IP Library › Granted Patent US 1,084,299
Granted Patent S1
US 1,084,299 · App. 29/940,072 · Granted Jul 15, 2025

Mask

Inventor: David Luo (New York, NY)
Assignee: DCSTAR INC
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Quick Facts
Patent No.
US 1,084,299
App. No.
29/940,072
Granted
Jul 15, 2025
Kind
S1
Claims (1)

The ornamental design for a mask, as shown and described.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2024
From: LUO, DAVID
To: DCSTAR INC
Reel/Frame 067267/0588 →
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