Method and system for providing a perpendicular magnetic recording pole with a multi-layer side gap
A method for fabricating a magnetic transducer having a nonmagnetic intermediate layer is described. A trench is provided in the intermediate layer. The trench has a profile and location corresponding to a pole. A first nonmagnetic gap layer is provided. At least part of the first nonmagnetic gap layer resides in the trench. A pole including magnetic material(s) is provided. At least part of the pole resides in the trench and on the part of the nonmagnetic layer in the trench. At least part of the intermediate layer adjacent to the pole is removed and a second nonmagnetic gap layer provided. The second nonmagnetic gap layer is thicker than the first nonmagnetic gap layer. Part of the second nonmagnetic layer and part of the first nonmagnetic layer adjacent to the pole form a side gap. A side shield, a gap, and a top shield are also provided.
1. A method for fabricating a magnetic transducer having an intermediate layer, the method comprising:
providing a trench in the intermediate layer, the trench having a profile and a location corresponding to a pole of the magnetic transducer, the intermediate layer being nonmagnetic;
providing a first nonmagnetic gap layer, at least a portion of the first nonmagnetic gap layer residing in the trench;
providing the pole including at least one magnetic material, at least a portion of the pole residing in the trench and on the portion of the first nonmagnetic layer;
removing at least a portion of the intermediate layer adjacent to the pole;
providing a second nonmagnetic gap layer after the portion of the intermediate layer is removed, the second nonmagnetic gap layer being thicker than the first nonmagnetic gap layer, a portion of the second nonmagnetic layer and a portion of the first nonmagnetic layer adjacent to the pole forming a side gap;
providing a side shield;
providing a gap on the pole, the side gap, and a portion of the side shield; and
providing a top shield,
wherein the step of providing the second nonmagnetic gap layer further includes;
atomic layer depositing an insulating layer; and
chemical vapor depositing an additional layer of Ru.
2. The method of claim 1 wherein the step of providing the first nonmagnetic gap layer further includes:
chemical vapor depositing a layer of Ru.
3. The method of claim 2 wherein the layer of Ru is at least five and not more than thirty-five nanometers thick.
4. The method of claim 3 wherein the layer of Ru is at least fifteen and not more than twenty-five nanometers thick.
5. The method of claim 1 wherein the step of providing the second nonmagnetic gap layer further includes:
chemical vapor depositing an additional layer of Ru.
6. The method of claim 5 wherein the additional layer of Ru is at least twenty and not more than one hundred nanometers thick.
7. The method of claim 6 wherein the layer of Ru is at least twenty-five and not more than thirty-five nanometers thick.
8. The method of claim 1 wherein the insulating layer is at least fifteen and not more than sixty nanometers thick and wherein the additional layer of Ru is at least five and not more than thirty five nanometers thick.
9. The method of claim 8 wherein the additional layer of Ru is at least fifteen and not more than twenty-five nanometers thick.
10. The method of claim 1 wherein the first nonmagnetic gap layer and the second nonmagnetic gap layer together have a total thickness of at least thirty nanometers and not more than one hundred nanometers.
11. The method of claim 10 wherein the total thickness is at least thirty and not more than ninety nanometers.
12. The method of claim 1 wherein the step of providing the pole further includes:
depositing at least one magnetic layer on the first nonmagnetic gap layer; and
planarizing the magnetic transducer, thereby removing an exposed portion of the first nonmagnetic gap layer external to the trench and an exposed portion of the at least one magnetic layer external to the trench.
13. The method of claim 12 wherein the step of depositing the at least one magnetic layer further includes:
plating a high moment layer.
14. The method of claim 1 wherein the step of providing the side shield further includes:
depositing at least one magnetic shield layer on the second nonmagnetic gap layer;
planarizing the magnetic recording transducer to remove a portion of the at least one magnetic shield layer; and
ion beam etching the magnetic recording transducer, thereby exposing the pole.
15. The method of claim 14 wherein the step of depositing the at least one magnetic shield layer further includes:
plating the at least one magnetic shield layer.
16. The method of claim 1 wherein the step of providing the gap further includes:
blanket depositing a gap layer; and
removing a portion of the gap layer distal from the pole.
17. The method of claim 1 further comprising:
providing a leading edge shield.
18. The method of claim 17 wherein the trench is provided using a removal process for the intermediate layer and wherein the method further includes:
depositing a stop layer on the leading edge shield, the stop layer residing between the leading edge shield and the pole, the stop layer being a stop layer for the removal process.
19. A method for fabricating a magnetic transducer having an intermediate layer, the method comprising:
providing a trench in the intermediate layer, the trench having a profile and a location corresponding to a pole of the magnetic transducer, the intermediate layer being nonmagnetic;
chemical vapor depositing (CVDing) a first Ru layer, at least a portion of the first Ru layer residing in the trench;
depositing at least one magnetic layer on the first Ru layer;
planarizing the magnetic transducer to remove a first portion of the first Ru layer external the trench, to remove a first portion of the at least one magnetic layer external to the trench, thereby leaving the pole and a second portion of the first Ru layer in the trench;
removing a portion of the intermediate layer adjacent to the pole;
atomic layer depositing a layer of alumina after the portion of the intermediate layer is removed;
CVDing a second Ru layer after the layer of alumina is deposited, a total thickness of the second Ru layer plus the layer of alumina being thicker than the first Ru layer;
depositing a magnetic shield layer on the second Ru layer;
planarizing the magnetic recording transducer to remove a portion of the magnetic shield layer;
ion beam etching the magnetic recording transducer, thereby exposing the pole, a remaining portion of the high permeability layer forming a side shield;
providing a gap on the pole, a portion of the side gap, and a portion of the side shield; and
providing a top shield.
20. The method of claim 19 further comprising:
providing a leading edge shield.
21. The method of claim 20 wherein the trench is provided using a removal process for the intermediate layer and wherein the method further includes:
depositing a stop layer on the leading edge shield, the stop layer residing between the leading edge shield and the pole, the stop layer being a stop layer for the removal process.