Patent Application
Provisional
App. No. 60/699,179
· Confirmation No. 4399
Method for forming dual fully silicided gates and devices obtained thereof
Provisional Application Expired
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⬇ PDF
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2005-07-14 | TRNA |
Transmittal of New Application | 1 | View | |
| 2005-07-14 | SPEC |
Specification | 23 | View | |
| 2005-07-14 | CLM |
Claims | 4 | View | |
| 2005-07-14 | ABST |
Abstract | 1 | View | |
| 2005-07-14 | DRW |
Drawings-only black and white line drawings | 14 | View | |
| 2005-07-14 | WFEE |
Fee Worksheet (SB06) | 1 | View | |
| 2005-07-14 | ADS |
Application Data Sheet | 4 | View |
Inventors
Jorge Adrian Kittl
Waterloo, BELGIUM
Anne Lauwers
Aartselaar, BELGIUM
Anabela Veloso
Leuven, BELGIUM
Anil Kottantharyil
Leuven, BELGIUM
Marcus Johannes Van Dal
Leuven, BELGIUM
Attorneys & Agents of Record
Prosecution
- Customer No.
- 20306
- Docket No.
- 05-591
- Confirmation No.
- 4399
No recorded assignments were found for this patent.
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Quick Facts
- App. No.
- 60/699,179
- Filed
- 2005-07-14
External Links