Organic EL element and method for manufacturing organic EL element
View Patent ↗An organic EL element includes: an anode; a light-emitting layer that is disposed above the anode; a first interlayer that is disposed on the light-emitting layer; a second interlayer that is disposed on the first interlayer; a functional layer that is disposed on the second interlayer; and a cathode that is disposed above the functional layer. The first interlayer includes a fluorine compound including a first metal that is an alkali metal or an alkaline-earth metal. The second interlayer includes a second metal that has a property of cleaving a bond between the first metal and fluorine in the fluorine compound. The functional layer has at least one of an electron transport property and an electron injection property. A thickness D1 of the first interlayer and a thickness D2 of the second interlayer satisfy 3%≤D2/D1≤25%.
1. An organic EL element, comprising:
a substrate;
an interlayer insulating layer formed on the substrate;
an anode formed on a part of the interlayer insulating layer;
a barrier rib layer formed on the interlayer insulating layer where the anode is not formed;
a light-emitting layer that is disposed above the anode;
a first interlayer that is disposed on the light-emitting layer, and includes a fluorine compound including a first metal that is an alkali metal or an alkaline-earth metal;
a second interlayer that is disposed on the first interlayer, and includes a second metal that has a property of cleaving a bond between the first metal and fluorine in the fluorine compound;
a functional layer that is disposed on the second interlayer, and has at least one of an electron transport property and an electron injection property; and
a cathode that is disposed above the functional layer,
wherein the barrier rib layer is formed on the anode so as to expose a partial region of an upper surface of the anode and cover a peripheral region of the partial region of the upper surface of the anode,
wherein a thickness D1 of the first interlayer is 4 nm or more, and
wherein the thickness D1 of the first interlayer and a thickness D2 of the second interlayer satisfy 3%≤D2/D1≤25%.
2. The organic EL element of claim 1 ,
wherein the second metal is an alkali metal or an alkaline-earth metal.
3. The organic EL element of claim 1 ,
wherein the thickness D2 is 0.1 nm to 1 nm.
4. The organic EL element of claim 1 ,
wherein the functional layer is made of an organic material that is doped with an alkali metal or an alkaline-earth metal.
5. The organic EL element of claim 4 ,
wherein a concentration of the alkali metal or the alkaline-earth metal in the organic material is 5 wt % to 40 wt %.
6. The organic EL element of claim 4 ,
wherein the alkali metal or the alkaline-earth metal with which the organic material is doped is the same as the second metal.
7. The organic EL element of claim 6 ,
wherein the alkali metal or the alkaline-earth metal with which the organic material is doped and the second metal are each barium.
8. The organic EL element of claim 1 ,
wherein the first metal is sodium.
9. A manufacturing method of an organic EL element, comprising:
forming a substrate;
forming an interlayer insulating layer on the substrate;
forming an anode on a part of the interlayer insulating layer;
forming a barrier rib layer on the interlayer insulating layer where the anode is not formed;
forming, above the anode, a light-emitting layer;
forming, on the light-emitting layer, a first interlayer that has a thickness D1, and includes a fluorine compound including a first metal that is an alkali metal or an alkaline-earth metal;
forming, on the first interlayer, a second interlayer that has a thickness D2, and includes a second metal that has a property of cleaving a bond between the first metal and fluorine in the fluorine compound;
forming, on the second interlayer, a functional layer that has at least one of an electron transport property and an electron injection property; and
forming, above the functional layer, a cathode,
wherein the barrier rib layer is formed on the anode so as to expose a partial region of an upper surface of the anode and cover a peripheral region of the partial region of the upper surface of the anode,
wherein the thickness D1 of the first interlayer is 4 nm or more, and
wherein the thickness D1 and the thickness D2 satisfy 3%≤D2/D1≤25%.
10. The manufacturing method of claim 9 ,
wherein the second metal is an alkali metal or an alkaline-earth metal.
11. The manufacturing method of claim 9 ,
wherein the thickness D2 is 0.1 nm to 1 nm.
12. The manufacturing method of claim 9 ,
wherein the functional layer is formed by doping an organic material with an alkali metal or an alkaline-earth metal.
13. The manufacturing method of claim 12 ,
wherein a concentration of the alkali metal or the alkaline-earth metal in the organic material is 5 wt % to 40 wt %.
14. The manufacturing method of claim 12 ,
wherein the alkali metal or the alkaline-earth metal with which the organic material is doped is the same as the second metal.
15. The manufacturing method of claim 14 ,
wherein the alkali metal or the alkaline-earth metal with which the organic material is doped and the second metal are each barium.
16. The manufacturing method of claim 9 ,
wherein the first metal is sodium.
17. An organic EL element, comprising:
a substrate;
an interlayer insulating layer formed on the substrate;
an anode formed on a part of the interlayer insulating layer;
a barrier rib layer formed on the interlayer insulating layer where the anode is not formed;
a light-emitting layer that is disposed above the anode;
an interlayer that is disposed on the light-emitting layer;
a functional layer that is disposed on the interlayer, and has at least one of an electron transport property and an electron injection property; and
a cathode that is disposed above the functional layer,
wherein the barrier rib layer is formed on the anode so as to expose a partial region of an upper surface of the anode and cover a peripheral region of the partial region of the upper surface of the anode,
wherein the interlayer includes
a fluorine compound including a first metal that is an alkali metal or an alkaline-earth metal and a second metal that has a property of cleaving a bond between the first metal and fluorine in the fluorine compound,
wherein a concentration of the first metal in the interlayer increases as approaching the light-emitting layer from the functional layer,
wherein a concentration of the second metal in the interlayer increases as approaching the functional layer from the light-emitting layer,
wherein the interlayer includes a first interlayer a having a thickness D1 of 4 nm or more and a second interlayer, and
wherein the thickness D1 of the first interlayer and a thickness D2 of the second interlayer satisfy 3%≤D2/D1≤25%.
18. The organic EL element of claim 17 ,
wherein the second metal is an alkali metal or an alkaline-earth metal.
19. The organic EL element of claim 17 ,
wherein the functional layer includes an organic material that is doped with an alkali metal or an alkaline-earth metal.
20. The organic EL element of claim 19 ,
wherein a concentration of the alkali metal or the alkaline-earth metal in the organic material is 5 wt % to 40 wt %.
21. The organic EL element of claim 19 ,
wherein the alkali metal or the alkaline-earth metal with which the organic material is doped is the same as the second metal.
22. The organic EL element of claim 21 ,
wherein the alkali metal or the alkaline-earth metal with which the organic material is doped and the second metal are each barium.
23. The organic EL element of claim 17 ,
wherein the first metal is sodium.