Method of making a fully depleted semiconductor-on-insulator programmable cell and structure thereof
View Patent ↗A programmable cell includes a semiconductor-on-insulator substrate, a program gate, and a word line gate. The semiconductor-on-insulator substrate includes a semiconductor layer. The semiconductor layer includes a first doped source/drain region, a second doped source/drain region and a region comprising germanium. The program gate is disposed above the region comprising germanium and includes a first gate dielectric layer disposed below a gate conductor. The word line gate is disposed between the first doped source/drain region and the second doped source/drain region.
1. A programmable cell, comprising:
a fully depleted semiconductor-on-insulator substrate comprising a semiconductor layer, the semiconductor layer comprising a first doped source/drain region, a second doped source/drain region and a region comprising germanium, wherein the first doped source/drain region is coupled to a bit line and the second doped source/drain region is adjacent the region comprising germanium;
a program gate disposed above the region comprising germanium and comprising a gate dielectric layer disposed below a gate conductor; and
a word line gate disposed between the first doped source/drain region and the second source/drain region.
2. The programmable cell of claim 1 , wherein the programmable cell is a one-time programmable cell and the first doped source/drain is a source, a drain or a combination of source and drain.
3. The programmable cell of claim 1 , wherein the first doped source/drain region and the second source/drain region are heavily doped P type regions.
4. A programmable cell, comprising:
a fully depleted semiconductor-on-insulator substrate comprising a semiconductor layer, the semiconductor layer comprising a first doped source/drain region, a second doped source/drain region and a region comprising germanium, wherein the region comprising germanium comprises silicon germanium region, wherein the silicon germanium region is 20 to 30 percent germanium;
a program gate disposed above the region comprising germanium and comprising a gate dielectric layer disposed below a gate conductor; and
a word line gate disposed between the first doped source/drain region and the second source/drain region.
5. The programmable cell of claim 4 , wherein the gate dielectric layer is comprised of a high K gate dielectric layer and a dielectric layer comprising germanium oxide.
6. The programmable cell of claim 4 , wherein the first doped source/drain region is coupled to a bit line and the second doped source/drain region is adjacent the region comprising germanium.
7. The programmable cell of claim 4 , wherein the silicon germanium region is between the second doped source/drain region and a heavily doped N type region.
8. A method of manufacturing a programmable cell, the method comprising:
providing a fully depleted semiconductor-on-insulator substrate comprising a semiconductor layer, the semiconductor layer comprising a first doped source/drain region, a second doped source/drain region and a region comprising germanium;
providing a bit line, wherein the first doped source/drain region is coupled to the bit line and the second doped source/drain region is adjacent the region comprising germanium;
providing a word line gate between the first doped source/drain region and the second source/drain region; and
providing a program gate above the region comprising germanium and comprising a gate dielectric layer disposed below a gate conductor.
9. The method of claim 8 , further comprising:
providing a junction isolation region in the depleted silicon-on-insulator substrate at a location next to a first side of the first doped source/drain region opposite a second side of the first doped source/drain region, the second side being next to the second doped source/drain region.
10. The method of claim 9 , wherein the first doped source/drain region and the second doped source/drain region are provided as raised in situ heavily doped P type regions and the junction isolation region is provided as a raised in situ heavily doped N type region.
11. The method of claim 9 , wherein the junction isolation region is part of a back-to-back diode.
12. The method of claim 8 , further comprising:
doping a substrate layer below an oxide layer of the depleted silicon on insulator substrate with P type dopants; and
providing a back gate to the substrate layer for providing a bias to lower a threshold voltage.
13. The method of claim 8 , wherein the program gate has a lower threshold voltage due to the first region.
14. The method of claim 8 , wherein the silicon layer has a thickness of 6 to 10 nanometers.
15. The method of claim 8 , further comprising:
forming a high K gate dielectric layer above the depleted silicon-on-insulator substrate, and wherein the depleted silicon-on-insulator substrate is a fully depleted substrate.
16. A one-time programmable device, comprising:
a semiconductor-on-insulator substrate;
a first cell disposed on the semiconductor-on-insulator substrate and comprising a first gate disposed between a first doped source/drain region and a second doped source/drain region;
a second cell disposed on the semiconductor-on-insulator substrate and comprising a second gate disposed between a third doped source/drain region and a fourth doped source/drain region; and
a doped isolation region disposed between the second source/drain region and the fourth source/drain region, the doped isolation region being heavily doped with N type dopants and the second doped source/drain region and the fourth doped source/drain region being heavily doped with P type dopants.
17. The one-time programmable device of claim 16 , wherein the semiconductor-on-insulator substrate comprises a silicon layer above an oxide layer, wherein the doped isolation region extends form a top surface of the silicon layer to a top surface of the oxide layer.
18. The one-time programmable device of claim 16 , wherein the semiconductor-on-insulator substrate comprises a silicon layer above an oxide layer, wherein the silicon layer comprises a silicon germanium region, wherein the first cell comprises a first program gate disposed above the silicon germanium region.
19. The one-time programmable device of claim 18 , wherein the second cell comprises a second program gate, wherein the doped isolation region is disposed between the first program gate and the second program gate.
20. The one-time programmable device of claim 16 further comprising a first trench isolation structure and a second trench isolation structure disposed in the semiconductor-on-insulator substrate, wherein the first cell, the second cell, and the doped isolation region are disposed between the first trench isolation structure and the second trench isolation structure.