IP Library › Granted Patent US 529,057
Granted Patent S1
US 529,057 · App. 29/211,416 · Granted Sep 26, 2006

Sputtering target

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Quick Facts
Patent No.
US 529,057
App. No.
29/211,416
Granted
Sep 26, 2006
Kind
S1
Claims (1)

The ornamental design for a sputtering target, as shown and described.

Assignments (4)
SECURITY INTEREST Recorded Sep 25, 2019
From: MATERION ADVANCED MATERIALS TECHNOLOGIES AND SERVICES INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 050491/0066 →
SECURITY AGREEMENT Recorded Jun 21, 2013
From: MATERION ADVANCED MATERIALS TECHNOLOGIES AND SERVICES INC.
To: JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT
Reel/Frame 030667/0402 →
CHANGE OF NAME Recorded Mar 23, 2011
From: WILLAMS ADVANCED MATERIALS INC.
To: MATERION ADVANCED MATERIALS TECHNOLOGIES AND SERVICES INC.
Reel/Frame 026008/0584 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 13, 2004
From: WILSON, MATTHEW T.; GROHMAN, HENRY L.
To: WILLIAMS ADVANCED MATERIALS, INC.
Reel/Frame 015244/0532 →