IP Library › Patent Application 60371324
Patent Application Provisional
App. No. 60/371,324 · Confirmation No. 9194

Process for controlling denuded zone depth in an ideal oxygen precipitating silicon wafer

Provisional Application Expired
⬇ PDF
 Code Description Pages PDF
2002-04-10 TRNA Transmittal of New Application 2 View
2002-04-10 ADS Application Data Sheet 2 View
2002-04-10 SPEC Specification 31 View
2002-04-10 CLM Claims 5 View
2002-04-10 ABST Abstract 1 View
2002-04-10 DRW Drawings-only black and white line drawings 2 View
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Quick Facts
App. No.
60/371,324
Filed
2002-04-10