IP Library › Granted Patent US 1,012,276
Granted Patent S1
US 1,012,276 · App. 29/781,968 · Granted Jan 23, 2024

Mask

Inventor: Hui-Mei Chen (New Taipei, TW)
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Quick Facts
Patent No.
US 1,012,276
App. No.
29/781,968
Granted
Jan 23, 2024
Kind
S1
Claims (1)

The ornamental design for a mask, as shown and described.

Priority Claims (1)
TW 109306216 · Nov 9, 2020 · national