IP Library › Granted Patent US 1,048,608
Granted Patent S1
US 1,048,608 · App. 29/928,495 · Granted Oct 22, 2024

High pressure cleaning apparatus

Inventor: Zhongyuan Chu (Qiqihar, CN)
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Quick Facts
Patent No.
US 1,048,608
App. No.
29/928,495
Granted
Oct 22, 2024
Kind
S1
Claims (1)

The ornamental design for a high pressure cleaning apparatus, as shown and described.