IP Library Patent Application 18995552
Patent Application
App. No. 18/995,552

DEVICE, HYDROXIDE ION CONCENTRATION MEASUREMENT APPARATUS PROVIDED WITH SAME, AND METHOD FOR MEASURING CONCENTRATION OF HYDROXIDE ION BY USING SAME

Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US None
App. No.
18/995,552
Abstract

Provided are an apparatus and a method for measuring a concentration of hydroxide ions which are capable of easily and quickly measuring the concentration of the hydroxide ions with high accuracy and measuring the concentration of hydroxide ions at relatively low cost. An insulating substrate, at least one insulating composite layer, and a liquid storage portion capable of holding an ion-containing liquid are provided, the insulating composite layer includes a pair of electrodes and a semiconductor layer in contact with the pair of electrodes, and a layered double hydroxide layer having an OH-ion conductivity of 1×10 −5 S/cm or more is provided between the insulating composite layer and the liquid storage portion.

Claims (20)

1 . A device comprising: an insulating substrate; at least one insulating composite layer; and a liquid storage portion capable of holding an ion-containing liquid, wherein

the insulating composite layer includes a pair of electrodes and a semiconductor layer in contact with the pair of electrodes, and

a layered double hydroxide layer having an OH ion conductivity of 1×10 −5 S/cm or more is provided between the insulating composite layer and the liquid storage portion.

2 . The device according to claim 1 , wherein

the insulating composite layer further includes a third electrode, and

an insulating layer is provided between the pair of electrodes and the semiconductor layer, and the third electrode.

3 . The device according to claim 1 , wherein field-effect mobility of the semiconductor layer is 20 cm 2 /Vs or more.

4 . The device according to claim 1 , wherein the semiconductor layer contains at least one of oxygen, sulfur, nitrogen, boron, and carbon.

5 . The device of claim 4 , wherein the semiconductor layer contains at least one of indium, zinc, tin, and a Group 13 element.

6 . The device of claim 4 , wherein the semiconductor layer includes at least one of graphene, carbon nanotube, boron nitride, metal dichalcogenide, and phospholene.

7 . The device according to claim 1 , wherein

the layered double hydroxide layer contains at least one of pyreneboronic acid, 1-pyrenebutyric acid N-hydroxysuccinimide ester, and

a general formula of the layered double hydroxide layer is [M II 1-x M′ III x (OH) 2 ] x+ where M II is selected from the group consisting of Ca 2+ , Mg 2+ , Mn 2+ , Fe 2+ , Co 2+ , Ni 2+ , Cu 2+ , Zn 2+ , and 2Li + , and M′ III is selected from the group consisting of Al 3+ , Mn 3+ , Fe 3+ , Co 3+ , Cr 3+ , and Ni 3+ .

8 . The device of claim 1 , further comprising a protective layer between the layered double hydroxide layer and the semiconductor layer.

9 . The device according to claim 1 , wherein a thickness of the semiconductor layer is 0.5 μm or less.

10 . The device according to claim 1 , wherein a maximum height Sz of a surface of the semiconductor layer on the layered double hydroxide layer side is 0.05 μm or less.

11 . The device according to claim 1 , wherein an arithmetic mean height Sa of a surface of the semiconductor layer on the layered double hydroxide layer side is 0.03 μm or less.

12 . A hydroxide ion concentration measurement apparatus, comprising the device according to claim 1 .

13 . A method for measuring a concentration of hydroxide ions by using the device according to claim 1 .

14 . The method for measuring a concentration of hydroxide ions according to claim 13 , wherein the concentration of hydroxide ions in any one of river water, sea water, purified water, washing water, and industrial waste water is measured.

Assignments (2)
CHANGE OF NAME Recorded Nov 14, 2025
From: MITSUI MINING & SMELTING CO., LTD.
To: MITSUI KINZOKU COMPANY, LIMITED
Reel/Frame 073570/0734 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 16, 2025
From: TOKUCHI, SHIGEKI
To: MITSUI MINING & SMELTING CO., LTD.
Reel/Frame 069902/0639 →