Manufacturing method for a liquid crystal display
View Patent ↗There is provided a liquid crystal display device in which the wiring resistivity of signal lines is reduced. The liquid crystal display device includes substrates disposed in opposition to each other with a liquid crystal interposed therebetween, a thin film transistor to be driven by a scanning signal supplied from a gate signal line, and a pixel electrode to be supplied with a video signal from a drain signal line via the thin film transistor, the thin film transistor and the pixel being provided in each pixel area on a liquid-crystal-side surface of one of the substrates. The gate signal line is made of a multi-layered structure including at least an ITO film formed on the liquid-crystal-side surface and a Mo layer formed to overlie the ITO film.
1. A manufacturing method for a liquid crystal display device which includes pixel areas provided on a liquid-crystal-side surface of either one of substrates disposed in opposition to each other with a liquid crystal interposed there between, each of the pixel areas being surrounded by gate signal lines disposed to be extended in the x direction and to be juxtaposed in the y direction and drain signal lines disposed to be extended in the y direction and to be juxtaposed in the x direction;
each of the pixel areas including:
a switching element to be driven by a gate signal from either one of the gate signal lines;
a pixel electrode to be supplied with a video signal from the drain signal line via the switching element; and
a counter electrode for causing an electric field to be generated between the counter electrode and the pixel electrode, the counter electrode being formed between the substrate and the pixel electrode,
the manufacturing method comprising the steps of:
forming, on either one of the substrates, a stacked structure in which a first material layer and a second material layer are stacked in that order, the first material layer for forming the gate signal line and the counter electrode, and the second material layer for forming the gate signal line;
forming a photoresist film on the upper surface of the stacked structure, the thickness of the photoresist film on the counter electrode is thinner than the thickness of the photoresist film on the gate signal line;
etching the second material layer by using the photoresist film as a mask and vanishing the photoresist film of thinner film thickness on the counter electrode; and
etching the first material layer by using the second material layer as a mask.
2. A manufacturing method for a liquid crystal display device according to claim 1 , wherein the first material layer is made of an ITO (Indium-Tin-Oxide) film, and the second material layer is made of a Mo (Molybdenum) layer.