IP Library › Patent Application 62280886
Patent Application Provisional
App. No. 62/280,886 · Confirmation No. 5587

HIGH TEMPERATURE ATOMIC LAYER DEPOSITION OF SILICON-CONTAINING FILMS

Provisional Application Expired
⬇ PDF
 Code Description Pages PDF
2016-02-26 APP.FILE.REC Filing Receipt 3 View
2016-01-20 PD.TO.AUTH Authorization or Rescission of Authorization to Access Application by Digital Access Service /Priority Document Exchange Office 2 View
2016-01-20 WFEE Fee Worksheet (SB06) 2 View
2016-01-20 N417 Electronic Filing System Acknowledgment Receipt 2 View
2016-01-20 TR.PROV Provisional Cover Sheet (SB16) 4 View
2016-01-20 SPEC Specification 18 View
2016-01-20 CLM Claims 4 View
2016-01-20 ABST Abstract 1 View
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Quick Facts
App. No.
62/280,886
Filed
2016-01-20