IP Library › Granted Patent US 1,040,304
Granted Patent S1
US 1,040,304 · App. 29/796,739 · Granted Aug 27, 2024

Deposition ring for physical vapor deposition chamber

Inventors: David Gunther (San Jose, CA); Cheng-Hsiung Tsai (Cupertino, CA); Kirankumar Neelasandra Savandaiah (Bangalore, IN)
Assignee: APPLIED MATERIALS, INC.
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Quick Facts
Patent No.
US 1,040,304
App. No.
29/796,739
Granted
Aug 27, 2024
Kind
S1
Claims (1)

The ornamental design for a deposition ring for a physical vapor deposition chamber, as shown and described.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 28, 2021
From: GUNTHER, DAVID; TSAI, CHENG-HSIUNG; SAVANDAIAH, KIRANKUMAR NEELASANDRA
To: APPLIED MATERIALS, INC.
Reel/Frame 056697/0268 →
Continuity (1)
Continuation 16222662 · Dec 17, 2018