Semiconductor device and method for manufacturing same
According to one embodiment, a semiconductor device includes a stacked body, a semiconductor body, and a stacked film. The stacked body includes a plurality of tungsten layers and a plurality of alloy layers of tungsten and molybdenum. At least portions of the tungsten layers are stacked with an air gap interposed. The alloy layers are provided on surfaces of the tungsten layers opposing the air gap. The semiconductor body extends in a stacking direction through the stacked body. The stacked film is provided between the semiconductor body and the tungsten layers. The stacked film includes a charge storage portion.
1. A semiconductor device, comprising:
a stacked body including a plurality of tungsten layers and a plurality of alloy layers of tungsten and molybdenum, at least portions of the tungsten layers being stacked with an air gap interposed, the alloy layers being provided on surfaces of the tungsten layers opposing the air gap;
a semiconductor body extending in a stacking direction through the stacked body; and
a stacked film provided between the semiconductor body and the tungsten layers, the stacked film including a charge storage portion.
2. The semiconductor device according to claim 1 , wherein the alloy layers are thinner than the tungsten layers.
3. The semiconductor device according to claim 1 , wherein molybdenum atoms are contained in crystal grain boundaries of the tungsten layers.
4. The semiconductor device according to claim 1 , wherein
the tungsten layers are stacked above a major surface of a substrate in a direction perpendicular to the major surface, and
a lower end of the semiconductor body extending in the stacking direction contacts the substrate.
5. The semiconductor device according to claim 4 , further comprising an interconnect portion extending in the stacking direction through the stacked body and having a lower end contacting the substrate.
6. The semiconductor device according to claim 4 , further comprising an insulating film provided between the substrate and a lowermost tungsten layer of the tungsten layers.