Methods for removing a stabilizer from a metal nanoparticle using a destabilizer
View Patent ↗A method of forming conductive features on a substrate, the method comprising: providing two or more solutions, wherein a metal nanoparticle solution contains metal nanoparticles with a stabilizer and a destabilizer solution contains a destabilizer that destabilizes the stabilizer, liquid depositing the metal nanoparticle solution and the destabilizer solution onto the substrate, wherein during deposition or following the deposition of the metal nanoparticle solution onto the substrate, the metal nanoparticle and the destabilizer are combined with each other, destabilizing the stabilizer from the surface of the metal nanoparticles with the destabilizer and removing the stabilizer and destabilizer from the substrate by heating the substrate to a temperature below about 180° C. or by washing with the solvent.
1. A method of forming conductive features on a substrate, the method comprising:
providing two or more solutions, wherein a metal nanoparticle solution contains metal nanoparticles with a stabilizer and a destabilizer solution contains a destabilizer that destabilizes the stabilizer,
liquid depositing the metal nanoparticle solution onto the substrate, wherein during the deposition or following the deposition of the metal nanoparticle solution onto the substrate, the metal nanoparticles with a stabilizer and the destabilizer are combined with each other,
destabilizing the stabilizer from the surface of the metal nanoparticles with the destabilizer, and
removing the stabilizer and destabilizer from the substrate by heating the substrate to a temperature below about 180° C. or by washing with a solvent,
wherein the destabilizing the stabilizer with the destabilizer decomposes the stabilizer into smaller size stabilizer derivatives.
2. The method according to claim 1 , wherein the metal nanoparticles are selected from the group consisting of silver, gold, platinum, palladium, copper, cobalt, chromium, nickel, silver-copper composite, silver-gold composite, silver-gold-palladium composite and combinations thereof.
3. The method according to claim 1 , wherein the metal nanoparticles are selected from a group consisting of silver, silver-copper composite, silver-gold composite, silver-gold-palladium composite and combinations thereof.
4. The method according to claim 1 , wherein the concentration of metal nanoparticles in the metal nanoparticle solution is from about 5 weight percent to about 80 weight percent.
5. The method according to claim 1 , wherein the stabilizer is a compound comprising a moiety selected from the group consisting of —NH 2 , —NH—, —SH, —SO 2 M , wherein M is NH 4 + , Li + , Na + , K + , or Cs + , —OH, —C 5 H 4 N, —C(═O)OH, —OC(═S)SH (xanthic acid), R′R″P—, R′R″P(═O)—, wherein R′ and R″ are each individually a hydrocarbon group, and combinations thereof.
6. The method according to claim 1 , wherein the stabilizer in the metal nanoparticle solution includes an ether.
7. The method according to claim 1 , wherein the stabilizer in the metal nanoparticle solution includes an ester.
8. The method according to claim 1 , wherein the destabilizer in the destabilizer solution comprises a saturated aliphatic acid, unsaturated aliphatic acid, saturated aliphatic dicarboxylic acid, unsaturated aliphatic dicarboxylic acid, aromatic carboxylic acid, hydroxy carboxylic acid, methoxy carboxylic acid, carboxylic acid with a hydrocarbon group, inorganic acid, or combinations thereof.
9. The method according to claim 1 , wherein the destabilizer in the destabilizer solution comprises an organothiol.
10. The method according to claim 1 , wherein the concentration of the destabilizer in the destabilizer solution is from about one weight percent to about one hundred weight percent.
11. The method according to claim 1 , wherein the solvent for removing the destabilizer is selected from the group consisting of water, pentane, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, toluene, xylene, mesitylene, methanol, ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, tetrahydrofuran, chlorobenzene, dichlorobenzene, trichlorobenzene, nitrobenzene, cyanobenzene, acetonitrile, dichloromethane, N,N-dimethylformamide (DMF), and combinations thereof.
12. The method according to claim 1 , wherein the metal nanoparticle solution and the destabilizer solution are combined during the deposition of the metal nanoparticle solution onto the substrate by simultaneously depositing both the metal nanoparticle solution and the destabilizer solution onto the substrate.
13. The method according to claim 1 , wherein the metal nanoparticle and the destabilizer are combined following the deposition of the metal nanoparticle solution onto the substrate by first depositing one of the metal nanoparticle solution and the destabilizer solution onto the substrate and thereafter subsequently printing the other of the metal nanoparticle solution and the destabilizer solution onto a first deposited solution.
14. The method according to claim 1 , wherein the liquid depositing is selected from the group consisting of spin coating, blade coating, rod coating, dip coating, lithography or offset printing, gravure, flexography, screen printing, stencil printing, inkjet printing, and stamping.
15. The method according to claim 1 , wherein the liquid depositing is conducted with an inkjet printer, which has two or more reservoirs, including a first reservoir containing a metal nanoparticle solution, and a second reservoir containing a destabilizer solution, and the solutions are printed from the reservoirs simultaneously or consecutively through one or more print heads onto a substrate.
16. A method of manufacturing a thin-film transistor, which comprises a substrate, a gate electrode, a gate dielectric layer, a source electrode and a drain electrode and a semiconductor layer in contact with the source/drain electrodes and the gate dielectric layer, the method comprising:
providing a substrate with or without a gate electrode and a gate dielectric layer,
providing two or more solutions, wherein a metal nanoparticle solution contains metal nanoparticles with a stabilizer and a destabilizer solution contains a destabilizer destabilizes the stabilizer,
liquid depositing the metal nanoparticle solution onto the substrate or gate dielectric layer to form a gate electrode, source electrode and/or drain electrode, wherein during the deposition or following the deposition of the metal nanoparticle solution onto the substrate or gate dielectric layer, the metal nanoparticle and the destabilizer are combined with each other,
destabilizing the stabilizer from the surface of the metal nanoparticles with the destabilizer,
removing the stabilizer, destabilizer, and reaction by-products from the substrate by heating the substrate to a temperature below about 180° C. or washing with a solvent, and
forming conductive features on the substrate as the gate, source, and/or drain electrodes
wherein destabilizing the stabilizer with the destabilizer decomposes the stabilizer into smaller size stabilizer derivatives.
17. The method according to claim 16 , wherein the stabilizer is a compound comprising a moiety selected from the group consisting of —NH 2 , —NH—, —SH, —SO 2 M , wherein M is NH 4 + , Li + , Na + , K + , or Cs + , —OH, —C 5 H 4 N, —C(═O)OH, —OC(═S)SH (xanthic acid), R′R″P—, R′R″P(═O)—, wherein R′ and R″ are each individually a hydrocarbon group, and combinations thereof.
18. The method according to claim 16 , wherein the destabilizer in the destabilizer solution comprises a saturated aliphatic acid, unsaturated aliphatic acid, saturated aliphatic dicarboxylic acid, unsaturated aliphatic dicarboxylic acid, aromatic carboxylic acid, hydroxy carboxylic acid, methoxy carboxylic acid, carboxylic acid with a hydrocarbon group, inorganic acid, or combinations thereof.
19. The method according to claim 16 , wherein the destabilizer in the destabilizer solution comprises an organothiol.
20. The method according to claim 16 , wherein the solvent for removing the destabilizer is selected from the group consisting of water, pentane, hexane, cyclohexane, heptane, octane, nonane, decane, undecane, dodecane, tridecane, tetradecane, toluene, xylene, mesitylene, methanol, ethanol, propanol, butanol, pentanol, hexanol, heptanol, octanol, tetrahydrofuran, chlorobenzene, dichlorobenzene, trichlorobenzene, nitrobenzene, cyanobenzene, acetonitrile, dichloromethane, N,N-dimethylformamide (DMF), and combinations thereof.
21. The method according to claim 16 , wherein the liquid depositing is selected from the group consisting of spin coating, blade coating, rod coating, dip coating, lithography or offset printing, gravure, flexography, screen printing, stencil printing, inkjet printing, and stamping.