IP Library › Granted Patent US 940,765
Granted Patent S1
US 940,765 · App. 29/760,578 · Granted Jan 11, 2022

Target profile for a physical vapor deposition chamber target

Inventors: David Gunther (Santa Clara, CA); Jiao Song (Singapore, SG); Kirankumar Neelasandra Savandaiah (Bangalore, IN); Madan Kumar Shimoga Mylarappa (Bengaluru, IN)
Assignee: APPLIED MATERIALS, INC.
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Quick Facts
Patent No.
US 940,765
App. No.
29/760,578
Granted
Jan 11, 2022
Kind
S1
Claims (1)

We claim the ornamental design for a target profile for a physical vapor deposition chamber target, as shown and described.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 4, 2021
From: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
To: APPLIED MATERIALS, INC.
Reel/Frame 055145/0094 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 8, 2020
From: GUNTHER, DAVID; SAVANDAIAH, KIRANKUMAR NEELASANDRA; SHIMOGA MYLARAPPA, MADAN KUMAR
To: APPLIED MATERIALS, INC.
Reel/Frame 054577/0589 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 8, 2020
From: SONG, JIAO
To: APPLIED MATERIALS SINGAPORE TECHNOLOGY PTE. LTD.
Reel/Frame 054577/0831 →