Granted Patent
S1
US 1,109,711 · App. 29/961,397 · Granted Jan 20, 2026
Gas nozzle for a substrate processing apparatus
Assignee:
KOKUSAI ELECTRIC CORPORATION
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Claims (1)
The ornamental design for a gas nozzle for a substrate processing apparatus, as shown and described.
Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded Dec 11, 2025
From: MORIYA, TAKETOSHI; OKAJIMA, YUSAKU; URUSHIHARA, MIKA
To: KOKUSAI ELECTRIC CORPORATION
Reel/Frame 073184/0565 →
Priority Claims (1)
JP 2024-004873 D
· Mar 8, 2024
· national
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