IP Library › Patent Application 60754072
Patent Application Provisional
App. No. 60/754,072 · Confirmation No. 5620

Method for forming silicon-germanium layers at low temperatures, layers formed therewith and structures comprising such layers

Provisional Application Expired
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 Code Description Pages PDF
2005-12-21 TRNA Transmittal of New Application 1 View
2005-12-21 SPEC Specification 10 View
2005-12-21 DRW Drawings-only black and white line drawings 6 View
2005-12-21 WFEE Fee Worksheet (SB06) 1 View
2005-12-21 ADS Application Data Sheet 3 View
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Quick Facts
App. No.
60/754,072
Filed
2005-12-21