Corrosion resistant antireflection coating and fabrication method thereof
An antireflective structure and a fabrication method thereof are disclosed. In one aspect, the antireflective structure includes a substrate, a buffer layer on the substrate, and an anticorrosion layer on the buffer layer, wherein the corrosion resistant layer comprises a densely packed cubic lattice structure. In one aspect, the fabrication method includes depositing a first buffer layer on a substrate in an e-beam deposition process, and depositing a first anticorrosion layer on the first buffer layer in an e-beam deposition process, wherein the substrate comprises sapphire, the first corrosion resistant layer comprises lutetia, and the first buffer layer comprise silicon carbide.
1. An antireflective structure, comprising:
a substrate;
one or more layer pairs on the substrate, each of the layer pairs comprising:
a buffer layer; and
a corrosion resistant layer on the buffer layer, wherein the corrosion resistant layer comprises a densely packed cubic lattice structure; wherein the corrosion resistant layer comprises at least one of lutetia and silicates of lutetia.
2. The structure of claim 1 , wherein the corrosion resistant layer comprises lutetia.
3. The structure of claim 1 , wherein the substrate comprises sapphire.
4. An antireflective structure, comprising:
a substrate;
one or more layer pairs on the substrate, each of the layer pairs comprising:
a buffer layer; and
a corrosion resistant layer on the buffer layer, wherein the corrosion resistant layer comprises a densely packed cubic lattice structure; wherein the buffer layer comprises silicon carbide.
5. The antireflective structure of claim 1 ,
wherein the one or more layer pairs comprise two or more layer pairs; and
wherein the substrate comprises sapphire, the corrosion resistant layer comprises lutetia, and the buffer layer comprises silicon carbide.
6. A method for fabricating an antireflective structure, comprising:
depositing a first buffer layer on a substrate in an e-beam deposition process; and
depositing a first corrosion resistant layer on the first buffer layer in an e-beam deposition process;
wherein the substrate comprises sapphire, the first corrosion resistant layer comprises lutetia, and the first buffer layer comprises silicon carbide.
7. The method of claim 6 , further comprising:
depositing a second buffer layer on the first corrosion resistant layer in an e-beam deposition process; and
depositing a second corrosion resistant layer on the second buffer layer in an e-beam deposition process.