Phosphor and phosphor film for electron beam excitation and color display apparatus using the same
View Patent ↗To provide a phosphor for an electron beam excitation with a small deterioration in an emission efficiency and capable of maintaining a high luminance, even when an excitation density of an electron beam for a phosphor excitation is increased. As raw materials, Ca 3 N 2 (2N), AlN(3N), Si 3 N 4 (3N), and Eu 2 O 3 (3N) are prepared, and the raw materials thus prepared are measured and mixed, so that a molar ratio of each element becomes (Ca+Eu):Al:Si=1:1:1. Then, the mixture thus obtained is maintained and fired for at 1500° C. for 3 hours, and thereafter crushed, to manufacture the phosphor having a composition formula Ca 0.985 SiAlN 3 :Eu 0.015 .
1. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less.
2. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less.
3. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a general formula CaAlSiN 3 :Eu, wherein a film thickness is 65 μm or less.
4. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm 2 or less per unit area.
5. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o≧0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm 2 or less per unit area.
6. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a general formula CaAlSiN 3 :Eu, wherein a phosphor coating amount is 7.0 mg/cm 2 or less per unit area.
7. A color display apparatus, using the phosphor film according to claim 1 .
8. A color display apparatus, using the phosphor film according to claim 4 .
9. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less.
10. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a film thickness is 65 μm or less.
11. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein element M is at least one or more kind of element having bivalent valency, element A is at least one or more kind of element having tervalent valency, element B is at least one or more kind of element having tetravalent valency, O is oxygen, N is nitrogen, element Z is the element acting as an activator in the phosphor, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm 2 or less per unit area.
12. A phosphor film for an electron beam excitation, manufactured by using the phosphor for an electron beam excitation, expressed by a composition formula MmAaBbOoNn:Z (wherein the element M is at least one or more kind of element selected from the group consisting of Mg, Ca, Sr, Ba, and Zn, the element A is at least one or more kind of element selected from the group consisting of B (boron), Al and Ga, the element B is Si and/or Ge, and the element Z is at least one or more kind of element selected from rare earth elements or transitional metal elements, satisfying o>0, n=2/3m+a+4/3b−2/3o, m=a=b=1), wherein a phosphor coating amount is 7.0 mg/cm 2 or less per unit area.
13. A color display apparatus, using the phosphor film according to claim 9.
14. A color display apparatus, using the phosphor film according to claim 11.