991 [cited by applicant]
US 5074000A · Soltani et al. · 1991 [cited by applicant]
US 5211367A · Musculus · 1993 [cited by applicant]
US 5251864A · Itou · 1993 [cited by applicant]
US 5257767A · McConnell · 1993 [cited by applicant]
US 5294087A · Drabczyk et al. · 1994 [cited by applicant]
US 5400720A · Stevens · 1995 [cited by applicant]
US 5460460A · Alexander · 1995 [cited by applicant]
US 5580027A · Brodersen · 1996 [cited by applicant]
US 5588377A · Fahmian · 1996 [cited by applicant]
US 5588727A · D'Agaro et al. · 1996 [cited by applicant]
US 5626323A · Lechman et al. · 1997 [cited by applicant]
US 5632209A · Sakakibara · 1997 [cited by applicant]
US 5694864A · Langewellpott · 1997 [cited by applicant]
US 5695173A · Ochoa et al. · 1997 [cited by applicant]
US 5722513A · Rowan et al. · 1998 [cited by applicant]
US 5729430A · Johnson · 1998 [cited by applicant]
US 5765797A · Greene et al. · 1998 [cited by applicant]
US 5823487A · Kirchhoff et al. · 1998 [cited by applicant]
US 5829948A · Becklund · 1998 [cited by applicant]
US 5836562A · Danzyger et al. · 1998 [cited by applicant]
US 5895020A · Danzyger et al. · 1999 [cited by applicant]
US 5926876A · Haigh et al. · 1999 [cited by applicant]
US 5957426A · Brodersen · 1999 [cited by applicant]
US 6076785A · Oddsen, Jr. · 2000 [cited by applicant]
US 6098961A · Gionet · 2000 [cited by applicant]
US 6135546A · Demtchouk · 2000 [cited by applicant]
US 6148739A · Martin · 2000 [cited by applicant]
US 6176456B1 · Wisniewski · 2001 [cited by applicant]
US 6179261B1 · Lin · 2001 [cited by applicant]
US 6220558B1 · Broder et al. · 2001 [cited by applicant]
US 6269753B1 · Roddan · 2001 [cited by applicant]
US 6273382B1 · Pemberton · 2001 [cited by applicant]
US 6381335B2 · Juszkiewicz et al. · 2002 [cited by applicant]
US 6488248B1 · Watt et al. · 2002 [cited by applicant]
US 6516478B2 · Cook et al. · 2003 [cited by applicant]
US 6533229B1 · Hung · 2003 [cited by applicant]
US 6533479B2 · Kochanski · 2003 [cited by applicant]
US 6550740B1 · Burer · 2003 [cited by applicant]
US 6672430B2 · Boucher et al. · 2004 [cited by applicant]
US 6701853B1 · Hwang · 2004 [cited by applicant]
US 6702372B2 · Tholkes et al. · 2004 [cited by applicant]
US 6722618B1 · Wu · 2004 [cited by applicant]
US 6742768B2 · Alba · 2004 [cited by applicant]
US 6792876B2 · Lin · 2004 [cited by applicant]
US 6857493B2 · Shupp et al. · 2005 [cited by applicant]
US 6938866B2 · Kirchhoff · 2005 [cited by applicant]
US 7048236B2 · Benden et al. · 2006 [cited by applicant]
US 7188813B2 · Kollar · 2007 [cited by applicant]
US 7204193B2 · Scherrer et al. · 2007 [cited by applicant]
US 7207629B2 · Goetz et al. · 2007 [cited by applicant]
US 7246784B1 · Lopez · 2007 [cited by applicant]
US 7568675B2 · Catton · 2009 [cited by applicant]
US 7575205B2 · Kirchhoff · 2009 [cited by applicant]
US 7677518B2 · Chouinard et al. · 2010 [cited by applicant]
US D622350S · Gramegna et al. · 2010 [cited by applicant]
US 7793597B2 · Bart et al. · 2010 [cited by applicant]
US 7841570B2 · Mileos et al. · 2010 [cited by applicant]
US 7845665B2 · Borisoff · 2010 [cited by applicant]
US 7946551B1 · Cvek · 2011 [cited by applicant]
US 7950338B2 · Smed · 2011 [cited by applicant]
US 7988232B2 · Weber et al. · 2011 [cited by applicant]
US 8015638B2 · Shimada et al. · 2011 [cited by applicant]
US 8132518B2 · Kim et al. · 2012 [cited by applicant]
US 8303062B2 · Zanelli · 2012 [cited by applicant]
US 8469152B2 · Olsen et al. · 2013 [cited by applicant]
US 8490933B2 · Papic et al. · 2013 [cited by applicant]
US 8544391B2 · Knox et al. · 2013 [cited by applicant]
US 8671853B2 · Flaherty · 2014 [cited by applicant]
US 8684339B2 · Deml et al. · 2014 [cited by applicant]
US 8800976B2 · Bethina et al. · 2014 [cited by applicant]
US 8931750B2 · Kohl et al. · 2015 [cited by applicant]
US 8950343B2 · Huang · 2015 [cited by applicant]
US 9049923B1 · Delagey et al. · 2015 [cited by applicant]
US 9055810B2 · Flaherty · 2015 [cited by applicant]
US 9113703B2 · Flaherty · 2015 [cited by applicant]
US 9133974B2 · Tholkes et al. · 2015 [cited by applicant]
US 9133976B2 · Lin et al. · 2015 [cited by applicant]
US 9232855B2 · Ergun et al. · 2016 [cited by applicant]
US 9326598B1 · West et al. · 2016 [cited by applicant]
US 9440559B2 · Gundall et al. · 2016 [cited by applicant]
US 9480332B2 · Han · 2016 [cited by applicant]
US 9504316B1 · Streicher et al. · 2016 [cited by applicant]
US 9554644B2 · Flaherty et al. · 2017 [cited by applicant]
US 9668572B2 · Ergun et al. · 2017 [cited by applicant]
US 9681746B1 · Chen · 2017 [cited by applicant]
US 9809136B2 · Haller et al. · 2017 [cited by applicant]
US 9815672B2 · Baudermann · 2017 [cited by applicant]
US 9854904B2 · Getz · 2018 [cited by applicant]
US 9955780B2 · Koch · 2018 [cited by applicant]
US 9961991B1 · Chen · 2018 [cited by applicant]
US 9981571B2 · Garing · 2018 [cited by applicant]
US 9993068B2 · Lin et al. · 2018 [cited by applicant]
US 10018298B2 · Goldish et al. · 2018 [cited by applicant]
US 10023355B2 · Taylor et al. · 2018 [cited by applicant]
US D830739S · Min · 2018 [cited by applicant]
US 10114352B2 · Matlin · 2018 [cited by applicant]
US D832623S · Flaherty et al. · 2018 [cited by applicant]
US 10123613B2 · Hall et al. · 2018 [cited by applicant]
US 10159336B2 · Liao et al. · 2018 [cited by applicant]
US D841014S · Laudadio et al. · 2019 [cited by applicant]
US D845037S · Min · 2019 [cited by applicant]
US D845678S · Laudadio et al. · 2019 [cited by applicant]
US 10244861B1 · Poniatowski · 2019 [cited by applicant]
US 10258148B1 · Donner et al. · 2019 [cited by applicant]
US 10258149B2 · Zhong · 2019 [cited by applicant]
US 10264877B2 · Hu et al. · 2019 [cited by applicant]
US 10306977B2 · Wong · 2019 [cited by applicant]
US D854775S · Chang et al. · 2019 [cited by applicant]
US 10405647B2 · Laudadio et al. · 2019 [cited by applicant]
US 10413055B2 · Laudadio et al. · 2019 [cited by applicant]
US D862936S · Laudadio et al. · 2019 [cited by applicant]
US 10485336B1 · Laudadio et al. · 2019 [cited by applicant]
US D870490S · Hu · 2019 [cited by applicant]
US 10499730B2 · Kim et al. · 2019 [cited by applicant]
US 10517390B2 · Xiang et al. · 2019 [cited by applicant]
US 10524565B2 · Ergun et al. · 2020 [cited by applicant]
US 10542817B2 · Swartz et al. · 2020 [cited by applicant]
US 10544019B2 · Kochie et al. · 2020 [cited by applicant]
US 10568416B1 · Poniatowski · 2020 [cited by applicant]
US 10575630B1 · Poniatowski · 2020 [cited by applicant]
US D901959S · Chang · 2020 [cited by applicant]
US 10849424B2 · Laudadio et al. · 2020 [cited by applicant]
US 10869549B2 · Xiang et al. · 2020 [cited by applicant]
US 10893748B1 · Poniatowski · 2021 [cited by applicant]
US 11058217B2 · Laudadio et al. · 2021 [cited by applicant]
US 11083282B1 · Liu · 2021 [cited by applicant]
US 11134773B1 · Poniatowski · 2021 [cited by applicant]
US 11134774B1 · Poniatowski · 2021 [cited by applicant]
US 11140977B1 · Poniatowski · 2021 [cited by applicant]
US 11147366B1 · Poniatowski · 2021 [cited by applicant]
US 11160367B1 · Poniatowski · 2021 [cited by applicant]
US 11219307B2 · Laudadio et al. · 2022 [cited by applicant]
US 11388989B1 · Poniatowski · 2022 [cited by applicant]
US 11388991B1 · Poniatowski · 2022 [cited by applicant]
US 11395544B1 · Poniatowski · 2022 [cited by applicant]
US 11464325B1 · Poniatowski · 2022 [cited by applicant]
US 11470959B1 · Poniatowski · 2022 [cited by applicant]
US 11717080B2 · Laudadio et al. · 2023 [cited by applicant]
US 11771218B2 · Laudadio et al. · 2023 [cited by applicant]
US 11800927B1 · Poniatowski · 2023 [cited by applicant]
US 11849843B1 · Poniatowski · 2023 [cited by applicant]
US 11857073B1 · Poniatowski · 2024 [cited by applicant]
US 11864654B1 · Poniatowski · 2024 [cited by applicant]
US 11910926B1 · Poniatowski · 2024 [cited by applicant]
US 11925264B1 · Poniatowski · 2024 [cited by applicant]
US 11944196B1 · Poniatowski · 2024 [cited by applicant]
US 11950699B1 · Poniatowski · 2024 [cited by applicant]
US 11980289B1 · Poniatowski · 2024 [cited by applicant]
US 12082695B1 · Poniatowski · 2024 [cited by applicant]
US 12082696B1 · Poniatowski · 2024 [cited by applicant]
US 12102229B1 · Poniatowski · 2024 [cited by applicant]
US 12121149B1 · Poniatowski · 2024 [cited by applicant]
US 12193569B1 · Poniatowski · 2025 [cited by applicant]
US 12226015B1 · Poniatowski · 2025 [cited by applicant]
US 20030042380A1 · Hagglund et al. · 2003 [cited by applicant]
US 20030213415A1 · Ross et al. · 2003 [cited by applicant]
US 20040035332A1 · Lin · 2004 [cited by applicant]
US 20040040480A1 · Hwang · 2004 [cited by applicant]
US 20050029849A1 · Goetz et al. · 2005 [cited by applicant]
US 20050120922A1 · Brooks · 2005 [cited by applicant]
US 20070001077A1 · Kirchhoff · 2007 [cited by applicant]
US 20070080564A1 · Chen · 2007 [cited by applicant]
US 20070266912A1 · Swain · 2007 [cited by applicant]
US 20070295882A1 · Catton · 2007 [cited by applicant]
US 20080000393A1 · Wilson et al. · 2008 [cited by applicant]
US 20090090832A1 · Mileos et al. · 2009 [cited by applicant]
US 20090145336A1 · Kenny · 2009 [cited by applicant]
US 20090146389A1 · Borisoff · 2009 [cited by applicant]
US 20090200437A1 · Smed · 2009 [cited by applicant]
US 20100242174A1 · Morrison et al. · 2010 [cited by applicant]
US 20100257671A1 · Shimada et al. · 2010 [cited by applicant]
US 20110001033A1 · Kohl et al. · 2011 [cited by applicant]
US 20110024958A1 · Deml et al. · 2011 [cited by applicant]
US 20120060291A1 · Gamman et al. · 2012 [cited by applicant]
US 20120097822A1 · Hammarskiöld · 2012 [cited by applicant]
US 20120188302A1 · Zanelli · 2012 [cited by applicant]
US 20130145972A1 · Knox et al. · 2013 [cited by applicant]
US 20130193392A1 · McGinn · 2013 [cited by applicant]
US 20130199420A1 · Hjelm · 2013 [cited by applicant]
US 20130340655A1 · Flaherty · 2013 [cited by applicant]
US 20140041554A1 · Huang · 2014 [cited by applicant]
US 20140144352A1 · Roberts · 2014 [cited by applicant]
US 20140158026A1 · Flaherty · 2014 [cited by applicant]
US 20140248114A1 · Sawyer · 2014 [cited by applicant]
US 20140339747A1 · Bethina et al. · 2014 [cited by applicant]
US 20140360411A1 · Hatter · 2014 [cited by applicant]
US 20150028787A1 · Sekine et al. · 2015 [cited by applicant]
US 20150216296A1 · Mitchell · 2015 [cited by applicant]
US 20150231992A1 · Gundall et al. · 2015 [cited by applicant]
US 20150232005A1 · Haller et al. · 2015 [cited by applicant]
US 20150274038A1 · Garing · 2015 [cited by applicant]
US 20150289641A1 · Ergun et al. · 2015 [cited by applicant]
US 20150368082A1 · Davis et al. · 2015 [cited by applicant]
US 20150375896A1 · Taylor et al. · 2015 [cited by applicant]
US 20160051042A1 · Koch · 2016 [cited by applicant]
US 20160060084A1 · Baudermann · 2016 [cited by applicant]
US 20160106205A1 · Hall et al. · 2016 [cited by applicant]
US 20160170402A1 · Lindström · 2016 [cited by applicant]
US 20160249737A1 · Han · 2016 [cited by applicant]
US 20160258573A1 · Goldish et al. · 2016 [cited by applicant]
US 20160260019A1 · Ruiz et al. · 2016 [cited by applicant]
US 20160309889A1 · Lin et al. · 2016 [cited by applicant]
US 20160338486A1 · Martin · 2016 [cited by applicant]
US 20160353880A1 · Sigal et al. · 2016 [cited by applicant]
US 20170071332A1 · Herring et al. · 2017 [cited by applicant]
US 20170174486A1 · Kochie et al. · 2017 [cited by applicant]
US 20170196351A1 · Failing · 2017 [cited by applicant]
US 20170354245A1 · Martin et al. · 2017 [cited by applicant]
US 20170360192A1 · Hu · 2017 [cited by applicant]
US 20180008037A1 · Laudadio · 2018 [cited by applicant]
US 20180055214A1 · Kim et al. · 2018 [cited by applicant]
US 20180103752A1 · Zhong · 2018 [cited by applicant]
US 20180125227A1 · Xiang et al. · 2018 [cited by applicant]
US 20180160799A1 · Westergård et al. · 2018 [cited by applicant]
US 20180177289A1 · Chen · 2018 [cited by applicant]
US 20180213929A1 · Ergun et al. · 2018 [cited by applicant]
US 20180255919A1 · Swartz et al. · 2018 [cited by applicant]
US 20180279770A1 · Crowe et al. · 2018 [cited by applicant]
US 20180360208A1 · Liao et al. · 2018 [cited by applicant]
US 20190110588A1 · Wong · 2019 [cited by applicant]
US 20190183239A1 · Semmelrath et al. · 2019 [cited by applicant]
US 20190269237A1 · Zhu · 2019 [cited by applicant]
US 20200029685A1 · Du et al. · 2020 [cited by applicant]
US 20200107633A1 · Kang · 2020 [cited by applicant]
US 20230329430A1 · Laudadio et al. · 2023 [cited by applicant]
AU 5691386A · 1986 [cited by applicant]
AU 580874B2 · 1989 [cited by applicant]
AU 2014216002A1 · 2015 [cited by applicant]
CA 2814945C · 2019 [cited by applicant]
CN 1142343A · 1997 [cited by applicant]
CN 2637251Y · 2004 [cited by applicant]
CN 2781893Y · 2006 [cited by applicant]
CN 201657970U · 2010 [cited by applicant]
CN 102599728A · 2012 [cited by applicant]
CN 202681005U · 2013 [cited by applicant]
CN 202681013U · 2013 [cited by applicant]
CN 202874336U · 2013 [cited by applicant]
CN 101711220B · 2013 [cited by applicant]
CN 203333240U · 2013 [cited by applicant]
CN 103653780A · 2014 [cited by applicant]
CN 203934825U · 2014 [cited by applicant]
CN 204541230U · 2015 [cited by applicant]
CN 105124920A · 2015 [cited by applicant]
CN 204949970U · 2016 [cited by applicant]
CN 104692286B · 2017 [cited by applicant]
CN 104540707B · 2017 [cited by applicant]
CN 107048694A · 2017 [cited by applicant]
CN 107048695A · 2017 [cited by applicant]
CN 107212587A · 2017 [cited by applicant]
CN 107744256A · 2018 [cited by applicant]
CN 107756350A · 2018 [cited by applicant]
CN 107912868A · 2018 [cited by applicant]
CN 207186305U · 2018 [cited by applicant]
CN 109008216A · 2018 [cited by applicant]
CN 208403596U · 2019 [cited by applicant]
CN 110840072A · 2020 [cited by applicant]
CN 108024625B · 2021 [cited by applicant]
DE 2851555A1 · 1980 [cited by applicant]
DE 8606822U1 · 1991 [cited by applicant]
DE 9302967U1 · 1993 [cited by applicant]
DE 4424564A1 · 1996 [cited by applicant]
DE 29515642U1 · 1996 [cited by applicant]
DE 69111809T2 · 1996 [cited by applicant]
DE 19526596A1 · 2004 [cited by applicant]
DE 102013008020A1 · 2014 [cited by applicant]
DE 202016101126U1 · 2016 [cited by applicant]
EP 0342779B1 · 1993 [cited by applicant]
EP 0531385B1 · 1995 [cited by applicant]
EP 0448340B1 · 1996 [cited by applicant]
EP 0613852B1 · 1997 [cited by applicant]
EP 2745733A1 · 2014 [cited by applicant]
EP 3092918A1 · 2016 [cited by applicant]
FR 2252835A1 · 1975 [cited by applicant]
FR 2637165A1 · 1990 [cited by applicant]
FR 2894794A1 · 2007 [cited by applicant]
FR 3028735A1 · 2016 [cited by applicant]
JP 2012030022A · 2012 [cited by applicant]
JP 5861051B2 · 2016 [cited by applicant]
JP 2017045506A · 2017 [cited by applicant]
KR 100802663B1 · 2008 [cited by applicant]
KR 20140004886U · 2014 [cited by applicant]
KR 101527121B1 · 2015 [cited by applicant]
KR 200479292Y1 · 2016 [cited by applicant]
KR 20160074221A · 2016 [cited by applicant]
KR 101635611B1 · 2016 [cited by applicant]
KR 101747132B1 · 2017 [cited by applicant]
KR 101969133B1 · 2019 [cited by applicant]
NL 1011051C2 · 2000 [cited by applicant]
NL 2000346C2 · 2008 [cited by applicant]
TW I531523B · 2016 [cited by applicant]
WO 8304168A1 · 1983 [cited by applicant]
WO 8606053A1 · 1986 [cited by applicant]
WO 1986006054A1 · 1986 [cited by applicant]
WO 1988005759A1 · 1988 [cited by applicant]
WO 1991011979A1 · 1991 [cited by applicant]
WO 1991017906A1 · 1991 [cited by applicant]
WO 2008002373A2 · 2008 [cited by applicant]
WO 2014027010A1 · 2014 [cited by applicant]
WO 2014180572A1 · 2014 [cited by applicant]
WO 2015160825A2 · 2015 [cited by applicant]
WO 2016129971A1 · 2016 [cited by applicant]
WO 2016187212A1 · 2016 [cited by applicant]
WO 2016200318A1 · 2016 [cited by applicant]
WO 2017045506A1 · 2017 [cited by applicant]
WO 2017053200A1 · 2017 [cited by applicant]
WO 2018093007A1 · 2018 [cited by applicant]
WO 2019001506A1 · 2019 [cited by applicant]
WO 2019001507A1 · 2019 [cited by applicant]
“Easylift Gas Springs: Technical Information,” Web page, Aug. 24, 2008, retrieved from Internet Archive Wayback Machine on Aug. 29, 2022. [cited by applicant]
Adjustable Desk: Varidesk, http://www.varidesk.com, United States of America, Mar. 30, 2013. [cited by applicant]
Ergotron, http://www.ergotron.com, United States of America, Sep. 29, 2014. [cited by applicant]
Levine, James A. “Sitting down is Killing you! Heart disease, obesity, depression and crumbling bones—a terrifying new book by a top doctor reveals they are all linked to the hours we spend in chairs” Daily Mail Online,… [cited by applicant]
Lohr, Steve, Taking a Stand for Office Ergonomics, Dec. 1, 2012, New York Times, United States, retrieved from http://www.nytimes.com/2012/12/02/business/stand-up-desks-gaining-favor-in-the-workplace.html on Aug. 29, 20… [cited by applicant]
Cited By (2)
US 1,102,193 US 12,593,912