IP Library › Granted Patent US 1,049,067
Granted Patent S1
US 1,049,067 · App. 29/833,393 · Granted Oct 29, 2024

Ring for an anti-rotation process kit for a substrate processing chamber

Inventors: Rohan Vijay Rane (Santa Clara, CA); Xue Yang Chang (San Jose, CA); Timothy Joseph Franklin (Campbell, CA); Daniel Sang Byun (Campbell, CA)
Assignee: APPLIED MATERIALS, INC.
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Quick Facts
Patent No.
US 1,049,067
App. No.
29/833,393
Granted
Oct 29, 2024
Kind
S1
Claims (1)

The ornamental design for a ring for an anti-rotation process kit for a substrate processing chamber, as shown and described.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 19, 2022
From: RANE, ROHAN VIJAY; CHANG, XUE YANG; FRANKLIN, TIMOTHY JOSEPH; BYUN, DANIEL SANG
To: APPLIED MATERIALS, INC.
Reel/Frame 059630/0776 →