Method of manufacturing plasma display panel
View Patent ↗Evaporation chamber for depositing a protective film on a surface, where a dielectric layer is formed, of front substrate, front substrate is formed a display electrode and the dielectric layer thereon; transporting unit for transporting front substrate into evaporation chamber; gas introducing units for introducing gas containing H 2 O into evaporation chamber; and partial pressure detecting unit for measuring a certain partial pressure of gas within evaporation chamber, extending from the center of deposition space of evaporation chamber to the downstream of transport direction of front substrate are provided. Gas containing H 2 O is introduced from gas introducing units such that the partial pressure of gas is controlled in the partial pressure detecting unit.
1. A method of manufacturing a plasma display panel comprising:
introducing a substrate, on which a display electrode and a dielectric layer are formed, into a film forming chamber;
depositing metal oxide successively on a surface of the substrate while the substrate is transported;
measuring, with a partial pressure detecting unit that is disposed adjacent to an exit of the film forming chamber downstream of a center of a deposition space, a partial pressure of at least one gas of H 2 O and OH in the film forming chamber adjacent to the exit of the film forming chamber downstream of the center of the deposition space of the film forming chamber in a transport direction of the substrate while the metal oxide is deposited; and
controlling an amount of gas containing H 2 O that is introduced into the film forming chamber based on the partial pressure to make the partial pressure of OH to be not less than 2.0×10 −4 Pa nor more than 1.6×10 −3 Pa, roughly at the time of completing said depositing.
2. The method of manufacturing a plasma display panel of claim 1 ,
wherein the metal oxide is magnesium oxide.