Block copolymer and method of forming patterns by using the same
View Patent ↗A method of forming patterns includes forming a layer composed of a ketene based random copolymer on a substrate, forming a block copolymer on the ketene based random copolymer layer and patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.
1. A method of forming patterns, comprising:
forming a layer composed of a ketene based random copolymer on a substrate;
forming a block copolymer on the ketene based random copolymer layer; and
patterning the ketene based random copolymer layer by removing a part of the block copolymer and a portion of the ketene based random copolymer layer.
2. The method of claim 1 , further comprising:
performing one of an ultraviolet-ray treatment or a heat treatment with respect to the ketene based random copolymer layer; and
performing one of an ultraviolet-ray treatment or a heat treatment to the block copolymer; and wherein the ketene based random copolymer layer is coated on the substrate, wherein the block copolymer is coated on the ketene based random copolymer layer and wherein the part of the block copolymer is removed by an etching process.
3. The method of claim 2 , further comprising:
forming a metal layer between the substrate and the ketene based random copolymer layer; and
etching the metal layer by using the block copolymer as an etching mask.
4. The method of claim 3 , wherein:
the metal layer is patterned in a wire grid shape.
5. The method of claim 3 , wherein:
the metal layer comprises a reflective metal.
6. The method of claim 5 , wherein:
the metal layer comprises aluminum.
7. The method of claim 1 , wherein:
the ketene based random copolymer is represented by the following Chemical Formula 2:
(wherein R is a substituted or non-substituted-C 1 -C 20 alkyl group and a substituted or non-substituted C 6 -C 20 aryl group, m is about 50 to about 500, n is about 50 to about 500, and k is about 1 to about 40).
8. The method of claim 7 , wherein:
a number average molecular weight of the ketene based random copolymer is about 10 kg/mol to about 100 kg/mol and a polydispersity index (PDI) is about 1.0 to about 2.0.
9. The method of claim 1 , wherein:
the ketene based random copolymer is synthesized on the basis of the following Reaction Formula 3:
(wherein R is a substituted or non-substituted C 1 -C 20 alkyl group and a substituted or non-substituted C 6 -C 20 aryl group, AIBN is 2,2′-Azobis(2-methylpropionitrile), m is about 50 to about 500, n is about 50 to about 500, and k is about 1 to about 40).
10. The method of claim 1 , wherein:
the ketene based random copolymer layer is cross-linked at about 200° C. to about 300° C. for about 10 seconds to about 1 hour.
11. The method of claim 1 , wherein:
the block copolymer has a vertical lamella shape.
12. The method of claim 11 , wherein:
the block copolymer is selected from the group consisting of polystyrene-block-polymethylmethacrylate (PS-b-PMMA), polystyrene-block-polyethyleneoxide (PS-b-PEO), polystyrene-block-poly-2-vinylpyridine (PS-b-PVP), polystyrene-block-polydimethylsiloxane (PS-b-PDMS), polystyrene-block-polyferrocenyldimethylsilane (PS-b-PFS), and polystyrene-block-polyisoprene (PS-b-PI).
13. The method of claim 11 , wherein:
the part of the block copolymer is removed by one of dry-etching or wet etching.