CONTROL SYSTEM FOR WIRELESS POWER CHARGING AND ALIGNMENT
A system for wirelessly charging an implantable device is described. The system may include an estimation device or component that estimates a field strength at a receiving coil of the implantable device based on available electrical signals within the implantable device. The system may also include a control system for varying a strength of a charging field produced by a charger. The system may also be used to align a wireless charger with the implantable device for charging a battery of the implantable device. Methods and devices for implementing the charging system are also described.
1 . A method of aligning a charger for an implantable device, the method comprising:
outputting, at the charger, a beacon electromagnetic (“EM”) field;
receiving a present beacon EM field value and a target EM field value from the implantable device, the present beacon EM field value being based on the beacon EM field;
determining that, at a present location of the charger, the charger can produce a charging EM field capable of outputting sufficient power to charge the implantable device based on (i) a maximum electrical parameter of the charger, (ii) the present beacon EM field value, (iii) the target EM field value, and (iv) a beacon electrical parameter of the charger corresponding to the beacon EM field; and
generating a notification based on determining that the charger can produce the charging EM field.
2 . The method of claim 1 , wherein the charging EM field has a charging EM field value received by the implantable device corresponding to the target EM field value.
3 . The method of claim 1 , wherein the maximum electrical parameter of the charger is at least one of a predetermined maximum current or a predetermined maximum voltage.
4 . The method of claim 1 , further comprising, responsive to movement of the charger with respect to the implantable device, storing a plurality of present EM field values as previous field values, individual previous field values associated with individual positions of the charger with respect to the implantable device.
5 . The method of claim 4 , further comprising:
selecting one previous field value of the plurality of present EM field values after movement of the charger with respect to the implantable device has occurred for a predetermined period of time; and
using an individual position of the charger associated with the previous field value to produce the charging EM field.
6 . The method of claim 5 , wherein selecting the one previous field value of the plurality of present EM field values comprises selecting the previous field value based on the previous field value being associated with a highest EM field intensity the charger is capable of producing.
7 . The method of claim 1 , wherein the beacon EM field is produced using a beacon current through an EM field driver and a transmitting coil.
8 . The method of claim 1 , wherein the determination that the charger can produce the charging EM field comprises comparing a beacon current to a predetermined threshold maximum current.
9 . The method of claim 8 , wherein the determination that the charger can produce the charging EM field comprises determining that a first ratio of the present beacon EM field value to the target EM field value correlates with a second ratio of the beacon current to the predetermined maximum threshold current.
10 . The method of claim 1 , the present beacon EM field value includes a scalar representing a magnitude of a present EM field at an EM field receiving coil in the implantable device.
11 . A charger system, comprising:
a wireless field driver that produces an electromagnetic (“EM”) field;
a signal receiver; and
a controller in communication with a wireless charger, the controller comprising:
a processor configured to execute processor executable instructions stored in a non-transitory computer-readable medium configured to cause the processor to:
output a beacon EM field;
receive a present beacon EM field value and a target EM field value from an implantable device, the present beacon EM field value being based on the beacon EM field;
determine that, at a present location of the charger, the charger can produce a charging EM field capable of outputting sufficient power to charge the implantable device based on (i) a maximum electrical parameter of the charger, (ii) the present beacon EM field value, (iii) the target EM field value, and (iv) a beacon electrical parameter of the charger corresponding to the beacon EM field; and
generate a notification based on determining that the charger can produce the charging EM field.
12 . The system of claim 10 , wherein the charging EM field has a charging EM field value received by the implantable device corresponding to the target EM field value.
13 . The system of claim 10 , wherein the maximum electrical parameter of the charger is at least one of a predetermined maximum current or a predetermined maximum voltage.
14 . The system of claim 10 , wherein the processor is configured to execute additional processor executable instructions to cause the processor to:
responsive to movement of the charger with respect to the implantable device, store a plurality of present EM field values as previous field values, individual previous field values associated with individual positions of the charger with respect to the implantable device.
15 . The system of claim 14 , wherein the processor is configured to execute additional processor executable instructions to cause the processor to:
select one previous field value of the plurality of present EM field values after movement of the charger with respect to the implantable device has occurred for a predetermined period of time; and
use an individual position of the charger associated with the previous field value to produce the charging EM field.
16 . The system of claim 15 , wherein selecting the one previous field value of the plurality of present EM field values comprises selecting the previous field value based on the previous field value being associated with a highest EM field intensity the charger is capable of producing.
17 . The system of claim 10 , wherein the beacon EM field is produced using a beacon current through an EM field driver and a transmitting coil.
18 . The system of claim 10 , wherein the determination that the charger can produce the charging EM field comprises comparing a beacon current to a predetermined threshold maximum current.
19 . The system of claim 18 , wherein the determination that the charger can produce the charging EM field comprises determining that a first ratio of the present beacon EM field value to the target EM field value correlates with a second ratio of the beacon current to the predetermined maximum threshold current.
20 . The system of claim 10 , the present beacon EM field value includes a scalar representing a magnitude of a present EM field at an EM field receiving coil in the implantable device.