Semiconductor device comprising capacitor and method of fabricating the same
View Patent ↗A semiconductor device, having a memory cell region and a peripheral circuit region, includes an insulating film, having an upper surface, formed on a major surface of a semiconductor substrate to extend from the memory cell region to the peripheral circuit region. A capacitor lower electrode assembly is formed in the memory cell region to upwardly extend to substantially the same height as the upper surface of the insulating film on the major surface of the semiconductor substrate. Additionally, the lower electrode assembly includes first and second lower electrodes that are adjacent through the insulating film. A capacitor upper electrode is formed on the capacitor lower electrode through a dielectric film, to extend onto the upper surface of the insulating film. The capacitor lower electrode includes a capacitor lower electrode part having a top surface and a bottom surface. A semiconductor device organized as just described, permits implementation having a high density of integration while ensuring the capacitor exhibits high reliability and a constant capacitance.
1. A semiconductor memory device having a capacitor comprising:
a semiconductor substrate having a major surface;
a field effect transistor formed on the major surface of said semiconductor substrate, said field effect transistor having a gate electrode, a source region and a drain region;
a conductor plug electrically connected to said source region or said drain region of said field effect transistor,
a cylindrical first electrode having an upper part and a lower part electrically connected to said conductor plug, and
a second electrode provided along an inner wall surface of said cylindrical first electrode with a dielectric film there between,
wherein an outer wall surface of said cylindrical first electrode has a step at a boundary between said upper part and said lower part wider than said upper part in a cross-sectional view perpendicular to said major surface of said semiconductor substrate.
2. The semiconductor memory device according to claim 1 , further comprising:
an interlayer insulating film adjacent to said cylindrical first electrode;
wherein said interlayer insulating film includes a first insulating film above said step and a second insulating film under said step, and
said first insulating film has an etching rate larger than the etching rate of said second insulating film.
3. The semiconductor memory device according to claim 2 ,
wherein said first insulating film and said second insulating film include an impurity, and
an impurity concentration included in said first insulating film is higher than the impurity concentration included in said second insulating film.
4. The semiconductor memory device according to claim 2 ,
wherein said first insulating film and said second insulating film mainly include silicon and oxygen, and
said impurity includes boron.
5. The semiconductor memory device according to claim 3 ,
wherein said first insulating film and said second insulating film mainly include silicon and oxygen, and
said impurity includes phosphorus.
6. The semiconductor memory device according to claim 2 ,
wherein said etching rate is determined by using a hydrofluoric acid as an etchant.
7. The semiconductor memory device according to claim 1 ,
wherein said first cylindrical electrode includes granular crystals on an inner surface thereof.