Photovoltaic device and method for making
View Patent ↗One aspect of the present invention provides a device that includes a substrate; a first semiconducting layer; a transparent conductive layer; a transparent window layer. The transparent window layer includes cadmium sulfide and oxygen. The device has a fill factor of greater than about 0.65. Another aspect of the present invention provides a method of making the device.
1. A device comprising:
a substrate;
a first semiconducting layer;
a transparent conductive layer; and
a transparent window layer comprising cadmium sulfide and oxygen,
wherein the device has a fill factor of greater than about 0.65.
2. The device as defined in claim 1 , wherein the substrate comprises a glass or a polymer.
3. The device as defined in claim 1 , wherein the first semiconducting layer comprises a telluride, a selenide, a sulfide or combinations thereof.
4. The device as defined in claim 1 , wherein the first semiconducting layer comprises cadmium telluride, cadmium zinc-telluride, tellurium-rich cadmium telluride, cadmium sulfur telluride, cadmium manganese telluride, cadmium magnesium telluride, mercury cadmium telluride (HgCdTe), or other CdTe-based systems; copper indium disulfide (CIS), copper indium diselenide (CIS), copper indium gallium diselenide (CIGS), copper indium gallium sulfur selenium (CIGSS), copper indium gallium aluminum sulfur selenium (Cu(In,Ga,Al)(S,Se)2), copper zinc tin sulfide (CZTS) or combinations thereof.
5. The device as defined in claim 1 , wherein the transparent window layer further comprises, zinc telluride, zinc selenide, cadmium selenide, cadmium sulfur oxide, and or copper oxide.
6. The device as defined in claim 1 , wherein the transparent window layer comprises CdS1-yOy where y varies from 0.01 to 0.5.
7. The device as defined in claim 1 , wherein the transparent window layer comprises a gradient of oxygen concentration within the transparent window layer.
8. The device as defined in claim 1 , wherein the transparent window layer has a band gap in a range from about 2.3 electron Volts to about 3.1 electron Volts.
9. The device as defined in claim 1 , wherein the transparent window layer comprises oxygen in a range from about 0.1 atomic percent to about 50 atomic percent.
10. The device as defined in claim 1 , wherein the transparent window layer has a thickness in a range from about 5 nanometers to about 250 nanometers.
11. The device as defined in claim 1 , wherein the transparent window layer is thermally stable at a temperature in a range from about 500 degrees Celsius to about 700 degrees Celsius.
12. The device as defined in claim 1 , further comprising a high resistance transparent layer is disposed above the transparent conductive layer.
13. The device as defined in claim 1 , further comprising a second semiconducting layer comprising a n-type semiconductor disposed on the first semiconducting layer.
14. The device as defined in claim 1 , wherein the transparent conductive layer comprises a transparent conductive oxide selected from the group consisting of cadmium tin oxide, zinc tin oxide, indium tin oxide, aluminum-doped zinc oxide, zinc oxide, and/or fluorine-doped tin oxide, and combinations of these.
15. The device of claim 1 , further comprising a back contact layer comprising mercury telluride, zinc telluride, cadmium mercury telluride, arsenic telluride, antimony telluride, and copper telluride disposed on the first semiconducting layer.
16. The device as defined in claim 1 , wherein the device is a photovoltaic device.
17. A device comprising:
a superstrate;
a transparent conductive layer;
a transparent window layer comprising cadmium sulfide and oxygen;
a first semiconducting layer comprising a telluride; and
wherein the device has a fill factor of greater than about 0.65.
18. A device comprising:
a substrate;
a first semiconducting layer comprising a selenide;
a transparent window layer comprising cadmium sulfide and oxygen;
a transparent conductive layer; and
wherein the device has a fill factor of greater than about 0.65.
19. The device as defined in claim 7 , wherein the gradient of oxygen concentration has a first oxygen concentration is in a range from about 0 atomic percent to about 10 atomic percent at an interface with the first semiconducting layer.
20. The device as defined in claim 7 , wherein the gradient of oxygen concentration has a second oxygen concentration is in a range from about 20 atomic percent to about 50 atomic percent at an interface with the transparent conductive layer.