IP Library › Patent Application 63131899
Patent Application Provisional
App. No. 63/131,899 · Confirmation No. 2325

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

Provisional Application Expired
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 Code Description Pages PDF
2021-01-05 APP.FILE.REC Filing Receipt 3 View
2020-12-30 SPEC Specification 35 View
2020-12-30 CLM Claims 5 View
2020-12-30 ABST Abstract 1 View
2020-12-30 ADS Application Data Sheet 9 View
2020-12-30 WFEE Fee Worksheet (SB06) 2 View
2020-12-30 N417 Electronic Filing System Acknowledgment Receipt 3 View
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Quick Facts
App. No.
63/131,899
Filed
2020-12-30