Peroxygen-based skin disinfectants effective against mycobacteria and yeasts
An aqueous skin-compatible antimicrobial solution effective against yeasts and mycobacteria, comprises 2-3.8 wt % of at least one peroxygen; from 1.5 up to 7 wt % of at least one aromatic monohydroxy alcohol selected from phenoxyethanol, phenethyl alcohol, cyclopentylmethanol, cyclohexylmethanol, benzyl alcohol, or any mixture thereof; from 0.5 up to 5 wt % of at least one high foaming amine oxide amphoteric surfactant; from 2 up to 10 wt % of at least one polyol-based skin conditioning agent; an effective amount of at least one pH adjusting agent for adjusting the solution pH to 2-3. The solution has a redox potential value from 220 to 280 mV, is readily biodegradable, and is free of aromatic carboxylic acids, inorganic salts, quaternary ammonium compounds, volatile aliphatic monohydroxy alcohols, other volatile organic compounds, halogen containing compounds, and other antimicrobial agents.
1. A skin-compatible antimicrobial solution, comprising:
hydrogen peroxide in an amount of from about 2 to about 3.8 wt %;
at least one aromatic monohydroxy alcohol selected from phenoxyethanol, phenethyl alcohol, benzyl alcohol, or any mixture thereof in an amount of from about 1.5% up to about 7% wt;
at least one amine oxide amphoteric surfactant in an amount of from about 0.5% up to about 5% wt;
at least one polyol-based skin conditioning agent in an amount of from about 2% up to about 10 wt %;
an effective amount of at least one pH adjusting agent effective to adjust the pH of the solution to from about 2 to about 3; and
water;
wherein the solution has a redox potential value in the range of 220 to 280 mV, is readily biodegradable, and is free of aromatic carboxylic acids, inorganic salts, quaternary ammonium compounds, volatile aliphatic monohydroxy alcohols, and halogen containing compounds.
2. The solution of claim 1 , wherein the at least one aromatic monohydroxy alcohol is phenoxyethanol, benzyl alcohol, or a mixture thereof.
3. The solution of claim 2 , wherein phenoxyethanol is present.
4. The solution of claim 1 , wherein the at least one amine oxide surfactant is selected from lauramine oxide, cocamidopropyl amine oxide, cocamine oxide, coamidomethyl amine oxide, coamidopropyl amine oxide, coco dipropylamine oxide, coco methylamine oxide, cetylamine oxide, decylamine oxide, myristamine oxide, isodecyloxypropylamine oxide, α,α′-[(oxidoimino)bis(methyl-2,1-ethanediy]) bis[omegahydroxypoly[oxy (methyl-2,1-ethanediyl]), N-[3-(C9-11-isoalkyl oxy) propyl], tetradecyldimethylamine oxide, ethoxy tallow amine oxides, propoxy tallow amine oxides, or any mixture thereof.
5. The solution of claim 4 , wherein lauramine oxide is present.
6. The solution of claim 1 , wherein the at least one polyol-based skin conditioning agent is selected from butylene glycol, hexylene glycol, or a mixture thereof.
7. The solution of claim 1 , further comprising at least one additional skin conditioning agent selected from glycerin, polyglycerin, diglycerides, triglycerides, phospholipids, castor oil, allantoin, cationic polymers, lanolin, cetyl alcohol, ceramides, essential fatty acids, non-volatile monohydroxy alcohols, gamma-linolenic acid, linoleic acid, gamma-linoleic acid, tocopherols, glycerol ethers, ascorbates, glucose-ethers, vegetable oils, amino acids, mineral oils, or any combination thereof.
8. The solution of claim 1 , wherein glycerin is present.
9. The solution of claim 1 , further comprising a nonionic surfactant.
10. The solution of claim 9 , wherein the nonionic surfactant is lauryl glycoside.
11. The solution of claim 1 , further comprising a peroxygen stabilizer, an inorganic acid, or a combination thereof.
12. The solution of claim 11 , wherein phosphoric acid is present.
13. A concentrated antimicrobial solution which, upon dilution, yields the antimicrobial solution of claim 1 .
14. A method of reducing the microbial load of a surface contaminated with microorganisms, the method comprising:
providing a solution according to claim 1 ; and
applying the solution to the surface for a contact time sufficient to reduce the microbial load by at least 1 log 10.
15. The method of claim 14 , wherein the contact time is less than two minutes, and wherein the reduction of microbial load is by at least 3 log 10.
16. The method of claim 14 , wherein the surface is skin.
17. The solution of claim 1 , wherein the solution further comprises at least one ingredient selected from pigments, dyes, fragrances, rheology modifiers, foaming agents, softening agents, anti-wrinkling agents, odor removal agents, odor capturing agents, anionic surfactants, nonionic surfactants, buffering agents, builders, chelating agents, peroxygen stabilizers, radical scavengers, preservatives, soil shielding agents, soil releasing agents, ultraviolet light protection agents, allergicides, or any combination thereof.
18. The solution of claim 1 , wherein the solution fulfills at least one of the following:
(a) the at least one aromatic monohydroxy alcohol is phenoxyethanol, benzyl alcohol, or a mixture thereof;
(b) the at least one amine oxide surfactant is selected from lauramine oxide, cocamidopropyl amine oxide, cocamine oxide, coamidomethyl amine oxide, coamidopropyl amine oxide, coco dipropylamine oxide, coco methylamine oxide, cetylamine oxide, decylamine oxide, myristamine oxide, isodecyloxypropylamine oxide, α,α′-[(oxidoimino)bis(methyl-2,1-ethanediyl]) bis[omegahydroxypoly[oxy(methyl-2,1-ethanediyl]), N-[3-(C9-11-isoalkyl oxy) propyl], tetradecyldimethylamine oxide, ethoxy tallow amine oxides, propoxy tallow amine oxides, or any mixture thereof;
(c) the at least one polyol-based skin conditioning agent is selected from butylene glycol, hexylene glycol, or a mixture thereof.
19. A concentrated antimicrobial solution which, upon dilution, yields the solution of claim 18 .
20. A method of reducing the microbial load of a surface contaminated with microorganisms, the method comprising:
providing a solution according to claim 18 , and
applying the solution to the surface for a contact time sufficient to reduce the microbial load by at least 1 log 10 .