MICROCHAMBER ARRAY AND METHOD FOR MANUFACTURING MICROCHAMBER ARRAY
A microchamber array includes: a first substrate; a second substrate facing the first substrate; a flow channel provided between the first substrate and the second substrate and through which a solvent containing a sample flows; a chamber body, which is provided on a surface of the first substrate and which faces the second substrate; and a plurality of storage parts provided in the chamber body. Further, the first substrate has a recess recessed from the surface of the first substrate in a thickness direction of the first substrate at a position overlapping each of the storage parts.
1 . A microchamber array comprising:
a first substrate;
a second substrate facing the first substrate;
a flow channel provided between the first substrate and the second substrate and through which a solvent containing a sample flows;
a chamber body, which is provided on a surface of the first substrate and which faces the second substrate; and
a plurality of storage parts provided in the chamber body, wherein
the first substrate has a recess recessed from the surface of the first substrate in a thickness direction of the first substrate at a position overlapping each of the storage parts.
2 . The microchamber array according to claim 1 , wherein
the chamber body includes a water-repellent resin layer and a light-shielding resin layer, and
the light-shielding resin layer and the water-repellent resin layer are stacked in order on the first substrate.
3 . A method for manufacturing a microchamber array, comprising:
forming a chamber body on a first substrate;
forming a plurality of storage parts in the chamber body; and
glass etching a bottom surface of each of the storage parts with a cleaning solution after the forming of the storage parts.
4 . A method for manufacturing a microchamber array, comprising:
forming a light-shielding resin layer on a first substrate;
forming a plurality of first openings in the light-shielding resin layer;
stacking a water-repellent resin layer on the light-shielding resin layer;
forming second openings at positions overlapping the respective first openings in the water-repellent resin layer; and
glass etching a bottom surface of each of the first openings with a cleaning solution after the forming of the first openings and the second openings.
5 . The method for manufacturing a microchamber array according to claim 3 , wherein the cleaning solution is dilute hydrofluoric acid.
6 . The method for manufacturing a microchamber array according to claim 4 , wherein the cleaning solution is dilute hydrofluoric acid.
7 . The method for manufacturing a microchamber array according to claim 3 , wherein the cleaning solution is at least one of Semico Clean 56, GC-3022 FT, PK-LCG series, SUNECON AS-3, and Semiclean series.
8 . The method for manufacturing a microchamber array according to claim 4 , wherein the cleaning solution is at least one of Semico Clean 56, GC-3022 FT, PK-LCG series, SUNECON AS-3, and Semiclean series.