Method of marking or inscribing a workpiece
View Patent ↗The present invention provides a method of marking or inscribing a workpiece ( 3 ) with high-energy radiation, more particularly with a laser beam ( 1 ), the workpiece ( 3 ) being transparent for the radiation wavelength, and a polymer matrix ( 7 ) being disposed in the vicinity of the workpiece ( 3 ) in such a way that the radiation passes through the workpiece ( 3 ) before it impinges on the polymer matrix ( 7 ), characterized in that disposed between the polymer matrix ( 7 ) and the workpiece ( 3 ) is a film ( 15 ) of liquid which is in contact with the polymer matrix ( 7 ) and with the workpiece ( 3 ).
1. A method of permanently applying a mark on a workpiece by marking or inscribing the workpiece comprising the steps of:
providing high-energy radiation with a laser beam having a radiation wavelength,
providing the workpiece which is transparent for the radiation wavelength,
disposing a polymer matrix in the vicinity of the workpiece, the polymer matrix being separated from the workpiece by a gap in such a way that the radiation passes through the workpiece without absorbing any radiation before impinging on the polymer matrix, causing pulverization of the polymer matrix and forming reactants, the reactants being deposited in the form of markings on the surface of the workpiece, wherein, the gap is filled with a film of liquid which is in contact with the polymer matrix and with the workpiece, and
wherein the film of liquid and the workpiece have refractive indices which differ by less than 0.5.
2. The method according to claim 1 , wherein the radiation induces removal of material from the polymer matrix, and the film of liquid takes up removed constituents of the polymer matrix and/or products formed therefrom.
3. The method according to claim 1 , further comprising the step of selecting for the film of liquid, a liquid, which in the wavelength range of 600-1500 nm exhibits no absorption or has a degree of absorption of less than 10%, and radiation in the wavelength range of 600-1500 nm is used.
4. The method according to claim 1 , wherein for the film of liquid a sol, a gel or a viscoelastic substance is selected.
5. The method according to claim 1 , wherein the film of liquid has a thickness of 250 nm-10 mm.
6. The method according to claim 1 , wherein ions dissolve in the film of liquid that are ready as reactants for a desired reaction to form a product, the product depositing on the workpiece from exposure to high-energy radiation.
7. The method according to claim 1 , wherein, on exposure to the radiation, the film of liquid locally changes its aggregate state and becomes gaseous.