Patent Application
Provisional
App. No. 63/738,954
· Confirmation No. 1761
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
Provisional Application Expired
|
⬇ PDF
|
Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2025-01-15 | APP.FILE.REC |
Filing Receipt | 3 | View | |
| 2025-01-15 | WELCOME.LET |
Welcome Letter from USPTO Director and Deputy Director | 1 | View | |
| 2024-12-26 | SPEC |
Specification | — | View | |
| 2024-12-26 | N417.PYMT |
Electronic Fee Payment | 2 | View | |
| 2024-12-26 | ADS |
Application Data Sheet | 9 | View | |
| 2024-12-26 | N417 |
Electronic Filing System Acknowledgment Receipt | 2 | View | |
| 2024-12-26 | SPEC |
Specification | 62 | View | |
| 2024-12-26 | CLM |
Claims | 4 | View | |
| 2024-12-26 | ABST |
Abstract | 1 | View |
Inventors
Li Cui
Westborough, MA
Vageesha Warnajith Liyana Gunawardana
Marlborough, MA
Emad Aqad
Northborough, MA
Jong Keun Park
Shrewsbury, MA
Attorneys & Agents of Record
Prosecution
- Customer No.
- 158376
- Docket No.
- DI83934-US-PSP/QDP11138US
- Confirmation No.
- 1761
No recorded assignments were found for this patent.
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
- App. No.
- 63/738,954
- Filed
- 2024-12-26
External Links